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http://dx.doi.org/10.4313/JKEM.2006.19.12.1078

Analysis and Reduction of Impurity Contamination Induced by Plasma Etching on Si Surface  

Cho, Sun-Hee (한국과학기술원 신소재공학과)
Lee, Won-Jong (한국과학기술원 신소재공학과)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.19, no.12, 2006 , pp. 1078-1084 More about this Journal
Abstract
Impurity contamination induced by $CF_4\;and\;HBr/Cl_2/O_2$ plasma etching on Si surface was examined by using surface spectroscopes. XPS(x-ray photoelectron spectroscopy) surface analysis showed that F of 0.4 at % exists in the surface layer in the form of Si-F bonding but Br and Cl are below the detection limit $(0.1{\sim}1.0%)$ of the spectroscope. Static-SIMS(secondary ion mass spectrometry) surface analysis showed that the etched Si surface was contaminated with etching gas elements such as H, F, Cl and Br, and they existed to the depth of about $20{\sim}40nm$. The etched Si surface was treated with three different methods that were HF dip, thermal oxidation followed by HF dip and oxygen-plasma oxidation followed by HF dip. They showed an effect in reducing the impurity contamination and the oxygen-plasma oxidation followed by HF dipping method appears to be a little bit more effective.
Keywords
Plasma etching; Impurity contamination; Post-treatment; Static-SIMS;
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