• Title/Summary/Keyword: silicon film

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Single Crystal Silicon Thin Film Transistor using 501 Wafer for the Switching Device of Top Emission Type AMOLEDs (SOI 웨이퍼를 이용한 Top emission 방식 AMOLEDs의 스위칭 소자용 단결정 실리콘 트랜지스터)

  • Chang, Jae-Won;Kim, Hoon;Shin, Kyeong-Sik;Kim, Jai-Kyeong;Ju, Byeong-Kwon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.4
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    • pp.292-297
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    • 2003
  • We fabricated a single crystal silicon thin film transistor for active matrix organic light emitting displays(AMOLEDs) using silicon on insulator wafer (SOI wafer). Poly crystal silicon thin film transistor(poly-Si TFT) Is actively researched and developed nowsdays for a pixel switching devices of AMOLEDs. However, poly-Si TFT has some disadvantages such as high off-state leakage currents and low field-effect mobility due to a trap of grain boundary in active channel. While single crystal silicon TFT has many advantages such as high field effect mobility, low off-state leakage currents, low power consumption because of the low threshold voltage and simultaneous integration of driving ICs on a substrate. In our experiment, we compared the property of poly-Si TFT with that of SOI TFT. Poly-Si TFT exhibited a field effect mobility of 34 $\textrm{cm}^2$/Vs, an off-state leakage current of about l${\times}$10$\^$-9/ A at the gate voltage of 10 V, a subthreshold slope of 0.5 V/dec and on/off ratio of 10$\^$-4/, a threshold voltage of 7.8 V. Otherwise, single crystal silicon TFT on SOI wafer exhibited a field effect mobility of 750 $\textrm{cm}^2$/Vs, an off-state leakage current of about 1${\times}$10$\^$-10/ A at the gate voltage of 10 V, a subthreshold slope of 0.59 V/dec and on/off ratio of 10$\^$7/, a threshold voltage of 6.75 V. So, we observed that the properties of single crystal silicon TFT using SOI wafer are better than those of Poly Si TFT. For the pixel driver in AMOLEDs, the best suitable pixel driver is single crystal silicon TFT using SOI wafer.

A Device Parameter Extraction Method for Thin Film SOI MOSFETs (얇은 박막 SOI (Silicon-On-Insulator) MOSFET 에서의 소자 변수 추출 방법)

  • Park, Sung-Kye;Kim, Choong-Ki
    • Proceedings of the KIEE Conference
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    • 1992.07b
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    • pp.820-824
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    • 1992
  • An accurate method for extracting both Si film doping concentration and front or back silicon-to-oxide fixed charge density of fully depleted SOI devices is proposed. The method utilizes the current-to-voltage and capacitance-to-voltage characteristics of both SOI NMOSFET and PMOSFET which have the same doping concentration. The Si film doping concentration and the front or back silicon-to-oxide fixed charge density are extracted by mainpulating the respective threshold voltages of the SOI NMOSFET and PMOSFET according to the back surface condition (accumulation or inversion) and the capacitance-to-voltage characteristics of the SOI PMOSFET. Device simulations show that the proposed method has less than 10% errors for wide variations of the film doping concentration and the front or the back silicon-to-oxide fixed charge density.

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The Analysis of Transfer and Output characteristics by Stress in Polycrystalline Silicon Thin Film Transistor (다결정 실리콘 박막 트랜지스터에서 스트레스에 의한 출력과 전달특성 분석)

  • 정은식;안점영;이용재
    • Proceedings of the IEEK Conference
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    • 2001.06b
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    • pp.145-148
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    • 2001
  • In this paper, polycrystalline silicon thin film transistor using by Solid Phase Crystallization(SPC) were fabricated, and these devices were measured and analyzed the electrical output and transfer characteristics along to DC voltage stress. The transfer characteristics of polycrystalline silicon thin film transistor depended on drain and gate voltages. Threshold voltage is high with long channel length and narrow channel width. And output characteristics of polycrystalline silicon thin film transistor flowed abruptly much higher drain current. The devices induced electrical stress are decreased drain current. At last, field effect mobility is the faster as channel length is high and channel width is narrow.

