• 제목/요약/키워드: surface contamination

검색결과 926건 처리시간 0.033초

이온화칼슘이 도계과정 중 도체표면의 미생물 교차오염에 미치는 영향 (Effects of ionized calcium on microbial cross-contamination in surface of carcass via slaughter process of chickens)

  • 박병성;진지영
    • 한국응용과학기술학회지
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    • 제33권4호
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    • pp.813-823
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    • 2016
  • The purpose of this study was to investigate the effects of ionized calcium treatment on total bacterial cross-contamination of chicken carcass surface in the slaughtering process. The growth of Escherichia coli was strongly inhibited in a medium prepared by using a 0.5% ionized calcium solution. The total bacterial cross-contamination of chicken carcass surface and the scalding water was significantly increased as the number of scalding was increased (p<0.05). The total bacterial cross-contamination of chicken carcass surface reached a plateau without a further increase as scalding was performed consecutively for 10 or more times. The total bacterial cross-contamination of the scalding water was significantly increased as the number of scalding was increased (p<0.05). The total bacterial cross-contamination of chicken carcass surface of the chickens raised on a floor type farm was significantly higher than that of the chickens raised in a battery cages (p<0.05). The total bacterial cross-contamination of chicken carcass surface of the chickens raised on a floor type farm was significantly lower in the 0.5% ionized calcium solution treatment group than in the control group (p<0.05).

Effect of Ar ion Sputtering on the Surface Electronic Structure of Indium Tin Oxide

  • Lee, Hyunbok;Cho, Sang Wan
    • Applied Science and Convergence Technology
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    • 제25권6호
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    • pp.128-132
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    • 2016
  • We investigated the effect of Ar ion sputtering on the surface electronic structure of indium tin oxide (ITO) using X-ray and ultraviolet photoelectron spectroscopy (XPS and UPS) measurements with increasing Ar ion sputtering time. XPS measurements revealed that surface contamination on ITO was rapidly removed by Ar ion sputtering for 10 s. UPS measurements showed that the work function of ITO increased by 0.2 eV after Ar ion sputtering for 10 s. This increase in work function was attributed to the removal of surface contamination, which formed a positive interface dipole relative to the ITO substrate. However, further Ar ion sputtering did not change the work function of ITO although the surface stoichiometry of ITO did change. Therefore, removing the surface contamination is critical for increasing the work function of ITO, and Ar ion sputtering for a short time (about 10 s) can efficiently remove surface contamination.

The Effects of Organic Contamination and Surface Roughness on Cylindrical Capacitors of DRAM during Wet Cleaning Process

  • Ahn, Young-Ki;Ahn, Duk-Min;Yang, Ji-Chul;Kulkarni, Atul;Choi, Hoo-Mi;Kim, Tae-Sung
    • 반도체디스플레이기술학회지
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    • 제10권3호
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    • pp.15-19
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    • 2011
  • The performance of the DRAM is strongly dependent on the purity and surface roughness of the TIT (TiN/Insulator/ TiN) capacitor electrodes. Hence, in the present study, we evaluate the effects of organic contamination and change of surface roughness on the cylindrical TIT capacitor electrodes during the wet cleaning process by various analytical techniques such as TDMS, AFM, XRD and V-SEM. Once the sacrificial oxide and PR (Photo Resist) are removed by HF, the organic contamination and surface oxide films on the bottom Ti/TiN electrode become visible. With prolonged HF process, the surface roughness of the electrode is increased, whereas the amount of oxidized Ti/TiN is reduced due to the HF chemicals. In the 80nm DRAM device fabrication, the organic contamination of the cylindrical TIT capacitor may cause defects like SBD (Storage node Bridge Defect). The SBD fail bit portion is increased as the surface roughness is increased by HF chemicals reactions.

병원 화장실의 방사성 오염에 관한 연구 (A Study of Radioactive Contamination in Hospital Toilet)

  • 김기진;김가중
    • 대한안전경영과학회지
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    • 제17권4호
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    • pp.241-246
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    • 2015
  • Generally a patient who was injected radiopharmaceuticals for nuclear medicine examination is not an object of isolation. Therefore, when the patient uses toilet, we expect surface contamination of a toilet by radioisotope. The measured value is $25.69Bq/cm^2$(a restroom near admission and administration), $19.39Bq/cm^2$(a toilet near department of radiology). The study shows that 9 of 24 locations in controlled area exceed over surface contamination limit. From now on, we should find source of contamination through measurement radioactive nuclide to apply radiation safety management.

