• 제목/요약/키워드: resist development

검색결과 165건 처리시간 0.027초

포토레지스트 공급용 미소유량계 개발 (Development of Micro-flowmeter for Supplying Photo-resist)

  • 김신호;정선환;최성대
    • 한국공작기계학회논문집
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    • 제16권5호
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    • pp.198-204
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    • 2007
  • This study was carried out to develope a flow control system using to supply PR(photo-resist) in the semi-conductor manufacturing process. The features of this system are to be able to measure the high viscosity and micro-flow. To meet above study object some ideas was induced to design a new concept valve with new material, multi-cross wheel, and new sealing method etc.. As the evaluations on the developed micro-flowmeter it was enough satisfied to use at the IT industries such as photo-resist process.

나뭇잎을 모티브로 한 색유리 플래스터 방염기법 실험과 도자화병 융합에 관한 연구 (A Study on the Colored Glass Plaster Resist Printing Technique Experiment and the Porcelain Vase Fusion with the Motif of Leaf)

  • 김승만;이정석
    • 한국콘텐츠학회논문지
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    • 제19권4호
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    • pp.663-674
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    • 2019
  • 자연의 소재인 나뭇잎을 모티브로 하여 새롭게 개발한 색유리 플래스터 기법과 방염기법을 실험하고 도자화병과 융합하여 새롭고 독특한 데코레이션이 가미된 인테리어 화병을 만드는 것이 이번 연구의 배경이다. 이를 위한 연구 개발 방법은 첫 번째 색유리 플래스터 기법을 설명한다. 두 번째 방염기법을 설명하고 데코레이션 방법을 연구한다. 세 번째 화병의 역사와 종류를 알아보고 네 번째 16개의 화병을 현대적으로 디자인 하고 나뭇잎을 활용하여 백자토와 청자토로 산화와 환원으로 실험하여 결과를 설명한다. 이 실험결과를 통해 요변에 의한 특이한 색감 표출의 결과를 얻었고 나뭇잎 주변에 부드럽고 따뜻한 갈색 계열의 방염 그라데이션이 형성 되었다. 이러한 독특한 실험 효과를 이용하여 생활 인테리어 자기와 조형자기, 산업자기에 확장하고 응용하면 좋은 효과와 결과를 얻을 것을 기대한다.

광조형을 이용한 마스크리스 패턴형성에 관한 연구 (A Study of Mastless Pattern Fabrication using Stereolithography)

  • 정영대;조인호;손재혁;임용관;정해도
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2002년도 춘계학술대회 논문집
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    • pp.503-507
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    • 2002
  • Mask manufacturing is a high COC and COO process in developing of semiconductor devices, because of the mass production tool with high resolution. Direct writing has been thought to be one of the patterning method to cope with development or small-lot production of the device. This study focused on the development of the direct, mastless patterning process using stereolithography tool for the easy and convenient application to micro and miso scale products. Experiments are utilized by three dimensional CAD/CAM as a mask and photo-curable resin as a photo-resist in a conventional stereo-lithography apparatus. Results show that the resolution of the pattern was achieved about 300 micron because of complexity of SLA apparatus settings, inspite of 100 micro of inherent resolution. This paper concludes that photo resist and laser spot diameter should be adjusted to get finer patterns and the proposed method is significantly feasible to mastless and low cost patterning with micro and miso scale.

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LIGA 공정 중 PMMA 현상 과정의 모사 (Simulation of the PMMA development course in LIGA process)

  • 임종석;이선아;구양모
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2000년도 추계학술대회 논문집
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    • pp.733-736
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    • 2000
  • In the first step of the LIGA process a resist layer, typically PMMA(polymethylmethacrylate), is pattered by deep X-ray lithography. Then the exposed parts are dissolved by an organic developer. To describe the developer. To describe the development course the parameters influencing the development process was investigated. The developed depth is proportional to the square root of the development time which suggests that the development rate increases with increasing dose value and temperature. So the development course can be described by a phenomenological equation.

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플라즈마중합막의제작과레지스트 특성에 관한 연구 (A Study on the Preparation and Resist Characterization of the Plasma Polymerized Thin Films)

  • 이덕출;박종관;한상옥;김종석;조성욱
    • 대한전기학회논문지
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    • 제43권5호
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    • pp.802-808
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    • 1994
  • The purpose of this paper is to describe an application of plasma polymerized thin film as an electron beam resist. Plasma polymerized thin film was prepared using an interelectrode capacitively coupled gas-flow-type reactor, and chosen methylmethacrylate(MMA)and methylmethacrylate-tetrameth-yltin(MMA-TMT) as a monomer. This thin films were also delineated by the electron-beam apparatus with an acceleration voltage of 30kV and an expose dose ranging from 20 to 900$\mu$C/cmS02T. The delineated pattern in the resist was developed with the same reactor which is used for polymerization using an argon as etching gas. The growth rate and etching rate of the thin film is increased with increasing of discharge power. Thin films by plasma polymerization show polymerization rate of 30~45($\pm$3) A/min, and etching rate of 440($\pm$30) A/min during Ar plasma etching at discharge power of 100W. In apparently lower than that of conventional PMMA, but the plasma-etching rate of PP(MMA-TMT) was higher than that of PPMMA.

