1 |
D. Ha and C. Han, "Analysis of APC case study and enhancement in monitoring performance in semiconductor manufacturing process. 2015 30th ICROS Annual Conference (ICROS2015), May 2015.
|
2 |
J. H. Lee and J. M. Lee, "Progress and challenges in control of chemical processes," Annual Review of Chemical and Biomolecular Engineering, vol. 5, pp. 383-404, Mar. 2014.
DOI
|
3 |
G. W. Rubloff, "In-situ metrology: the path to real-time advanced process control," Characterization and Metrology for ULSI Technology: 2003 International Conference, pp. 583-591, May 2003.
|
4 |
S. J. Qin and T. A. Badgwell, "A survey of industrial model predictive control technology," Control Engineering Practice, vol. 11, pp. 733-764, Aug. 2002.
|
5 |
M. Kano and M. Ogawa, "The state of the art in advanced chemical process control in Japan," 7th IFAC International Symposium on Advanced Control of Chemical Process, Turkey, 2009.
|
6 |
M. Morari and J. H. Lee, "Model predictive control: Past, present and future," 6th International Symposium on Process Systems Engineering (PSE'97), 1997.
|
7 |
H.-M. Kim, S. M. Seong, and K.H. Kang, "A statistical analysis method for image processing errors in the position alignment of BGA-type semiconductor packages," Journal of Institute of Control, Robotics and Systems (in Korean), vol.19, no.11, pp.984-990, 2013.
DOI
|
8 |
D.-S. Moon, S.-K. Kim, and S.-H. Kim, "A fault detection system for wind power generator based on intelligent clustering method," Journal of Institute of Control, Robotics and Systems (in Korean), vol.19, no.1, pp.27-33, 2013.
DOI
|
9 |
C. Kymal and P. Patiyasevi, "Semiconductor quality initiatives: how to maintain quality in this fast-changing industry," Quality Digest, vol. 26, no. 4, pp. 43-48, 2006.
|
10 |
C. F. Chien, W. C. Wang, and J. C. Cheng, "Data mining for yield enhancement in semiconductor manufacturing and an empirical study," Expert Systems with Applications, vol. 33, no. 1, pp. 192-198, 2007.
DOI
|