• 제목/요약/키워드: statistical experiment design

검색결과 308건 처리시간 0.022초

Assessment and Interpretation of Bioequivalence for Two Drug Formulations using Crossover Design

  • Ko, Seoung-gon;Oh, Hyun-Sook
    • Communications for Statistical Applications and Methods
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    • 제6권2호
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    • pp.601-610
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    • 1999
  • Crossover design is officially except for special occasions recommended by KFDA and FDA for assessing Bioequivalence between two drugs one for reference and the other for innovator. Such design is regarded as a special case of latin square split-polt or repeated measurement design and its main difference with other designing methods is that each subject in an experiment is exposed two drugs in sequence. Therefore general statistical analysis is not suitable since the model for this experiment includes carryover effect in addition to period and sequence effect. in this paper analysis for crossover model with two drugs and its interpretation are mainly discussed and an example is given for illustration.

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통계적 실험계획법을 이용한 액정표시기용 다결정 실리콘 박막트랜지스터의 최적화 설계 (Robustic design of poly-Si TFT for LCD using statistical design of experiment)

  • 이현중;배경진;이종근;박세근
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 1998년도 하계종합학술대회논문집
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    • pp.507-510
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    • 1998
  • Performance of AMLCD pixels depends on the electrical characteristics of thin film transistor switches. The high quality of LCD can be obtained by minimizing the process and device variations of TFT. The effect of process and device factors on poly-Si TFT characteristics are calculated by ATHENA and ATLAS, and the optimized design windows based on statistical design of experiment are suggested for high performance 20 inch LCD are suggested for high performance 20 inch LCD monitors.

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Characterization of Photoresist Processing by Statistical Design of Experiment (DOE)

  • Kim, Gwang-Beom;Park, Jae-Hyun;Soh, Dae-Wha;Hong, Sang-Jeen
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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    • pp.43-44
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    • 2005
  • SU-8 is a epoxy based photoresist designed for MEMS applications, where a thick, chemically and thermally stable image is desired. But SU-8 has proven to be very sensitive to variation in processing variables and hence difficult to use in the fabrication of useful structures. In this paper, negative SU-8 photoresist processed has been characterized in terms of delamination. Based on a full factorial designed experiment. Employing the design of experiment (DOE), a process parameter is established, and analyzing of full factional design is generated to investigate degree of delamination associated with three process parameters: post exposure bake (PEB) temperature, PEB time, and exposure energy. These results identify acceptable ranges of the three process variables to avoid delamination of SU-8 film, which in turn might lead to potential defects in MEMS device fabrication.

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Characterization of Negative Photoresist Processing by Statistical Design of Experiment (DOE)

  • Mun Sei-Young;Kim Gwang-Beom;Soh Dea-Wha;Hong Sang Jeen
    • Journal of information and communication convergence engineering
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    • 제3권4호
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    • pp.191-194
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    • 2005
  • SU-8 is a epoxy based photoresist designed for MEMS applications, where a thick, chemically and thermally stable image are desired. However SU-8 has proven to be very sensitive to variation in processing variables and hence difficult to use in the fabrication of useful structures. In this paper, negative SU-8 photoresist processed has been characterized in terms of delamination, based on a full factorial designed experiment. Employing the design of experiment (DOE), a process parameter is established, and analyzing of full factorial design is generated to investigate degree of delamination associated with three process parameters: post exposure bake (PEB) temperature, PEB time, and exposure energy. These results identify acceptable ranges of the three process variables to avoid delamination of SU-8 film, which in turn might lead to potential defects in MEMS device fabrication.

실험계획법을 이용한 대구경용 코발트 박막의 스퍼터 조건 최적화 (Optimizing the Cobalt Deposition Condition using the Experiment Design)

  • 정성희;송오성
    • 한국자기학회지
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    • 제12권6호
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    • pp.224-230
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    • 2002
  • 직경 200mm의 실리콘 기판에 균일한 코발트 금속박막을 증착하는 DC-스퍼터 장비에서 공정변수는 증착온도, 증착압력, DC power로 하고 종속변수(response)는 면저항, 면저항 균일도로 하는 '||'&'||'quot;통계적 실험방법'||'&'||'quot;을 채택한 실험을 수행하여 Co 박막의 공정 특성에 대해 다음과 같은 결과를 얻었다 '||'&'||'quot;통계적 실험방법'||'&'||'quot;을 이용한 Co박막의 공정 특성을 조사하는 본 실험에서 면저항과 면저항 균일도는 0.05 이하의 significance수치. 낮은 RMS error, 0.91 이상의 R-sq수치로부터 실험의 우수한 신뢰성을 확인하였다. 면저항에 대한 공정변수의 영향성은 증착온도가 -1.83$\Omega$/$\square$의 감소효과, 증착압럭이 1.17$\Omega$/$\square$의 증가 효과. DC power가 -0.65$\Omega$/$\square$의 감소 효과로 실험 구간에서 일정한 경향의 영향성을 보였으며, 면저항 균일도에서는 증착온도에 의해 $25^{\circ}C$~147$^{\circ}C$에서 -4.04%의 감소로 증착온도에 가장 민감함을 확인하였다. Co 박막의 최적 증착 조건은 증착온도 $25^{\circ}C$, 증착압력 12mTorr, DC power 1500 W로 예상되었다.

