Preparation of a Bi$_{4}$Ti$_{3}$O$_{12}$ Thin Film and Its Electrical Properties

Bi$_{4}$Ti$_{3}$O$_{12}$ 박막의 제작과 그 특성에 관한 연구

  • 강성준 (여수대학교 반도체·응용물리학과) ;
  • 장동훈 (인하대하교 전자재료공학과) ;
  • 민경진 (인하대하교 전자재료공학과) ;
  • 김성진 (여수대학교 전기 및 반도체공학과) ;
  • 정양희 (여수대학교 전기 및 반도체공학) ;
  • 윤영섭 (인하대하교 전자재료공학과)
  • Published : 2000.04.01

Abstract

A Bi$_{4}$Ti$_{3}$O$_{12}$ (BIT) thin film is prepared by sol-gel method using acetate precursors and evaluated whether it could be applied to NVFRAM (Non-Volatile Ferroelectric RAM). The drying and the annealing temperature are 40$0^{\circ}C$ and $650^{\circ}C$, respectively and they are determined from the DT-TG (Differential Thermal-Thermal Gravimetric) analysis. The BIT thin film deposited on Pt/Ta/SiO$_{2}$/Si substrate shows orthorhombic perovskite phase. The grain size and the surface roughness are about 100 nm and 70.2$\AA$, respectively. The dielectric constant and the loss tangent at 10 KHz are 176 and 0.038, respectively, and the leakage current density at 100 ㎸/cm is 4.71 $mutextrm{A}$/$\textrm{cm}^2$. In the results of hysteresis loops measured at $\pm$250 ㎸/cm, the remanent polarization (Pt) and the coercive field (Ec) are 5.92 $\mu$C/$\textrm{cm}^2$ and 86.3 ㎸/cm, respectively. After applying 10$^{9}$ square pulses of $\pm$5V, the remanent polarization of the BIT thin film decreases as much as about 33% from 5.92 $\mu$C/$\textrm{cm}^2$ of initial state to 3.95 $\mu$C/$\textrm{cm}^2$.

Bi/sub 4/Ti/sub 3/O/sub 12/ (BIT) 박막을 acetate 계 precursor 를 이용한 sol-gel 법으로 제작한 후, 구조적 및 전기적 특성을 조사하여 NVFRAM (Won-Volatile Ferroelectric RAM)으로의 응용가능성을 조사하였다. DT-TG (Differential Thermal-Thermal Gravimetric) 분석으로 drying 온도와 annealing 온도가 각각 400℃ 와 650℃ 인 BIT 박막의 열처리조건을 확립하였다. Pt/Ta/Sio/sub 2//Si 기판 위에 제작된 BIT 박막은 완전한 orthorhombic perovskite상을 가지며, 입자크기가 약 100nm 이고 표면 거칠기는 약 70.2Å 으로 비교적 치밀한 형상을 나타내었다. 10㎑ 의 주파수에서 비유전률과 유전손실은 각각 176 과 0.038 이었으며, 100 ㎸/cm 의 전기장에서 누설전류밀도는 4.71㎂/㎠ 이었다. ±250㎸/㎝ 에서 이력곡선을 측정한 결과, 잔류분극 (Pr)과 항전계 (Ec)는 각각 5.92μC/㎠ 과 86.3㎸/㎝ 이었다. BIT 박막에 ±5V 의 사각펄스를 인가하여 피로특성을 측정한 결과, 잔류분극은 초기값 5.92μC/㎠ 에서 10/sup 9/회에서는 3.95μC/㎠ 로 약 33% 감소하였다.

