• 제목/요약/키워드: thermal hysteresis

검색결과 192건 처리시간 0.027초

FRAM 소자용 PZT박막의 강유전특성에 관한 연구 (A study on the Improvement of Ferroeletric Characteristics of PZT thin film for FRAM Device)

  • 이병수;정무영;신백균;이덕출;이상희;김진식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2005년도 제36회 하계학술대회 논문집 C
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    • pp.1881-1883
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    • 2005
  • In this study, PZT thin films were fabricated using sol-gel Processing onto $Si/SiO_2/Ti/Pt$ substrates. PZT sol with different Zr/Ti ratio(20/80, 30/70, 40/60, 52/48) were prepared, respectively. The films were fabricated by using the spin-coating method on substrates. The films were heat treated at $450^{\circ}C$, $650^{\circ}C$ by rapid thermal annealing(RTA). The preferred orientation of the PZT thin films were observed by X-ray diffraction(XRD), and Scanning electron microscopy(SEM). All of the resulting PZT thin films were crystallized with perovskite phase. The fine crystallinity of the films were fabricated. Also, we found that the ferroelectric properties from the dielectric constant of the PZT thin films were over 600 degrees, P-E hysteresis constant. And the leakage current densities of films were lower than $10^{-8}\;A/cm^2$. It is concluded that the PZT thin films by sol-gel process to be convinced of application for ferroelectric memory device.

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비휘발성 메모리용 강유전체 박막에 관한 연구 (A study on the PZT thin films for Non-volatile Memory)

  • 이병수;박종관;김용운;박강식;김승현;이덕출
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2003년도 하계학술대회 논문집 C
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    • pp.1562-1564
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    • 2003
  • In this study, PZT thin films were fabricated using sol-gel processing onto Si/$SiO_2$/Ti/Pt substrates. PZT sol with different Zr/Ti ratio(20/80, 30/70, 40/60, 52/48) were prepared, respectively. The films were fabricated by using the spin-coating method on substrates. The films were heat treated at $450^{\circ}C,\;650^{\circ}C$ by rapid thermal annealing(RTA). The preferred orientation of the PZT thin films were observed by X-ray diffraction(XRD), and Scanning electron microscopy(SEM). All of the resulting PZT thin films were crystallized with perovskite phase. The fine crystallinity of the films were fabricated. Also, we found that the ferroelectric properties from the dielectric constant of the PZT thin films were over 600 degrees, P-E hysteresis constant. And the leakage current densities of films were lower than $10^{-8}A/cm^2$. It is concluded that the PZT thin films by sol-gel process to be convinced of application for ferroelectric memory device.

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Preparation of New Polyelectrolyte/ Silver Nanocomposites and Their Humidity-Sensitive Properties

  • Park, Min-Su;Lim, Tae-Ho;Jeon, Young-Min;Kim, Jong-Gyu;Gong, Myoung-Seon;Joo, Sang-Woo
    • Macromolecular Research
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    • 제16권4호
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    • pp.308-313
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    • 2008
  • A simple strategy was developed based on polyelectrolyte/silver nanocomposite to obtain humidity-sensitive membranes. The major component of a humid membrane is the polyTEAMPS/silver nanocomposite obtained by thermal heating the mixture of a polyelectrolyte and silver isopropylcarbamate complex. Humidity sensors prepared from polyTEAMPS/silver (w/w=100/0 and 100/6) nanocomposites had an average impedance of 292, 8.83 and $0.86\;k{\Omega}$, and 5,327, 140 and $0.93\;k{\Omega}$ at 30,60 and 95% relative humidity (RH), respectively. Hysteresis, temperature dependence and response time were also measured. Activation energies and complex impedance spectroscopy of the various components of the polyelectrolyte/silver nanocomposite films were examined for the humidity-sensing membrane.

Cetyl Trimethyl Ammonium Bromide-coated Nickel Ferrite Nanoparticles for Magnetic Hyperthermia and T2 Contrast Agents in Magnetic Resonance Imaging

  • Lee, Da-Aemm;Bae, Hongsubm;Rhee, Ilsum
    • Journal of the Korean Physical Society
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    • 제73권9호
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    • pp.1334-1339
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    • 2018
  • Spherical nickel ferrite nanoparticles were synthesized using the thermal decomposition method and coated with cetyl trimethyl ammonium bromide (CTAB) after the synthesis. Transmission electron microscopy images showed that the average diameter of the particles was 9.40 nm. The status of the CTAB-coating on the surface of the particles was checked using Fourier-transform infrared spectroscopy. Their hysteresis curve showed that the particles exhibited a superparamagnetic behavior. The $T_1$ and the $T_2$ relaxations of the nuclear spins were observed in aqueous solutions of the particles with different particles concentrations by using a magnetic resonance imaging (MRI) scanner, which showed that the $T_1$ and the $T_2$ relaxivities of the particles in water were $0.57mM^{-1}{\cdot}s^{-1}$ and $10.42mM^{-1}{\cdot}s^{-1}$, respectively. In addition, using an induction heating system, we evaluated their potentials for magnetic hyperthermia applications. The aqueous solution of the particles with a moderate concentration (smaller than 6.5 mg/mL) showed a saturation temperature larger than the hyperthermia target temperature of $42^{\circ}C$. These findings show that the CTAB-coated nickel ferrite particles are suitable for applications as $T_2$ contrast agents in MRI and heat generators in magnetic hyperthermia.

