• 제목/요약/키워드: surface protective material

검색결과 91건 처리시간 0.028초

Impact Damage Behavior in Filament Wound Composite Pressure Vessel

  • Kang, Ki-Weon;Kim, Young-Soo;Choi, Rin;Lee, Mee-Hae
    • International Journal of Safety
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    • 제4권2호
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    • pp.6-11
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    • 2005
  • The goals of the paper are to understand the impact damage behavior and identify the effect of surface protective materials on impact resistance in filament wound composite pressure vessels. For these, a series of low velocity impact tests was performed on specimens cutting from the full scale pressure vessel by the instrumented impact testing machine. The specimens are classified into two types, which are with and without surface protective material. The visualization for impact damage by two different impactors is made by metallurgical microscope. Based on the impact force history and damage, the impact resistance parameters were employed,rod its validity in identifying the damage resistance of filament wound composite pressure vessel was reviewed. As the results, the impact resistance of the filament wound composites and its dependency on the surface protective material were evaluated quantitatively

Cu 용 슬러리 환경에서의 보호성 코팅이 융착 CMP 패드 컨니셔너에 미치는 영향 (Effect on protective coating of vacuum brazed CMP pad conditioner using in Cu-slurry)

  • 송민석;지원호
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 춘계학술대회 논문집
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    • pp.434-437
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    • 2005
  • Chemical Mechanical Polishing (CMP) has become an essential step in the overall semiconductor wafer fabrication technology. In general, CMP is a surface planarization method in which a silicon wafer is rotated against a polishing pad in the presence of slurry under pressure. The polishing pad, generally a polyurethane-based material, consists of polymeric foam cell walls, which aid in removal of the reaction products at the wafer interface. It has been found that the material removal rate of any polishing pad decreases due to the so-called 'pad glazing' after several wafer lots have been processed. Therefore, the pad restoration and conditioning has become essential in CMP processes to keep the urethane polishing pad at the proper friction coefficient and to allow effective slurry transport to the wafer surface. Diamond pad conditioner employs a single layer of brazed bonded diamond crystals. Due to the corrosive nature of the polishing slurry required in low pH metal CMP such as copper, it is essential to minimize the possibility of chemical interaction between very low pH slurry (pH <2) and the bond alloy. In this paper, we report an exceptional protective coated conditioner for in-situ pad conditioning in low pH Cu CMP process. The protective Cr-coated conditioner has been tested in slurry with pH levels as low as 1.5 without bond degradation.

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난연기능 nano 및 microcapsule의 개발 및 응용(Ⅰ) (Development and Applications of Frame Retardant Nano and Microcapsule)

  • 김혜인;홍요한;박수민
    • 한국염색가공학회지
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    • 제20권4호
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    • pp.31-42
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    • 2008
  • Tricrecyl phosphate(TCP)-containing polyurea microcapsules were prepared by interfacial polymerization using aromatic 2,4-toluene diisocyanate(TDI) and ethylenediamine(EDA) as wall forming materials. The effects of the protective colloids of polyvinylalcohol(PVA) and gelatin were investigated through experimentation. The mean size of prepared polyurea microcapsules was smaller and the surface morphology of the microcapsule prepared by the PVA as protective colloid was much smoother than the gelatin. As the concentration of protective colloid increased, the wall membrane of the polyurea microcapsules became more stable, the thermal stability of the wall membrane increased, the mean particle size became smaller, and the particle distribution was more uniform. PET containg microTCPs have a higher activation energy of decomposition, higher char content and lower heat of combustion.

Effects of Protective Colloids on the Formation of Polyurea Microcapsules

  • Lee, Eung-Min;Kim, Hea-In;Park, Soo-Min
    • 한국염색가공학회지
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    • 제19권5호
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    • pp.30-36
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    • 2007
  • Cypermethrin-containing polyurea microcapsules were prepared by interfacial polymerization using aromatic 2,4-toluene diisocyanate(TDI) and Ethylene diamine(EDA) as wall forming materials. The effects of the protective colloids of polyvinylalcohol(PVA) and gelatin were investigated through experimentation. The mean size of the polyurea microcapsules was smaller and the surface morphology of the PVA was much smoother than gelatin. In addition the release behavior was much more controlled and better sustained. As the concentration of protective colloid increased, the wall membrane of the polyurea microcapsules became more stable, the thermal stability of the wall membrane increased, the mean particle size became smaller, and the particle distribution was more uniform. The release behavior of the core material changed according to the concentration. As the gelatin concentration was increased, a more controlled and sustained release behavior was observed. However, in the case of PVA, the increase of PVA concentration lead to a more rapid release rate.

Fe2O3 첨가에 따른 AC PDP 보호막용 MgO 박막의 광학적.전기적 특성 (Effects of Fe2O3 Addition on Optical and Electrical Properties of MgO Films as a Protective Layer for AC PDPs)

  • 김창일;정영훈;이영진;백종후;최은하;정석;김정석
    • 한국전기전자재료학회논문지
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    • 제22권9호
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    • pp.760-765
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    • 2009
  • The effects of $Fe_2O_3$ addition on optical and electrical properties of MgO films as a protective layer for AC plasma display panels were investigated. Doped MgO films prepared by the e-beam evaporation have a higher ${\gamma}$ (secondary electron emission coefficient) than pure MgO protective layer. Roughness increased with amount of $Fe_2O_3$ up to 100 ppm and then decreased further addition. These results showed that discharge properties and optical properties of MgO protective layers seemed to be closely related with microstructure factors such as roughness. Good optical and electrical properties of ${\gamma}$ of 0.120, surface roughness of 14.1 nm and optical transmittance of 94.55% were obtained for the MgO + 100 ppm $Fe_2O_3$ protective layer sintered at $1700^{\circ}C$ for 5 hrs.

