• Journal of Korean Society for Quality Management
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• v.40 no.3
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• pp.337-346
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• 2012

Purpose: A Control chart is one of the important statistical process control tools that can improve processes by reducing variability and defects. Methods: In the present study, we propose the local $T^2$ multivariate control chart that can efficiently detect abnormal observations by considering the local pattern of the in-control observations. Results: A simulation study has been conducted to examine the property of the proposed control chart and compare it with existing multivariate control charts. Conclusion: The results demonstrate the usefulness and effectiveness of the proposed control chart.

• Journal of Korean Society for Quality Management
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• v.33 no.1
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• pp.1-10
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• 2005

This paper develops a new VSI $\={X}-CRL$ synthetic control chart that considers convenience of use in the field, and perception of change of process applying VSI techniques to synthetic control chart, simultaneously. We found the optimal sampling interval and various control limit factor of the suggested chart using markov chain. Comparison and analysis is carried out between synthetic VSI $\={X}-CRL$ chart and other chart in the statistical aspect; $\={X}$ control chart, VSI $\={X}$ chart, another synthetic chart. In case that the process follows normal distribution, the proposed VSI $\={X}-CRL$ synthetic control chart in detecting process mean shift showed the best performance in aspect of statistical performance, regardless of control limit L of CRL/S control chart.

• Proceedings of the Korean Society for Quality Management Conference
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• 2007.04a
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• pp.302-309
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• 2007

To conduct statistical process control needs the assumption that the process data are independent. However, most of chemical processes, like a semi-conduct processes do not satisfy the assumption because of autocorrelation. It causes abnormal out of control signal in the process control and misleading process capability. In this study, we introduce that Shore's method to solve the problem and to find the optimal subgroup size to estimate variance for AR(l) model. Especially, we focus on finding an actual subgroup size for small samples using simulation. It may be very useful for statistical process control to analyze process capability and to make a Shewhart chart properly.

• 제어로봇시스템학회:학술대회논문집
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• 1997.10a
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• pp.1516-1519
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• 1997

With disseminationof Distributed Control Systems(DCS), the huge amounts of process operation data could have been available and led to figure out process behaviors better on the statistical basis. Until now, the statistical modeling technology has been susally applied to process monitoring and fault diagnosis. however, it has been also thought that these process information, extracted from statistical analysis, might serve a great opportunity for process operation improvements and process improvements. This paper proposed a general methodolgy for process operation improvements including data analysis, backing up the result of analysis based on the methodology, and the mapping physical physical phenomena to the Principal Components(PC) which is the most distinguished feature in the methodology form traditional statistical analyses. The application of the proposed methodology to the Balst Furnace(BF) process has been presented for details. The BF process is one of the complicated processes, due to the highly nonlinear and correlated behaviors, and so the analysis for the process based on the mathematical modeling has been very difficult. So the statisitical analysis has come forward as a alternative way for the useful analysis. Using the proposed methodology, we could interpret the complicated process, the BF, better than any other mathematical methods and find the direction for process operation improvement. The direction of process operationimprovement, in the BF case, is to increase the fludization and the permeability, while decreasing the effect of tapping operation. These guide directions, with those physical meanings, could save fuel cost and process operator's pressure for proper actions, the better set point changes, in addition to the assistance with the better knowledge of the process. Open to set point change, the BF has a variety of steady state modes. In usual almost chemical processes are under the same situation with the BF in the point of multimode steady states. The proposed methodology focused on the application to the multimode steady state process such as the BF, consequently can be applied to any chemical processes set point changing whether operator intervened or not.

• Journal of Korean Institute of Industrial Engineers
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• v.40 no.1
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• pp.43-51
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• 2014

Statistical process control (SPC) is an important technique for monitoring and managing the manufacturing process. In spite of its easiness and effectiveness, some problematic sides of application exist such that the SPC techniques are hardly reflect the changes of the process conditions. Especially, update of control limits at the right time plays an important role in acquiring a reasonable performance of control charts. Therefore, we propose the control chart performance evaluation index (CPEI) based on count data model to monitor and manage the performance of control charts. The CPEI could indicate the degree of control chart performance and be helpful to detect the proper update cycle of control limits in real time. Experiments using real manufacturing data show that the proper update intervals are made by proposed method.