Keywords

References

  1. C. P. de Araujo, J. F. Scott and G. W. Taylor, Ferroelectric thin films: synthesis and basic properties, Gordon and Breach Publishers, Amsterdam, pp. 1-8 (1996)
  2. Seong Jun Kang and Yung Sup Yoon, 'Optical and Electrical Properties of Lanthanum-Modified Lead Titanate Thin Films with Various Lanthanum Concentrations', Jpn. J. Appl. Phys., vol. 36, no. 7A, pp. 4459-4465 (1997)
  3. Seong Jun Kang, Vladimir B. Samoilov and Yung Sup Yoon, 'Low-Frequency Response of Pyroelectric Sensors', IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control, vol. 45, no. 5, pp. 1255-1260 (1998) https://doi.org/10.1109/58.726451
  4. F. Wang and G. H. Heartling, 'A PLZT Optical Phase Modulator and Its Applications', Proc. of 1992 IEEE International Symposium on Applications of Ferroelectrics, pp. 596-599 (1992) https://doi.org/10.1109/ISAF.1992.300735
  5. S. Sinharoy and H. Buhay, D. R. Lampe and M. H. Francombe, 'Integration of Ferroelectric Thin Films into Nonvolatile Memories', J. Vac. Sci. Technol. A, vol. 10, pp. 1554-1561 (1992) https://doi.org/10.1116/1.578044
  6. O. Auciello, J. F. Scott and R. Ramesh, 'The Physics of Ferroelectric Memories', Physics Today, pp. 22-27, July (1998)
  7. B. G. Chae, S. J. Lee, C. R. Cho, Y. S. Yang, S. H. Kim and M. S. Jang, 'Fatigue Effects of Metal-doped PZT Thin Films', Integrated Ferroelectrics, vol. 13, pp. 87-96 (1996) https://doi.org/10.1080/10584589608013083
  8. H. M. Duiker, P. D. Beale, J. F. Scott, C. A. Paz de Araujo, B. M. Melnick, J. D. Cuchiaro and L. D. McMillan, 'Fatigue and Switching in Ferroelectric Memories: Theory and Experiment', J. Appl. Phys., vol. 68, pp. 5783 (1990) https://doi.org/10.1063/1.346948
  9. S. B. Desu, D. P. Vijay and I. K. Yoo, 'Donor-Doped Lead Zirconate Titanate $(PbZrxTi_1-xO_3)$ Films', Mat. Res. Soc. Symp. Proc., vol. 335, pp. 53 (1994)
  10. Q. Jiang, W. Cao and I. E. Cross, 'Electric Fatigue in Lead Zirconate Titanate Ceramics', J. Am. Cerm. Soc., vol. 77, pp. 211-215 (1994) https://doi.org/10.1111/j.1151-2916.1994.tb06979.x
  11. T. Kijima, S. Satoh, H. Matsunaga and M. Koba, 'Ultra-Thin Fatigue-Free $Bi_4Ti_3O_12$ Films for Nonvolatile Ferroelectric Memories', Jpn. J. Appl. Phys., vol. 35, no. 2B, pp. 1246-1250 (1996) https://doi.org/10.1143/JJAP.35.1246
  12. J. F. Scott, F. M. Ross, C. A. Paz de Araujo, M. C. Scott and M. Huffman, 'Structure and Device Characteristics of $SrBi_2Ta_2O_9-Based$ Nonvolatile Random-Access Memories', MRS Bulletin, pp.33-39 (1996)
  13. E. Kato, Y. Watanabe, T. Tsukamoto and T. Tsuchiya, 'Preparation of Highly Oriented Bismuth Titanate Thin Films by Sol-Gel Process', J. Ceram. Soc. Jpn., vol. 104, pp. 1015-1018 (1996)
  14. S. Y. Wu, W. J. Takei, M. H. Francombe and S. E. Cummins, 'Domain Structure and Polarization Reversal in Films of Ferroelectric Bismuth Titanate', IEEE Trans. Sonics Ultrason., vol. SU-19, pp. 217-224 (1972)
  15. C. J. Kim, C. W. Chung and K. S. Lee, 'Crystallization and Electrical Properties of $Bi_4Ti_3O_12$ Films Derived From Bismuth Acetate and Bismuth Nitrate Precursor Solutions', Mat. Res. Sco. Symp. Proc., vol. 493, pp. 255-260 (1998)
  16. P. C. Joshi and S. B. Desu, 'Structural and Electrical Characteristics of Rapid Thermally Processed Ferroelectric $Bi_4Ti_3O_12$ Thin Films Prepared by Metalorganic Solution Deposition', J. Appl. Phys., vol. 80, pp. 2349-2357 (1996) https://doi.org/10.1063/1.363069
  17. 강성준, 장동훈, 윤영섭, 'RF Magnetron Reactive Sputtering 법으로 제작한 BST 박막의 전기적 및 계면 특성에 관한 연구', 전자공학회 논문지, vol. 35D, 5, pp. 451-457 (1998)
  18. A. J. Moulson and J. M. Herbert, Electroceramics: Materials, Properties, Applications, Chapman & Hall, London, pp.58-69 (1995)
  19. J. J. Lee and S. K. Dey, 'Cubic Paraelectric (Nonferroelectric) Perovskite PLT Thin Films with High Permittivity for ULSI DRAM's and Decoupling Capacitors', IEEE Transactions on Electron Devices, vol. 39, pp. 1607-1612 (1992) https://doi.org/10.1109/16.141225
  20. W. D. Kingery, H. K. Bowen and D. R. Uhlmann, Introduction of Ceramics, John Wiley & Sons, New York, pp. 937 (1976)
  21. P. C. Joshi and S. B. Krupanidhi, 'Structural and Electrical Studies on Rapid Thermally Processed Ferroelectric $Bi_{4}Ti_{3}O_{12}$ Thin Films by Metallo-Organic Solution Deposition', J. Appl. Phys., vol. 72, pp. 5827-5833 (1992) https://doi.org/10.1063/1.351938
  22. A. Kakimi, S. Okamura, S. Ando and T. Tsukamoto, 'Effect of $O_2$ Gas Pressure in Heat Treatment on Surface Morphology and Electric Properties of Ferroelectric $Bi_4Ti_3O_{12}$ Thin Films with c-Axis Orientation', Jpn. J. Appl. Phys., vol. 34, no. 9B, pp. 5493-5497 (1995)