• 제목/요약/키워드: substrates temperature

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Low Temperature PECVD for SiOx Thin Film Encapsulation

  • Ahn, Hyung June;Yong, Sang Heon;Kim, Sun Jung;Lee, Changmin;Chae, Heeyeop
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.198.1-198.1
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    • 2016
  • Organic light-emitting diode (OLED) displays have promising potential to replace liquid crystal displays (LCDs) due to their advantages of low power consumption, fast response time, broad viewing angle and flexibility. Organic light emitting materials are vulnerable to moisture and oxygen, so inorganic thin films are required for barrier substrates and encapsulations.[1-2]. In this work, the silicon-based inorganic thin films are deposited on plastic substrates by plasma-enhanced chemical vapor deposition (PECVD) at low temperature. It is necessary to deposit thin film at low temperature. Because the heat gives damage to flexible plastic substrates. As one of the transparent diffusion barrier materials, silicon oxides have been investigated. $SiO_x$ have less toxic, so it is one of the more widely examined materials as a diffusion barrier in addition to the dielectric materials in solid-state electronics [3-4]. The $SiO_x$ thin films are deposited by a PECVD process in low temperature below $100^{\circ}C$. Water vapor transmission rate (WVTR) was determined by a calcium resistance test, and the rate less than $10.^{-2}g/m^2{\cdot}day$ was achieved. And then, flexibility of the film was also evaluated.

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측정 온도 변화에 따른 백금실리사이드 정류성 접합의 파라미터 분석 (Parameter Analysis of Platinum Silicide Rectifier Junctions acceding to measurement Temperature Variations)

  • 장창덕;이용재
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 1998년도 춘계종합학술대회
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    • pp.405-408
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    • 1998
  • 본 논문에서는, 백금 실리사이드와 실리콘 접합에서 n형 실리콘 기판의 농도와 온도 변화(상온, 55$^{\circ}C$, 75$^{\circ}C$)에 따라서 전류-전압 특성을 분석하였다. 측정한 전기적 파라미터들은 순방향 임계전압, 역방향 항복전압, 장벽높이(øbn), 포화전류, 이상인자와 동적저항의 변화이다. 결과로써, 기판 농도의 변화에 따라서는 순방향 임계전압, 역방향 항복전압, 장벽 높이, 동적저항은 감소하였으나 포화전류와 이상인자는 증가하였다. 온도 변화에 따라서는 역방향 항복전압과 동적저항이 증가하였다.

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As과 Ga 빔 조사에 의해 세척된 Si(100) 기판 위에 GaAs 에피층 성장과 RHEED 패턴 (GaAs Epilayer Growth on Si(100) Substrates Cleaned by As/Ga Beam and Its RHEED Patterns)

  • 임광국;김민수;임재영
    • 한국표면공학회지
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    • 제43권4호
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    • pp.170-175
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    • 2010
  • The GaAs epitaxial layers were grown on Si(100) substrates by molecular beam epitaxy(MBE) using the two-step method. The Si(100) substrates were cleaned with different surface cleaning method of vacuum heating, As-beam, and Ga-beam at the substrate temperature of $800^{\circ}C$. Growth temperature and thickness of the GaAs epitaxial layer were $800^{\circ}C$ and 1 ${\mu}m$, respectively. The surface structure and epitaxial growth were observed by reflection high-energy electron diffraction(RHEED) and scanning electron microscope(SEM). Just surface structure of the Si(100) substrate cleaned by Ga-beam at $800^{\circ}C$ shows double domain ($2{\times}1$). RHEED patterns of the GaAs epitaxial layers grown on Si(100) substrates with cleaning method of vacuum heating, As-beam, and Ga-beam show spot-like, ($2{\times}4$) with spot, and clear ($2{\times}4$). From SEM, it is found that the GaAs epitaxial layers grown on Si(100) substrates with Ga-beam cleaning has a high quality.