• Journal of Institute of Control, Robotics and Systems
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• v.4 no.2
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• pp.246-255
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• 1998

This paper presents a novel method for real-time malfunction detection of plasma etching process using EPD signal traces. First, many reference EPD signal traces are collected using monochromator and data acquisition system in normal etching processes. Critical points are defined by applying differentiation and zero-crossing method to the collected reference signal traces. Critical parameters such as intensity, slope, time, peak, overshoot, etc., determined by critical points, and frame attributes transformed signal-to symbol of reference signal traces are saved. Also, UCL(Upper Control Limit) and LCL(Lower Control Limit) are obtained by mean and standard deviation of critical parameters. Then, test EPD signal traces are collected in the actual processes, and frame attributes and critical parameters are obtained using the above mentioned method. Process malfunctions are detected in real-time by applying SPC(Statistical Process Control) method to critical parameters. the Real-time malfunction detection method presented in this paper was applied to actual processes and the results indicated that it was proved to be able to supplement disadvantages of existing quality control check inspecting or testing random-selected devices and detect process malfunctions correctly in real-time.

• IE interfaces
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• v.20 no.2
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• pp.94-102
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• 2007

Portfolio management deals with decision making on 'when' and 'how' to revise an existing portfolio. In this paper, we show that a classical statistical process control (SPC) chart for normal data, a wellestablished tool in quality engineering, can effectively be used for signaling times for revising a portfolio. Noting that the day-to-day performance of a portfolio may be auto-correlated, we use the exponentially weighted moving average center-line chart to develop an automatic portfolio management procedure. The portfolio management procedure is extensively tested on historical data of equities traded in the Korea Exchange (KRX), the American Stock Exchange (AMEX), and the New York Stock Exchange (NYSE). In comparison with the performances of the KOSPI, XAX, and NYA indices during the same time periods, results from these experiments show that SPC chart-based portfolio revision presents itself a convenient and reliable method for optimally managing portfolios.

• IE interfaces
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• v.16 no.3
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• pp.344-351
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• 2003

Critical dimension is one of the most important characteristics of up-to-date integrated circuit devices. Hence, critical dimension control in a semiconductor wafer fabrication process is inevitable in order to achieve optimum device yield as well as electrically specified functions. Currently, in complex semiconductor wafer fabrication processes, statistical methodologies such as Shewhart-type control charts become crucial tools for practitioners. Meanwhile, given a critical dimension sampling plan, the analysis of variance technique can be more effective to investigating critical dimension variation, especially for on-chip and on-wafer variation. In this paper, relating to a typical sampling plan, linear statistical models are presented for the analysis of critical dimension variation. A case study is illustrated regarding a semiconductor wafer fabrication process.

• Communications for Statistical Applications and Methods
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• v.17 no.3
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• pp.357-365
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• 2010

This paper considers the integrated process control procedure for detecting special causes in an IMA(1,1) noise process that is being adjusted using a minimum mean squared error adjustment. As a SPC procedure, we use a GLR chart for detecting special causes whose effects are the sustained shift or the sustained drift in the process mean, and the sustained shift in the process variance. For the design of the GLR chart, we derive expressions for the control limit which accurately satisfies the given in-control ARL.

• Journal of the Korean Data and Information Science Society
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• v.22 no.4
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• pp.679-690
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• 2011

Two widely used approaches for improving the quality of the output of a process are statistical process control (SPC) and automatic process control (APC). In recent hybrid processes that combine aspects of the process and parts industries, process variations due to both the inherent wandering and special causes occur commonly, and thus simultaneous application of APC and SPC schemes is needed to effectively keep such processes close to target. The simultaneous implementation of APC and SPC schemes is called integrated process control (IPC). In the IPC procedure, the output variables are monitored during the process where adjustments are repeatedly done by its controller. For monitoring the APC-controlled process, control charts can be generally applied to the output variable. However, as an alternative, some authors suggested that monitoring the input variable may improve the chance of detection. In this paper, we evaluate the performance of several monitoring statistics, such as the output variable, the input variable, and the difference variable, for efficiently monitoring the APC-controlled process when we assume IMA(1,1) noise model with a minimum mean squared error adjustment policy.