ESS 안전성 개선을 위한 결로 운전 조건 고려 고체절연물 연면 절연파괴특성 분석 (Analysis on Solid Insulator Flashover Characteristics on Moisture Contamination for Electrical Insulation Improvement of ESS)

  • 김진태;이승용;김지영;석복렬
    • KEPCO Journal on Electric Power and Energy
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    • 제7권2호
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    • pp.317-321
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    • 2021
  • As the large-scale renewable energy power plant increases, the high-capacity and compact Energy Storage System (ESS) is required. However, this trend could reduce the insulation reliability of ESS. In this study, the surface flashover characteristics for four types of solid insulators are investigated in the uniform electric field with AC and Lightning Impulse (LI) voltage waveforms under various contamination levels. In addtion, insulator surfaces are compared based on the contact angle before and after surface flashover. The experimental results show that AC flashover voltage is dependent on the materials and the contamination level, but LI flashover voltage is only associated with the contamination level. Especially, AC flashover voltage of PC (PolyCarbonate) is higher than that of other insulators, which is associated with the unique and sequential creepage discharge propagation pattern of PC. The localized discharges on the surface of PC form corresponding tracking points. Then, the interconnected trackings result in the complete flashover. This flashover patterns degrade the surface of PC much more than that of epoxy and Bulk Molding Compoud (BMC). Thus, the contact angle of PC is significantly reduced compared to that of other insulators. The increased hydrophilicity in the surface of PC enhances the insulator surface conductivity.

치과의료기관 의료장비 표면 및 치과위생사 손의 Staphylococcus epidermidis 오염도 조사 (Survey of Staphylococcus epidermidis Contamination on the Hands of Dental Hygienists and Equipment Surface of Dental Clinics)

  • 김설희
    • 치위생과학회지
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    • 제17권6호
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    • pp.472-480
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    • 2017
  • 치과의료기관 의료장비 표면 및 치과위생사 손의 S. epidermidis 오염도 조사를 위해 2017년 7월부터 8월까지 일부지역 20개 치과의원에서 치과위생사 20인의 손 오염, 치과별 7부위 표면 140부위의 S. epidermidis 오염도를 조사하였다. S. epidermidis 오염도는 핸드플레이트와 로닥플레이트를 사용하였으며, $35^{\circ}C$ 24시간 배양하였다. 손 오염도는 핸드플레이트 기준에 근거하여 저, 중, 고 그룹으로 분류한 후 그룹별 손 부위별 오염도를 ANOVA 분석하였다. 의료장비 표면 오염수준은 집락을 계수하여 기술통계 하였다. 치과위생사 55%는 중등도 이상의 손 오염이 있었고, 부위별로는 손바닥이 29.45 CFU로 가장 높게 나타났으며, 그 다음으로는 중지 7.8 CFU, 약지 6.4 CFU, 엄지 6 CFU 순서였다. 의료장비 표면 오염도 조사결과 3-way 손잡이 4.45 CFU, 컴퓨터 마우스 3.37 CFU, 거울 손잡이 1.60 CFU로 다른 영역보다 높게 조사되었다. 손 오염도가 높은 집단일수록 손의 S. epidermidis 오염도가 높은 양적 상관관계를 나타내었다. S. epidermidis 오염도는 의료장비 표면 오염보다 손에서 높게 나타났다. 그러므로 의료진들은 손 위생의 중요성을 인식하고 WHO에서 제시한 방법으로 손 위생을 실천하는 것이 요구되었다. 의료진들이 감염관리 업무수행에 책임감을 갖고 안전한 의료 환경을 조성할 수 있도록 감염관리 지침과 체계적인 감염관리 업무 수행에 관한 교육이 요구되었다.

플라즈마 식각에 의하여 실리콘 표면에 유기된 불순물 오염의 분석 및 제거 (Analysis and Reduction of Impurity Contamination Induced by Plasma Etching on Si Surface)

  • 조선희;이원종
    • 한국전기전자재료학회논문지
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    • 제19권12호
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    • pp.1078-1084
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    • 2006
  • Impurity contamination induced by $CF_4\;and\;HBr/Cl_2/O_2$ plasma etching on Si surface was examined by using surface spectroscopes. XPS(x-ray photoelectron spectroscopy) surface analysis showed that F of 0.4 at % exists in the surface layer in the form of Si-F bonding but Br and Cl are below the detection limit $(0.1{\sim}1.0%)$ of the spectroscope. Static-SIMS(secondary ion mass spectrometry) surface analysis showed that the etched Si surface was contaminated with etching gas elements such as H, F, Cl and Br, and they existed to the depth of about $20{\sim}40nm$. The etched Si surface was treated with three different methods that were HF dip, thermal oxidation followed by HF dip and oxygen-plasma oxidation followed by HF dip. They showed an effect in reducing the impurity contamination and the oxygen-plasma oxidation followed by HF dipping method appears to be a little bit more effective.