Gd2O3 첨가에 따른 AC PDP 보호막용 MgO 박막의 광학적.전기적 특성 (Effects of Gd2O3 Addition on Optical and Electrical Properties of MgO Films as a Protective Layer for AC PDPs)

  • 김창일;임은경;박용준;이영진;백종후;최은하;정석;김정석
    • 한국전기전자재료학회논문지
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    • 제20권7호
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    • pp.620-625
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    • 2007
  • The effects of $Gd_2O_3$ addition and sintering condition on optical and electrical properties of MgO films as a protective layer for AC plasma display panels were investigated. Doped MgO films prepared by the e-beam evaporation have a higher ${\Upsilon}$ (secondary electron emission coefficient) than pure MgO protective layer. Relative density and grain size increased with amount of $Gd_2O_3$ up to 100 ppm and then decreased further addition. These results showed that discharge properties and optical properties of MgO protective layers seemed to be closely related with microstructure factors such as relative density and grain size. Good optical and electrical properties of ${\Upsilon}$ of 0.138, surface roughness of 5.77 nm and optical transmittance of 95.76 % were obtained for the MgO+100 ppm $Gd_2O_3$ protective layer sintered at $1700^{\circ}C$ for 5 hrs.

필라멘트 와인딩 복합재 압력용기의 충격저항성에 미치는 표면 고무 보호재료의 영향 (The Effect of Surface Protective Material on the Impact Resistance in Filament Wound Composite Pressure Vessel)

  • 강기원;김용수;이미애;최린
    • 한국안전학회지
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    • 제20권4호
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    • pp.14-19
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    • 2005
  • One area in which composites have been used rather extensively is for fabricating pressure vessel. These structures can be readily manufactured by filament winding, which is, as far as composite fabrication techniques are concerned, a relatively inexpensive method for producing composite structures. Unfortunately, the higher strength material and fabrication costs are not the only disadvantages of fiber-reinforced polymer composites when they are compared to metals. Additionally, these materials tend to exhibit brittle behavior. This is of particular concern when they are subjected to a low-velocity impact during routine handling a significant amount of structural damage can be introduced into the composites. The goals of this paper are to understand the impact damage behavior and identify the effect of surface coating materials on impact resistance in filament wound composite pressure vessels. For these, a series of low velocity impact tests was performed on specimens cutting from the full scale pressure vessel by the instrumented impact testing machine. The specimens are classified into two types with and without surface protective material. The visualization for impact damage is made by metallurgical microscope. Based on the impact force history and damage, the resistance parameters were employed and its validity in identifying the damage resistance of pressure vessel was reviewed. As the results, the impact resistance of the filament wound composites and its dependency on the protective material were evaluated quantitatively.

아민화 표면 처리된 면직물의 제독 성능 연구 (Detoxification Properties of Surface Aminated Cotton Fabric)

  • 김창규;권웅;정의경
    • 한국염색가공학회지
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    • 제32권2호
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    • pp.73-79
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    • 2020
  • Pursuing the fabric materials for military chemical warfare protective clothing with the improved detoxification properties, this study investigated the simple and effective cotton treatment method using pad-dry-cure process and 3-aminopropyltrimethox ysilane(APTMS) solution for surface amination. Detoxification properties of the untreated and treated cotton fabrics were evaluated via decontamination of chemical warfare agent simulant, DFP(diisopropylfluorophosphate). The surface aminated cotton fabric increased the rate of the hydrolysis of DFP by the factor of 3 and the decontamination ratio reached 88.2% after 24h. Therefore, the surface amination of the cotton fabric with APTMS can be an effective pathway to prepare the material for protective clothing against chemical warfare agents.

Transmission Electron Microscopy Specimen Preparation for Two Dimensional Material Using Electron Beam Induced Deposition of a Protective Layer in the Focused Ion Beam Method

  • An, Byeong-Seon;Shin, Yeon Ju;Ju, Jae-Seon;Yang, Cheol-Woong
    • Applied Microscopy
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    • 제48권4호
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    • pp.122-125
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    • 2018
  • The focused ion beam (FIB) method is widely used to prepare specimens for observation by transmission electron microscopy (TEM), which offers a wide variety of imaging and analytical techniques. TEM has played a significant role in material investigation. However, the FIB method induces amorphization due to bombardment with the high-energy gallium ($Ga^+$) ion beam. To solve this problem, electron beam induced deposition (EBID) is used to form a protective layer to prevent damage to the specimen surface. In this study, we introduce an optimized TEM specimen preparation procedure by comparing the EBID of carbon and tungsten as protective layers in FIB. The selection of appropriate EBID conditions for preparing specimens for TEM analysis is described in detail.

산소 플라즈마 처리후의 이차전자방출계수(γ)를 이용한 MgO 보호막의 일함수(φW) 변화 (Work Function Changes on MgO Protective Layer after O2plasma Treatment from Ion-induced Secondary Electron Emission Coefficient)

  • 정재천;유세기;조재원
    • 한국전기전자재료학회논문지
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    • 제18권3호
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    • pp.259-263
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    • 2005
  • The changes in secondary electron emission coefficient(${\gamma}$) and work function($\Phi$$_{\omega}$) have been studied on the surface of MgO protective layer aster plasma(Ar. $O_2$) treatment using ${\gamma}$-focused ion beam (${\gamma}$-FIB) system. The values of ${\gamma}$ varied as follows: $O_2$-treated MgO > Ar-treated MgO > Non-treated MgO, and the work functions varied in the reverse order. The result indicates that both the physical etching and the chemical reaction of $O_2$-plasma removed the contaminating materials from the surface of MgO.