사출압축성형을 통한 광디스크 기판 성형 및 복굴절의 측정 (Measurement of Birefringence Distribution in Optical Disk Substrates Fabricated by Injection-Compression Molding)

  • 김종성
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 1999년도 춘계학술대회논문집
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    • pp.218-224
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    • 1999
  • It is necessary to improve mechanical and optical properties in the optical disk substrates as the information storage devices with high storage density using short wavelength laser are being developed. Injection compression molding is regarded as the most suitable process to manufacture optical disk substrates with high is regarded as the most suitable process to manufacture optical disk substrates with high dimensional accuracy low residual stresses and superb optical properties In the present study polycarbonate optical disk substrates were fabricated by injection compression molding and the birefringence regarded as one of the most important optical properties for optical disk is measured. The effects of various processing conditions upon the development of birefringence distribution were examined experimentally. It was found that the value of the birefringence distribution were very sensitive to the mold wall temperature history and the variance of the birefringence distribution in the radial direction was affected by the level of the packing and the compression pressure.

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LOW TEMPERATURE DIAMOND GROWTH USING MICROWAVE PLASMA CVD

  • Sakamoto, Yukihiro;Takaya, Matsufumi;Shinohara, Kibatsu
    • 한국표면공학회지
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    • 제29권5호
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    • pp.487-493
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    • 1996
  • Diamond films were grown at lower temperatures (630-813K) on Si, Al (1100P), and Al-Si(8A, 8B, BC) alloy substrates using improved microwave plasma CVD apparatus in a mixed methane and hydrogen plasma. Improved microwave plasma CVD apparatus equipped water cooled substrate holder and the substrates were set up lower position than bottom line of the applicator waveguide. When the methane concentration was high and growth was conducted at lower pressures the diamond films were synthesized. Moreover the deposits on the scratched substrates formed flat surfaces consisting of fine grains. XRD results, the deposits were identified to cubic diamond. An analysis using Raman spectroscopy, further confirmed that diamond films deposited on the Si substrates were high quality. The deposits on the Al substrates, in contrast, contained amorphous carbon. While the quality of the deposits on the Al-Si substrates were differed with the substrate alloys.

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The ink jet printing of high conductivity circuits on various substrates using polymer capped nano-particle silver

  • Edwards, Charles O.;Howarth, James;James, Anthony
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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    • pp.814-816
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    • 2005
  • In this paper, we describe how specially developed polymer capped, nano-particle silver inks can be used to print circuitry for applications like displays, RFID antennas and "disposable electronics". The requirements of printing on temperature sensitive flexible substrates (such as polymer films and papers) that require low temperature curing is also discussed.

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Low temperature pulsed ion shower doping for poly-Si TFT on plastic

  • Kim, Jong-Man;Hong, Wan-Shick;Kim, Do-Young;Jung, Ji-Sim;Kwon, Jang-Yeon;Noguchi, Takashi
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.95-97
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    • 2004
  • We studied a low temperature ion doping process for poly-Si Thin Film Transistor (TFT) on plastic substrates. The ion doping process was performed using an ion shower system, and subsequently, excimer laser annealing (ELA) was done for the activation. We have studied the crystallinity of Si surface at each step using UV-reflectance spectroscopy and the sheet resistance using 4-point probe. We found that the temperature has increased during ion shower doping for a-Si film and the activation has not been fulfilled stably because of the thermal damage against the plastic substrate. By trying newly a pulsed ion shower doping, the ion was efficiently incorporated into the a-Si film on plastic substrate. The sheet resistance decreased with the increase of the pulsed doping time, which was corresponded to the incorporated dose. Also we confirmed a relationship between the crystallinity and the sheet resistance. A sheet resistance of 300 ${\Omega}$/sq for the Si film of 50nm thickness was obtained with a good reproducibility. The ion shower technique is a promising doping technique for ultra low temperature poly-Si TFTs on plastic substrates as well as those on glass substrates.