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A study on refractive index of silicon nitride thin film according to the variable constant temperature and humidity reliable research (굴절률 가변에 따른 silicon nitride 박막의 항온/항습 신뢰성 연구)

  • Song, Kyuwan;Jang, Juyeun;Yi, Junsin
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.11a
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    • pp.56.1-56.1
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    • 2010
  • 결정질 실리콘 태양전지의 표면 ARC(Anti-reflection Coating)layer는 반사도를 줄여 광 흡수율을 증가시키고, passivation 효과를 통하여 표면 재결합을 감소 시켜 태양전지의 효율을 높이는 중요한 역할을 한다. Silicon nitride 박막은 외부 stress 요인에 대해 안정성을 담보할 수 있어야한다. 따라서, 본 연구에서는 굴절률 가변에 따른 silicon nitride 박막을 PECVD를 이용하여 증착하고, 항온/항습 stability test를 통해 박막의 안정성을 확인하였다. Silicon nitride 증착을 위해 PECVD를 이용하였고, 공정압력 0.8Torr, 증착온도 $450^{\circ}C$, 증착파워 300W에서 실험을 진행하였다 박막의 굴절률은 1.9~2.3의 범위로 가변하였다. 항온/항습에 대한 신뢰성을 test 하기 위하여 5시간동안의 test를 1cycle로 하여 20회 동안 실험을 실시하였다. 증착된 silicon nitride 박막의 lifetime은 firing 이후 57.8us로 가장 높았으며, 항온/항습 test 이후에도 유사한 경향을 확인 할 수 있었다. 또한, 100h 동안의 항온/항습 test 결과 silicon nitride 박막의 lifetme 감소는 8.5%에 불과했다. 본 연구를 통하여 온도와 습도의 변화에 따른 결정질 실리콘 태양전지의 SiNx 박막의 증착 공정 조건에 대한 신뢰성을 확인 할 수 있었다.

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Silicon-Organic Hybrid Solar Cell Using Ag Nanowire/PEDOT:PSS Layer (은 나노와이어/PEDOT:PSS를 이용한 실리콘-유기물 하이브리드 태양전지)

  • Kyudong Kim;Sungjin Jo
    • Korean Journal of Materials Research
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    • v.34 no.8
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    • pp.395-399
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    • 2024
  • Among various organic materials suitable for silicon-based inorganic-organic hybrid solar cells, poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) has been extensively studied due to its high optical transmittance, high work function, and low bandgap characteristics. The electro-optical properties of PEDOT:PSS have a significant impact on the power conversion efficiency of silicon-organic hybrid solar cells. To enhance the photovoltaic properties of the silicon-organic hybrid solar cells, we developed a method to improve the properties of the PEDOT:PSS film using Ag nanowires (NW) instead of conventional solvent addition methods. The influence of the Ag NW on the electro-optical property of the PEDOT:PSS film and the photovoltaic performance of the silicon-organic hybrid solar cells were investigated. The addition of Ag NW further improved the sheet resistance of the PEDOT:PSS film, enhancing the performance of the silicon-organic hybrid solar cells. The present work using the low sheet resistance PEDOT:PSS layer paves the way to develop simple yet more efficient silicon-organic hybrid solar cells.

Non Leaky Conductor-Backed CPW Based on Thin Film Polyimide on CMOS-grade Silicon for Ku-band Application

  • Lee, Sang-No;Lee, Joon-Ik;Yook, Jong-Gwan;Kim, Yong-Jun
    • KIEE International Transactions on Electrophysics and Applications
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    • v.4C no.4
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    • pp.165-169
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    • 2004
  • This paper reports a miniaturized conductor-backed CPW (CBCPW) bandpass filter based on a thin film polyimide layer coated on CMOS-grade silicon. With a 20 ${\mu}{\textrm}{m}$-thick polyimide interface layer and back metallization on the CMOS-grade silicon, the interaction of electromagnetic fields with the lossy silicon substrate has been isolated, and as a result a low-loss and low-dispersive CBCPW line has been obtained. Measured attenuation constant at 20 GHz is below 1.2 ㏈/cm, which is compatible with the CPW on GaAs. In addition, by using the proposed CBCPW geometry, miniaturized BPF for Ku band application is designed and its measured frequency response shows excellent agreement with the predicted value with validating the performances of the proposed CBCPW geometry for RFIC interconnects and filter applications.