바이오 센서 적용을 위한 수직형 이중게이트 InGaAs TFET의 게이트 열화 현상 분석 (Constant Voltage Stress (CVS) and Hot Carrier Injection (HCI) Degradations of Vertical Double-date InGaAs TFETs for Bio Sensor Applications)

  • 백지민;김대현
    • 센서학회지
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    • 제31권1호
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    • pp.41-44
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    • 2022
  • In this study, we have fabricated and characterized vertical double-gate (DG) InGaAs tunnel field-effect-transistors (TFETs) with Al2O3/HfO2 = 1/5 nm bi-layer gate dielectric by employing a top-down approach. The device exhibited excellent characteristics including a minimum subthreshold swing of 60 mV/decade, a maximum transconductance of 141 µS/㎛, and an on/off current ratio of over 103 at 20℃. Although the TFETs were fabricated using a dry etch-based top-down approach, the values of DIBL and hysteresis were as low as 40 mV/V and below 10 mV, respectively. By evaluating the effects of constant voltage and hot carrier injection stress on the vertical DG InGaAs TFET, we have identified the dominant charge trapping mechanism in TFETs.

알루미늄 6061 합금의 표면 나노 구조물 변화에 따른 방빙 특성 연구 (Anti-Icing Characteristics of Aluminum 6061 Alloys According to Surface Nanostructure)

  • 김리안;정찬영
    • Corrosion Science and Technology
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    • 제21권6호
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    • pp.476-486
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    • 2022
  • Recently, aluminum 6061 instead of copper alloy is used for cooling heat exchangers used in the internal combustion of engines due to its economic feasibility, lightweight, and excellent thermal conductivity. In this study, aluminum 6061 alloy was anodized with oxalic acid, phosphoric acid, or chromic acid as an anodizing electrolyte at the same concentration of 0.3 M. After the third anodization, FDTS, a material with low surface energy, was coated to compare hydrophobic properties and anti-icing characteristics. Aluminum was converted into an anodization film after anodization on the surface, which was confirmed through Energy Dispersive X-ray Spectroscopy (EDS). Pore distance, interpore distance, anodization film thickness, and solid fraction were measured with a Field Emission Scanning Electron Microscope (FESEM). For anti-icing, hydrophobic surfaces were anodized with oxalic acid, phosphoric acid, or chromic acid solution. The sample anodized in oxalic acid had the lowest solid fraction. It had the highest contact angle for water droplets and the lowest contact hysteresis angle. The anti-icing contact angle showed a tendency to decrease for specimens in all solutions.

Bi$_{4}$Ti$_{3}$O$_{12}$ 박막의 제작과 그 특성에 관한 연구 (Preparation of a Bi$_{4}$Ti$_{3}$O$_{12}$ Thin Film and Its Electrical Properties)

  • 강성준;장동훈;민경진;김성진;정양희;윤영섭
    • 대한전자공학회논문지SD
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    • 제37권4호
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    • pp.7-14
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    • 2000
  • Bi/sub 4/Ti/sub 3/O/sub 12/ (BIT) 박막을 acetate 계 precursor 를 이용한 sol-gel 법으로 제작한 후, 구조적 및 전기적 특성을 조사하여 NVFRAM (Won-Volatile Ferroelectric RAM)으로의 응용가능성을 조사하였다. DT-TG (Differential Thermal-Thermal Gravimetric) 분석으로 drying 온도와 annealing 온도가 각각 400℃ 와 650℃ 인 BIT 박막의 열처리조건을 확립하였다. Pt/Ta/Sio/sub 2//Si 기판 위에 제작된 BIT 박막은 완전한 orthorhombic perovskite상을 가지며, 입자크기가 약 100nm 이고 표면 거칠기는 약 70.2Å 으로 비교적 치밀한 형상을 나타내었다. 10㎑ 의 주파수에서 비유전률과 유전손실은 각각 176 과 0.038 이었으며, 100 ㎸/cm 의 전기장에서 누설전류밀도는 4.71㎂/㎠ 이었다. ±250㎸/㎝ 에서 이력곡선을 측정한 결과, 잔류분극 (Pr)과 항전계 (Ec)는 각각 5.92μC/㎠ 과 86.3㎸/㎝ 이었다. BIT 박막에 ±5V 의 사각펄스를 인가하여 피로특성을 측정한 결과, 잔류분극은 초기값 5.92μC/㎠ 에서 10/sup 9/회에서는 3.95μC/㎠ 로 약 33% 감소하였다.