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실트함량에 따른 카올리나이트의 침식특성 평가 (Erosion Characteristics of Kaolinite with respect to Contents of Silt)

  • 이주형;박재현;정문경;곽기석
    • 한국방재학회:학술대회논문집
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    • 한국방재학회 2008년도 정기총회 및 학술발표대회
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    • pp.593-596
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    • 2008
  • The scour phenomenon involves the erosive potential of flowing water and the relative ability of the soil to resist erosion. The scour phenomenon in cohesive soils is much different from that in non-cohesive soils. Granular soils resist erosion by their buoyant weight and the friction between the particles. The soil particles are dislodged individually from the bed under the action of the eroding fluid. Scour in cohesive soils is much slower and more dependent on soil properties than that in non-cohesive soils. Therefore the analysis models for estimating erosion characteristics of cohesive soils should consider not only flowing water but also the relative ability of the soil to resist erosion. In this study, erosion characteristics for the clay-silt mixed soil will be analyzed as a fundamental study for development of bridge scour analysis and design system considering scour resistance capacity of a soil. For this analysis, the relationship between scour characteristics and soil properties was evaluated through scour rate test with Kaolinite samples remolded using various loading and contents of silt.

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Nano-fabrication of Superconducting Electrodes for New Type of LEDs

  • Huh, Jae-Hoon;Endoh, Michiaki;Sato, Hiroyasu;Ito, Saki;Idutsu, Yasuhiro;Suemune, Ikuo
    • 한국광학회:학술대회논문집
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    • 한국광학회 2009년도 동계학술발표회 논문집
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    • pp.133-134
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    • 2009
  • Cold temperature development (CTD) of electron beam (EB) patterned resists and subsequent dry etching were investigated for fabrication of nano-patterned Niobium (Nb). Bulky Nb fims on GaAs substrates were deposited with EB evaporation. Line patterns on Nb cathode were fabricated by EB patterning and reactive ion etching (RIE). Size deviations of nano-sized line patterns from CAD designed patterns are dependent on the EB total exposure, but it can be improved by CTD of EB-exposed resist. Line patterns of 10 to 300 nm widths of EB-exposed resist patterns were drawn under various exposure conditions of $0.2{\mu}s$/dot (total 240,000 dot) with a constant current (50 pA). Compared with room temperature development (RTD), the CTD improves pattern resolution due to the suppression of backscattering effect. RIE with $CF_4$ was performed for formation of several nano-sized line patterns on Nb. Each EB-resist patterned samples with RTDs and CTDs were etched with two different $CF_4$ gas pressures of 5 Pa. Nb etching rate increases while GaAs (or ZEP) etching rate decreases as the chamber pressure increases. This different dependent of the etching rate on the $CF_4$ pressure between Nb and GaAs (or ZEP) has a significant meaning because selective etching of nano-sized Nb line patterns is possible without etching of the underlying active layer.

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밀리미터파용 HEMT 소자 개발 및 제작을 위한 T-게이트 형성 전자빔 리소그래피 공정 모의 실험기 개발 (Development of Electron-Beam Lithography Process Simulation Tool of the T-shaped Gate Formation for the Manufacturing and Development of the Millimeter-wave HEMT Devices)

  • 손명식;김성찬;신동훈;이진구;황호정
    • 대한전자공학회논문지SD
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    • 제41권5호
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    • pp.23-36
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    • 2004
  • 밀리미터파 대역용 고속 HEMT 소자 제작 및 개발을 위하여 0.l㎛ 이하의 T-게이트 길이를 형성하기 위한 전자빔 리소그래피 공정을 분석할 수 있는 새로운 몬테 카를로 시뮬레이터를 개발하였다. 전자빔에 의한 노광 공정 모델링을 위해 전자산란에 대한 몬데 카를로 시뮬레이션에서 다층 리지스트 및 다원자 타겟 기판 구조에서 리지스트에 전이되는 에너지를 효율적으로 계산하도록 내부 쉘 전자 산란과 에너지 손실에 대해 새로이 모델링하였다. 다층 리지스트 구조에서 T-게이트 형상을 얻기 위해서 보통은 재현성 문제로 각 리지스트에 대해 각기 다른 현상액을 사용하게 되는데, 3층 리지스트 구조에서의 전자빔 리소그래피 공정을 정확하게 시뮬레이션하기 위해 각기 다른 현상 모델을 적용하였다. 본 논문에서 제안 개발된 모델을 사용하여 HEMT 소자의 전자빔 리소그래피에 의한 0.l㎛ T-게이트 형성 공정을 시뮬레이션하고 SEM 측정 결과와 비교하여 T-게이트 형성 공정을 분석하였다.

Inspirations for China's Cultural Industry Development from the Construction of Korea's Cultural Industry Chain

  • Guo, Pingjian;Fang, Haixia
    • The International Journal of Costume Culture
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    • 제13권2호
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    • pp.88-92
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    • 2010
  • The purpose of this research was to understand the successful establishment of the cultural industry chain in Korea and discover lessons for China to improve its cultural industry. It was concluded that a one-industry development pattern cannot win in market competition and a cultural industry will strengthen its sustainability only through smoothing its relationship with other industries and establishing a cultural industry chain so as to further development and resist crises together.

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Characteristics of high performance reinforced concrete barriers that resist non-deforming projectile impact

  • Dancygier, A.N.
    • Structural Engineering and Mechanics
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    • 제32권5호
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    • pp.685-699
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    • 2009
  • Current research and development of high performance concrete, together with study of phenomena that are pertinent to impact resistance, have lead to a new generation of barriers with improved properties to resist impact loads. The paper reviews major properties and mechanisms that affect impact resistance of concrete barriers as per criteria that characterize the resistance. These criteria are the perforation limit, penetration depth and the amount of front and rear face damage. From the long-known, single strength parameter that used to represent the barriers' impact resistance, more of the concrete mix ingredients are now considered to be effective in determining it. It is shown that the size and hardness of the aggregates, use of steel fibers and micro-silica have different effects on performance under impact and on the resistance. Additional pertinent phenomena, such as the rate and size effects, confinement and local versus global response, are pointed out with their reference to possible future developments in the design of impact resisting concrete barriers.