Structural Effect on Backlight Induced-leakage Current in Amorphous Silicon Thin Film Transistor

  • Kim, Sho-Yeon;Kim, Tae-Hyun;Jeon, Jae-Hong;Choe, Hee-Hwan;Lee, Kang-Woong;Seo, Jong-Hyun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1308-1311
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    • 2007
  • Leakage current produced by backside illumination on bottom-gated amorphous silicon thin film transistor has been investigated. The experimental results show that the leakage current of bottomgated structure is significantly dependent on the shape of amorphous silicon pattern. A proper design of amorphous silicon pattern has been suggested in viewpoint of reducing the leakage current as well as mass production.

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Effect of Film Thickness on the Tribological Characteristics of Zdol Lubricant on Silicon Surface

  • Kim, Yong-Sik;Yang, Ji-Chul;Kim, Dae-Eun
    • International Journal of Precision Engineering and Manufacturing
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    • v.5 no.1
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    • pp.13-18
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    • 2004
  • In precision mechanical components that experience sliding, it is important to reduce the friction to minimize surface damage. Particularly, new lubrication methods are needed to reduce friction in silicon based micro-systems applications. In this work, the tribological characteristics of PFPE (Perfluoropolyether) Zdol lubricant on silicon were investigated based on the thickness of the film. The lubricant was coated on silicon wafer specimens by the dip coating method. It was shown that the friction coefficient as well as stiction decreased as the thickness of the film increased. The results of this work may be applied to improve the tribological performance of silicon based micro-system components.

Neutral Beam assisted Chemical Vapor Deposition at Low Temperature for n-type Doped nano-crystalline silicon Thin Film

  • Jang, Jin-Nyeong;Lee, Dong-Hyeok;So, Hyeon-Uk;Yu, Seok-Jae;Lee, Bong-Ju;Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.52-52
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    • 2011
  • A novel deposition process for n-type nanocrystalline silicon (n-type nc-Si) thin films at room temperature has been developed by adopting the neutral beam assisted chemical vapor deposition (NBa-CVD). During formation of n-type nc-Si thin film by the NBa-CVD process with silicon reflector electrode at room temperature, the energetic particles could induce enhance doping efficiency and crystalline phase in polymorphous-Si thin films without additional heating on substrate; The dark conductivity and substrate temperature of P-doped polymorphous~nano crystalline silicon thin films increased with increasing the reflector bias. The NB energy heating substrate(but lower than $80^{\circ}C$ and increase doping efficiency. This low temperature processed doped nano-crystalline can address key problem in applications from flexible display backplane thin film transistor to flexible solar cell.

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Simultaneous Detection Properties of Organic Vapor, Pressure Difference and Magnetic Field using a Rugate-structured Free-standing Porous Silicon Film (Rugate 구조를 갖는 자립형 다공성 실리콘 박막을 이용한 유기 증기, 압력차, 자기장의 동시 감응 특성)

  • Han, Seong-Beom;Lee, Ki Won
    • Journal of Sensor Science and Technology
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    • v.26 no.3
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    • pp.186-191
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    • 2017
  • In this study, we investigated the simultaneous detection properties of organic vapor, pressure difference, and magnetic field using a single rugate-structured free-standing porous silicon (RFPS) thin film. Both the wavelength and the intensity of the rugate peaks were changed in the reflectivity spectrum measured at the thin film surface while the organic vapor was exposed to the RFPS thin film. However, when the pressure difference and the magnetic field were exposed to the film, only the rugate peak intensity was changed. Therefore, it is possible to distinguish whether or not the organic vapor is detected by simultaneously changing the rugate peak wavelength and intensity. In addition, a method of distinguishing between the pressure difference and the magnetic field detection signal has been derived by rapidly modulating the direction of the magnetic field. This study shows that it is possible to simultaneously detect and distinguish various objects using a single RFPS thin film, and it is found that porous silicon can be utilized as a sensor sufficiently.