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1, 3-Propanediol 을 이용해 제작된 PZT(30/70) 후막의 전기적 및 강유전 특성에 관한 연구 (A Study on the Electric and Ferroelectric Properties of PZT(30/70) Thick Film Prepared by Using 1,3-Propanediol)

  • 송금석;장동훈;강성준;윤영섭
    • 대한전자공학회논문지SD
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    • 제40권9호
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    • pp.631-637
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    • 2003
  • Pt/TiO/sub x/SiO₂/Si 기판 위에 1,3-propanediol 을 이용해 sol-gel 법으로 제작한 PZT(30/70) 후막의 구조적 및 전기적, 강유전 특성에 대하여 조사하였다. 열처리 공정은 열 응력 (thermal stress) 를 줄이기 위해 RTA를 사용하였고, 최종적으로 650℃의 로(furnace)에서 어닐링하였다. SEM 분석 결과 1회 코팅에 330nm 의 두께를 얻었으며, 3회 코팅으로 약 1 μm 정도의 두께를 얻었다. C-D 측정결과, 1 kHz에서 비유전률과 유전손실은 각각 886 과 0.03 이었다. C-V 곡선은 좌우 대칭인 나비모양을 나타내었다. 누설전류밀도는 200kV/cm 에서 1.23×10/sup -5/A/cm²이었으며, 이력곡선으로부터 구한 잔류분극 (P/sub r/) 과 항전계(E/sub c/) 는 각각 33.8μC/cm²과 56.9kV/cm 이었다. 결론적으로 본 연구에서 제작된 PZT(30/70) 후막은 우수한 강유전 및 전기적 특성을 보였다.

Effect of RTA Treatment on $LiNbO_3$ MFS Memory Capacitors

  • Park, Seok-Won;Park, Yu-Shin;Lim, Dong-Gun;Moon, Sang-Il;Kim, Sung-Hoon;Jang, Bum-Sik;Junsin Yi
    • The Korean Journal of Ceramics
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    • 제6권2호
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    • pp.138-142
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    • 2000
  • Thin film $LiNbO_3$MFS (metal-ferroelectric-semiconductor) capacitor showed improved characteristics such as low interface trap density, low interaction with Si substrate, and large remanent polarization. This paper reports ferroelectric $LiNbO_3$thin films grown directly on p-type Si (100) substrates by 13.56 MHz RF magnetron sputtering system for FRAM (ferroelectric random access memory) applications. RTA (rapid thermal anneal) treatment was performed for as-deposited films in an oxygen atmosphere at $600^{\circ}C$ for 60sec. We learned from X-ray diffraction that the RTA treated films were changed from amorphous to poly-crystalline $LiNbO_3$which exhibited (012), (015), (022), and (023) plane. Low temperature film growth and post RTA treatments improved the leakage current of $LiNbO_3$films while keeping other properties almost as same as high substrate temperature grown samples. The leakage current density of $LiNbO_3$films decreased from $10^{-5}$ to $10^{-7}$A/$\textrm{cm}^2$ after RTA treatment. Breakdown electric field of the films exhibited higher than 500 kV/cm. C-V curves showed the clockwise hysteresis which represents ferroelectric switching characteristics. Calculated dielectric constant of thin film $LiNbO_3$illustrated as high as 27.9. From ferroelectric measurement, the remanent polarization and coercive field were achieved as 1.37 $\muC/\textrm{cm}^2$ and 170 kV/cm, respectively.

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Magnetization Angle and Thickness Dependence of Perpendicular Exchange Anisotropy in [Pd/Co]n/FeMn Films

  • Choi, S.D.;Joo, H.W.;Yun, D.K.;Lee, M.S.;Lee, K.A.;Lee, H.S.;Kim, S.W.;Lee, S.S.;Hwang, D.G.
    • Journal of Magnetics
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    • 제11권2호
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    • pp.70-73
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    • 2006
  • The magnetization angle and thickness dependence of magnetic anisotropy in the exchange-biased [Pd/Co]${\times}$5/FeMn multilayers with an out-of-plane anisotropy were investigated to determine the origin of perpendicular exchange biasing. As the Co thickness increased to 1.5 nm in the [Pd(0.8 nm)/Co(t)]${\times}$5/FeMn(120 nm) films, the hysteresis loops were converted from square loops at a thin Co (<0.4 nm) to complicated round ones at a thick Co. The irregularly asymmetric step (IAS) at the left top of the loop appeared in the loop of the 0.6-nm Co film due to an inhomogeneity in the exchange anisotropy. As the Pd thickness increased to 1.6 nm, the step disappeared, and the perpendicular magnetic anisotropy was maximized in the Co thickness between 0.6 and 0.9 nm. The conversion of the magnetization loop along the magnetization angle coincided with the equation $H_{(eff)}=H_o\;cos{\theta}$. The IAS of the 0.8-nm Pd film disappeared after thermal annealing up to $200^{\circ}C$ under an external magnetic field.