• Title/Summary/Keyword: run-by-run control

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Development of KNR electric locomotive (한국형 신형전기기관차 개발)

  • 전훈종;박만수;박두만
    • Proceedings of the KSR Conference
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    • 2002.10a
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    • pp.214-219
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    • 2002
  • The electric locomotive make a development by using as a trial petition way on the basis of finding for several years in 1996 and the electric locomotive in KNR railway electrification section of AC25KV 60Hz, can couple with passenger train of 700 ton doing running possibility from evenness to maximum running speed 140Km/h, Specially, propulsion equipment operates three phase AC motor that behaves axle control by VVVF inverter and affords higher axle per tractive effort as behaving control by SIBAS32 that up-to-date technology is integrated. Also, new style electric locomotive is designed so that can run in -35∼45 climatic condition.

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Control Chart for Correlation Coefficients of Correlated Quality Variables

  • Kim, Jae-Joo;Chang, Duk-Joon
    • Journal of Korean Society for Quality Management
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    • v.26 no.2
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    • pp.51-60
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    • 1998
  • Exponetially weighted moving average(EWMA) control chart to simultaneously monitor correlation coefficients of several correlated quality variables under multivariate normal process are proposed. Performances of the proposed control charts are measured in terms of average run length(ARL) by simulation. Numerical results show that smaller values of smoothing constant are more efficient in terms of ARL.

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Development of CV Control Chart Using EWMA Technique (EWMA 기법을 적용한 CV 관리도의 개발)

  • Hong, Eui-Pyo;Kang, Chang-Wook;Baek, Jae-Won;Kang, Hae-Woon
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.31 no.4
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    • pp.114-120
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    • 2008
  • The control chart is widely used statistical process control(SPC) tool that searches for assignable cause of variation and detects any change of process. Generally, ${\bar{X}}-R$ control chart and ${\bar{X}}-S$ are most frequently used. When the production run is short and process parameter changes frequently, it is difficult to monitor the process using traditional control charts. In such a case, the coefficient of variation (CV) is very useful for monitoring the process variability. The CV control chart is an effective tool to control the mean and variability of process simultaneously. The CV control chart, however, is not sensitive at small shift in the magnitude of CV. In this paper, we propose an CV-EWMA (exponentially weighted moving average) control chart which is effective in detecting a small shift of CV. Since the CV-EWMA control chart scheme can be viewed as a weighted average of all past and current CV values, it is very sensitive to small change of mean and variability of the process. We suggest the values of design parameters and show the results of the performance study of CV-EWMA control chart by the use of average run length (ARL). When we compared the performance of CV-EWMA control chart with that of the CV control chart, we found that the CV-EWMA control chart gives longer in-control ARL and much shorter out-of-control ARL.

FIR CV-EWMA Control Chart (FIR CV-EWMA 관리도)

  • Hong, Eui-Pyo;Kang, Hae-Woon;Kang, Chang-Wook;Baek, Jae-Won
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.33 no.3
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    • pp.146-153
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    • 2010
  • When the production run is short and process parameters change frequently, it is difficult to monitor the process using traditional control charts. In such a case, the coefficient of variation (CV) is very useful for monitoring the process variability. The CV control chart is an effective tool to control the mean and variability of process simultaneously. The CV control chart, however, is not sensitive at small shifts in the magnitude of CV. The CV-EWMA(exponentially weighted moving average) control chart which was developed recently is effective in detecting a small shifts of CV. Since the CV-EWMA control chart scheme can be viewed as a weighted average of all past and current CV values, it is very sensitive to small change of mean and variability of the process. In this paper, we propose an FIR(Fast initial response) CV-EWMA control chart to improve the sensitivity of a CV-EWMA scheme at process start-up or out-of-control process. Moreover, we suggest the values of design parameters and show the results of the performance study of FIR CV-EWMA control chart by the use of average run length(ARL). Also, we compared the performance of FIR CV-EWMA control chart with that of the CV-EWMA control chart and we found that the CV-EWMA control chart gives longer in-control ARL and much shorter out-of-control ARL.

An optimal policy for an infinite dam with exponential inputs of water (비의 양이 지수분포를 따르는 경우 무한 댐의 최적 방출정책 연구)

  • Kim, Myung-Hwa;Baek, Jee-Seon;Choi, Seung-Kyoung;Lee, Eui-Yong
    • Journal of the Korean Data and Information Science Society
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    • v.22 no.6
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    • pp.1089-1096
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    • 2011
  • We consider an infinite dam with inputs formed by a compound Poisson process and adopt a $P^M_{\lambda}$-policy to control the level of water, where the water is released at rate M when the level of water exceeds threshold ${\lambda}$. We obtain interesting stationary properties of the level of water, when the amount of each input independently follows an exponential distribution. After assigning several managing costs to the dam, we derive the long-run average cost per unit time and show that there exist unique values of releasing rate M and threshold ${\lambda}$ which minimize the long-run average cost per unit time. Numerical results are also illustrated by using MATLAB.

