Proceedings of the Korean Society of Precision Engineering Conference (한국정밀공학회:학술대회논문집)

  • 2000.11a
  • /
  • Pages.733-736
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  • 2000
  • /
  • 2005-8446(pISSN)
Korean Society for Precision Engineering (한국정밀공학회)
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Simulation of the PMMA development course in LIGA process

LIGA 공정 중 PMMA 현상 과정의 모사

  • 임종석 (포항공과대 대학원 재료금속공학과) ;
  • 이선아 (포항공과대 대학원 재료금속공학과) ;
  • 구양모 (포항공과대 대학원 재료금속공학과)
  • Published : 2000.11.01
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Abstract

In the first step of the LIGA process a resist layer, typically PMMA(polymethylmethacrylate), is pattered by deep X-ray lithography. Then the exposed parts are dissolved by an organic developer. To describe the developer. To describe the development course the parameters influencing the development process was investigated. The developed depth is proportional to the square root of the development time which suggests that the development rate increases with increasing dose value and temperature. So the development course can be described by a phenomenological equation.

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