SQC, DOE 및 RE에서 확증적 데이터 분석(CDA)과 탐색적 데이터 분석(EDA)의 고찰 (Review of Confirmatoty Data Analysis and Exploratory Data Analysis in Statistical Quality Control, Design of Experiment and Reliability Engineering)

  • 최성운
    • 대한안전경영과학회:학술대회논문집
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    • 대한안전경영과학회 2010년도 춘계학술대회
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    • pp.253-258
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    • 2010
  • The paper reviews the methodologies of confirmatory data analysis(CDA) and exploratory data analysis(EDA) in statistical quality control(SQC), design of experiment(DOE) and reliability engineering(RE). The study discusses the properties of flexibility, openness, resistance and reexpression for EDA.

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Microstructure Characterization of TiO2 Photoelectrodes for dyesensitized Solar Cell using Statistical Design of Experiments

  • Lee, Sung-Joon;Cho, Il-Hwan;Kim, Hyun-Wook;Hong, Sang-Jeen;Lee, Hun-Yong
    • Transactions on Electrical and Electronic Materials
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    • 제10권5호
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    • pp.177-181
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    • 2009
  • Employing statistical design of experiments, we have performed studies on the characterization of electrodes using $TiO_2$ and process variables in the fabrication process of nanocrystalline dye sensitized solar cell. Systematic experiment to identify the effects of process variables on cell's efficiency has based on broad-band absorption of light by tailor made organometallic dye molecules dispersed on a high surface of $TiO_2$. Employing statistical design of experiment on $TiO_2$ photoelectrode forming process, structural characterization of electrodes and process variable have been investigated. Through the statistical analysis we have found that the particle size of $TiO_2$ and the amount of PEG/PEO are significantly affecting on the cell efficiency. In addition, a significant amount of interaction exists between the particle size and the amount of PEG/PEO.

Systemic Statistical Optimization of Astaxanthin Inducing Methods in Haematococcus pluvialis cells -Statistical Optimization of Astaxanthin Production in Haematococcus

  • Kim, Sun-Hyoung;Jeong, Sung Eun;Hong, Seong-Joo;Lee, Choul-Gyun
    • 한국해양바이오학회지
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    • 제6권1호
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    • pp.31-40
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    • 2014
  • The production of astaxanthin in the microalga Haematococcus pluvialis has been investigated using a sequential methodology based on the application of two types of statistical designs. The employed preliminary experiment was a fractional factorial design $2^6$ in which the factors studied were: excessive irradiance and nitrate starvation, phosphate deficiency, acetate supplementation, salt stress, and elevated temperature. The experimental results indicate that the amount of astaxanthin accumulation in the cells can be enhanced by excessive irradiance and nitrate starvation whereas the other factors tested did not yield any enhancement. In the subsequent experiment, a central composite design was applied with four variables, light intensity, nitrate, phosphate, and acetate, at five levels each. The optimal conditions for the highest astaxanthin production were found to be $1040{\mu}E/(m^2{\cdot}s)$ light intensity, 0.04 g/L nitrate, 0.31 g/L phosphate, 0.05 g/L acetate concentration.

Experimental Designs for Computer Experiments and for Industrial Experiments with Model Unknown

  • Fang, Kai-Tai
    • Journal of the Korean Statistical Society
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    • 제31권3호
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    • pp.277-299
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    • 2002
  • Most statistical designs, such as orthogonal designs and optimal designs, are based on a specific statistical model. It is very often that the experimenter does not completely know the underlying model between the response and the factors. In computer experiments, the underlying model is known, but too complicated. In this case we can treat the model as a black box, or model to be unknown. Both cases need a space filling design. The uniform design is one of space filling designs and seeks experimental points to be uniformly scattered on the domain. The uniform design can be used for computer experiments and also for industrial experiments when the underlying model is unknown. In this paper we shall introduce the theory and method of the uniform design and related data analysis and modelling methods. Applications of the uniform design to industry and other areas are discussed.