APC Technique and Fault Detection and Classification System in Semiconductor Manufacturing Process (반도체 공정에서의 APC 기법 및 이상감지 및 분류 시스템)

  • Ha, Dae-Geun;Koo, Jun-Mo;Park, Dam-Dae;Han, Chong-Hun
    • Journal of Institute of Control, Robotics and Systems
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    • v.21 no.9
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    • pp.875-880
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    • 2015
  • Traditional semiconductor process control has been performed through statistical process control techniques in a constant process-recipe conditions. However, the complexity of the interior of the etching apparatus plasma physics, quantitative modeling of process conditions due to the many difficult features constraints apply simple SISO control scheme. The introduction of the Advanced Process Control (APC) as a way to overcome the limits has been using the APC process control methodology run-to-run, wafer-to-wafer, or the yield of the semiconductor manufacturing process to the real-time process control, performance, it is possible to improve production. In addition, it is possible to establish a hierarchical structure of the process control made by the process control unit and associated algorithms and etching apparatus, the process unit, the overall process. In this study, the research focused on the methodology and monitoring improvements in performance needed to consider the process management of future developments in the semiconductor manufacturing process in accordance with the age of the APC analysis in real applications of the semiconductor manufacturing process and process fault diagnosis and control techniques in progress.

The Design of 32 Bit Microprocessor for Sequence Control Using FPGA (FPGA를 이용한 시퀀스 제어용 32비트 마이크로프로세서 설계)

  • Yang, Oh
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.40 no.6
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    • pp.431-441
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    • 2003
  • This paper presents the design of 32 bit microprocessor for a sequence control using a field programmable gate array(FPGA). The microprocessor was designed by a VHDL with top down method, the program memory was separated from the data memory for high speed execution of sequence instructions. Therefore it was possible that sequence instructions could be operated at the same time during the instruction fetch cycle. In order to reduce the instruction decoding time and the interface time of the data memory interface, an instruction code size was implemented by 32 bits. And the real time debug operation was implemented for easeful debugging the designed processor with a single step run, PC break point run, data memory break point run. Also in this designed microprocessor, pulse instructions, step controllers, master controllers, BM and BCD type arithmetic instructions, barrel shift instructions were implemented for sequence logic control. The FPGA was synthesized under a Xilinx's Foundation 4.2i Project Manager using a V600EHQ240 which contains 600,000 gates. Finally simulation and experiment were successfully performed respectively. For showing good performance, the designed microprocessor for the sequence logic control was compared with the H8S/2148 microprocessor which contained many bit instructions for sequence logic control. The designed processor for the sequence logic showed good performance.

Framework design for efficient Arduino program development

  • Gong, Dong-Hwan
    • International Journal of Internet, Broadcasting and Communication
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    • v.14 no.1
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    • pp.162-169
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    • 2022
  • Arduino is used in various places such as education, experimentation, and industry. Due to the easy accessibility of Arduino, it is often used by non-majors, and it is also used in media art and toy programs. Although Arduino is relatively easy to use compared to other devices, it is not easy to control various IoT components at the same time. Some tasks run independently of other tasks, while others run dependently. In this paper, I proposed the Arduino Task Framework to efficiently execute many tasks in these various situations. The design framework of this paper is largely composed of two types: synchronous execution and asynchronous execution. These two execution methods can be combined to create several independent and dependent execution routines. Asynchronous tasks are independently executed tasks and are managed by AsyncTaskGroup, while synchronous tasks are dependently executed tasks and are managed by SyncTaskGroup. AsyncTaskGroup instance and SyncTaskGroup instance are instances of the same Task and can be used in combination with another task. The Arduino framework proposed in this paper simplifies the program structure and can easily compose various tasks.

Changes in the Characteristics of Wintertime Climatology Simulation for METRI AGCM Using the Improved Radiation Parameterization (METRI AGCM의 복사 모수화 개선에 따른 겨울철 기후모의의 특징적 변화)

  • Lim, Han-Cheol;Byun, Young-Hwa;Park, Suhee;Kwon, Won-Tae
    • Atmosphere
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    • v.19 no.2
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    • pp.127-143
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    • 2009
  • This study investigates characteristics of wintertime simulation conducted by METRI AGCM utilizing new radiation parameterization scheme. New radiation scheme is based on the method of Chou et al., and is utilized in the METRI AGCM recently. In order to analyze characteristics of seasonal simulation in boreal winter, hindcast dataset from 1979 to 2005 is produced in two experiments - control run (CTRL) and new model's run (RADI). Also, changes in performance skill and predictability due to implementation of new radiation scheme are examined. In the wintertime simulation, the RADI experiment tends to reduce warm bias in the upper troposphere probably due to intensification of longwave radiative cooling over the whole troposphere. The radiative cooling effect is related to weakening of longitudinal temperature gradient, leading to weaker tropospheric jet in the upper troposphere. In addition, changes in vertical thermodynamic structure have an influence on reduction of tropical precipitation. Moreover, the RADI case is less sensitive to variation of tropical sea surface temperature than the CTRL case, even though the RADI case simulates the mean climate pattern well. It implies that the RADI run does not have significant improvement in seasonal prediction point of view.