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Lead free, Low temperature sealing materials for soda lime glass substrates in Plasma Display Panel (PDP)

  • Lee, Heon-Seok;Hwang, Jong-Hee;Lim, Tae-Young;Kim, Yoon-Hee;Lee, Suk-Hwa;Kim, Il-Won;Lee, Jong-Koo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.373-376
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    • 2008
  • New glass compositions for lead free, low temperature sealing glass frit was examined in $ZnO-V_2O_5-P_2O_5$ glass system which can be used sealing material for PDP to be made of soda lime glass substrates. Among many glass compositions, KFS-C glass showed low glass transition point (Tg) and good fluidity and adhesion characteristics when it was tested by flow button method at low temperature of $420^{\circ}C$. Its Tg was $317^{\circ}C$ and thermal expansion coefficient (CTE) was $70{\times}10^{-7}/K$. The glass frit was mixed with an organic vehicle to make a paste and it was dispensed and sealed with soda lime glass substrates at $420^{\circ}C$ for 10min. Sealed glass panels also showed good adhesion strength even sealed at low temperature of $420^{\circ}C$.

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유도결합 플라즈마(ICP) Sputtering에 의한 평판 디스플레이(FPD)용 ITO 박막의 저온 증착 (Low Temperature Deposition of ITO Thin Films for Flat Panel Displays by ICP Assisted DC Magnetron Sputtering)

  • 구범모;정승재;한영훈;이정중;주정훈
    • 한국표면공학회지
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    • 제37권3호
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    • pp.146-151
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    • 2004
  • Indium tin oxide (ITO) is widely used to make a transparent conducting film for various display devices and opto-electric devices. In this study, ITO films on glass substrate were fabricated by inductively coupled plasma (ICP) assisted dc magnetron sputtering. A two-turn rf coil was inserted in the process chamber between the substrate and magnetron for the generation of ICP. The substrates were not heated intentionally. Subsequent post-annealing treatment for as-deposited ITO films was not performed. Low-temperature deposition technique is required for ITO films to be used with heat sensitive plastic substrates, such as the polycarbonate and acrylic substrates used in LCD devices. The surface roughness of the ITO films is also an important feature in the application of OLEDs along with the use of a low temperature deposition technique. In order to obtain optimum ITO thin film properties at low temperature, the depositions were carried out at different condition in changing of Ar and $O_2$ gas mixtures, ICP power. The electrical, optical and structural properties of the deposited films were characterized by four-point probe, UV/VIS spectrophotometer, atomic force microscopy(AFM) and x-ray diffraction (XRD). The electrical resistivity of the films was -l0$^{-4}$ $\Omega$cm and the optical transmittance in the visible range was >85%. The surface roughness ( $R_{rms}$) was -20$\AA$.>.

폐쇄형 하우스를 이용한 인삼 재배에서 상토의 조성이 2년 근 인삼의 생육 및 수량에 미치는 영향 (Effects of Various Bed Soil Substrates on the Growth and Yield of 2-Year-Old Ginseng Grown in the Closed Plastic House)

  • 최재을;이누리;조서리;김정선;최영규
    • 한국약용작물학회지
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    • 제20권4호
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    • pp.217-221
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    • 2012
  • This research was conducted to investigate the influence of various organic substrates on growth and yield of ginseng seedling grown organically in the closed plastic house. The pH and EC of substrates used for organically ginseng cultivation ranged 5.93~6.78 and 0.03~0.15 dS/m respectively. The concentrations $NH_4$-N and $NO_3$-N respectively was 14.01~68.63 mg/L, 5.60~58.83 mg/L. The average quantum of the closed plastic house was range from 10 to 16% of natural light. In July and August, the maximum temperature of the closed plastic house did not exceed 30 and the average temperature was maintained within 25 lower than the field because air conditioning ran. The PPV-1 and PPV-2 bed soil substrates produced higher stem length, stem diameter, shoot fresh weight and leaf area than those of conventional culture. In PPV-2 bed soil substrates, root fresh weight and root diameter was the highest. The root fresh weight of PPV-2 bed soil substrates in closed plastic house was maximum 25% heavier than the conventional cultivation. The results of this experiment will be utilized for making new substrate application for organic ginseng culture in the plastic house.