타액에 의한 오염이 상아질 접착제의 미세전단결합강도에 미치는 영향 (EFFECT OF SALIVARY CONTAMINATION OF TEETH ON MICROTENSILE BOND STRENGTH OF VAR10US DENTIN BONDING SYSTEMS.)

  • 최경규;류길주
    • Restorative Dentistry and Endodontics
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    • 제28권3호
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    • pp.203-208
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    • 2003
  • The purpose of this study was to evaluate the effect of salivary contamination of teeth on bonding efficacy of self-priming and self-etching DBSs. The materials used were Single Bond(SB, self-priming system, 3M), Unifil Bond(UB, self-etching system, GC), and Scotchbond Multi-Purpose Plus(SM, 3M) as control. Forty five human molars randomly allocated to three groups as dentin bonding systems tested and embedded in epoxy resin. Then the specimens were wet-ground to expose flat buccal enamel surface or flat occlusal dentin surface and cut bucco-lingually to form two halves with slow speed diamond saw. One of them was used under non-contamination, other under contamination with saliva. The bonding procedure was according to the manufacturer's directions and resin composite(Z-100, 3M Dental Products, St. Paul, MN) was built-up on the bonded surface 5mm high. The specimens were ground carefully at the enamel-composite interface with fine finishing round diamond bur to create an hour-glass shape yielding bonded surface areas of $1.5{\pm}0.1\textrm{mm}^2$. The specimens were bonded to the modified microtensile testing apparatus with cyanoacrylate, attached to the universal testing machine and stressed in tension at a CHS of 1mm/min. The tensile force at failure was recorded and converted to a tensile stress(MPa). Mean values and standard deviations of the bond strength are listed in table. One-way ANOVA was used to determine significant difference at the 95% level. The bond strength of SBMP and SB were not affected by salivary contamination, but that of UB was significantly affected by salivary contamination. These results indicate that DBSs with total etch technique seems less likely affected by salivary contamination in bonding procedure.

데이터 저장용 디스크의 회전 시 입자이탈에 관한 실험적 연구 (An Investigation of Particle Detachment Ratios From Rotating Data Storage Disks)

  • 박희성;이대영;황정호;김광;장동섭
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2001년도 춘계학술대회논문집D
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    • pp.585-588
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    • 2001
  • Particle contamination on the data storage disks has been a serious problem for magnetic hard disk drive manufacturers. For high storage optical disks, such as DVD-ROM/RAM or NFR (near field recording) system, particle-induced damages can be also detected because only a few micrometer particles can prevent read/write signal from optical lens. The increasing areal density and smaller bit size accelerates particle induced damages on the optical disk. One of the methods to prevent particle contamination on the optical disk surface is to handle the disk enclosed in a cartridge like a modern DVD-RAM disk. However, even for a perfectly sealed disk drive, particles are found inside the drive. The other method is to improve disk surface characteristics. Particle contamination on the surface can be reduced by proper selection of disk coating materials. [n this paper, particle detachment ratios for CD (compact disk), DVD (digital versatile disk), HD (magnetic hard disk), HD with Jut lubricant, and aluminosilicate substrate HD were investigated. Surface roughness and surface energy of the test disks were compared with the particle detachment ratios. Proper substrate and lubricant characteristics to reduce particle contamination on the disk surface were found.

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여러 가지 오손에 따른 고분자애자의 표면방전 스펙트럼 분석 (Spectrum Analysis of Surface Discharge for Polymer Insulator According to Various Contamination)

  • 박재준
    • 정보학연구
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    • 제8권1호
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    • pp.113-118
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    • 2005
  • Investigation of surface discharge characteristics of surface leakage on polluted EPDM insulator have been performed. This work was performed utilizing High Frequency Current Trans former to monitor surface discharge. It was found that there were significant variation in the surface discharge waveform frequency spectrum, depending both on the surface discharge magnitude and more importantly on the duration of surface discharge activity.

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