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Development of Micro-flowmeter for Supplying Photo-resist  

Kim, Shin-Ho (금오공과대학교 대학원 생산기계공학과)
Cheong, Seon-Hwan (금오공과대학교 기계공학부)
Choi, Seong-Dae (금오공과대학교 기계공학부)
Publication Information
Transactions of the Korean Society of Machine Tool Engineers / v.16, no.5, 2007 , pp. 198-204 More about this Journal
Abstract
This study was carried out to develope a flow control system using to supply PR(photo-resist) in the semi-conductor manufacturing process. The features of this system are to be able to measure the high viscosity and micro-flow. To meet above study object some ideas was induced to design a new concept valve with new material, multi-cross wheel, and new sealing method etc.. As the evaluations on the developed micro-flowmeter it was enough satisfied to use at the IT industries such as photo-resist process.
Keywords
viscosity; PR; Micro-flowmeter; Wheel; semiconductor;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
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