• Title/Summary/Keyword: raman microscopy

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Photocatalytic Degradation of Organic Dyes using CdSe-Mn-C60 Nanocomposites

  • Jiulong Li;Jeong Won Ko;Weon Bae Ko
    • Elastomers and Composites
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    • v.57 no.4
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    • pp.181-187
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    • 2022
  • CdSe-Mn nanocomposites were synthesized using a microwave method with sodium sulfite (Na2SO3), selenium (Se), cadmium sulfate octahydrate (3CdSO4·8H2O), ammonia solution (NH3·H2O), and manganese (II) sulfate monohydrate (MnSO4·H2O). We obtained CdSe-Mn-C60 nanocomposites by calcining CdSe-Mn nanocomposites and fullerene (C60) in an electric furnace at 700 ℃ for 2 h. X-ray diffraction, Raman spectroscopy, and scanning electron microscopy were used to characterize the crystal structures, lattice vibrations, and surface morphologies of the products, respectively. The photocatalytic activities of the CdSe-Mn-C60 nanocomposites were investigated based on the photocatalytic degradations of organic dyes such as BG, MB, MO, and RhB under ultraviolet (UV) irradiation at 254 nm. UV-visible spectrophotometry was used to confirm the degradation process.

Study on residual stress characteristics according to the substrate type and V/III ratio during GaN growth by HVPE (HVPE 법을 통한 GaN 성장 시 기판 종류 및 V/III 비에 따른 잔류 stress 특성 연구)

  • Lee, Joo Hyung;Lee, Seung Hoon;Lee, Hee Ae;Kang, Hyo Sang;Oh, Nuri;Yi, Sung Chul;Lee, Seong Kuk;Park, Jae Hwa
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.30 no.2
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    • pp.41-46
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    • 2020
  • The characteristics of the residual stress on the types of the substrate was investigated with adjusting the V/III ratio during GaN growth via the HVPE method. GaN single crystal layers were grown on a sapphire substrate and a GaN template under the conditions of V/III ratio 5, 10, and 15, respectively. During GaN growth, multiple hexagonal pits in GaN single crystal were differently revealed in accordance with growth condition and substrate type, and their distribution and depth were measured via optical microscopy(OM) and white light interferometry(WLI). As a result, it was confirmed that the distribution area and depth of hexagonal pit tended to increase as the V/III ratio increased. Moreover, it was found that the residual stress in GaN single crystal decreased as the distribution area and depth of the pit increased through measuring micro Raman spectrophotometer. In the case of GaN growth according to substrate type, the GaN on GaN template showed lower residual stress than the GaN grown on sapphire substrate.

Effect of Surfactants on ZnO Synthesis by Hydrothermal Method and Photocatalytic Properties (계면활성제 첨가에 의한 산화아연의 수열합성과 광촉매 특성)

  • Hyeon, Hye-Hyeon;Lee, Dong-Kyu
    • Journal of the Korean Applied Science and Technology
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    • v.34 no.1
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    • pp.50-57
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    • 2017
  • Zinc oxide is, one of metal oxide semiconductor, harmless to human and environment-friendly. It has excellent chemical and thermal stability properties. Wurtzite-zinc oxide is a large band gap energy of 3.37 eV and high exciton binding energy of 60 meV. It can be applied to various fields, such as solar cells, degradation of the dye waste, the gas sensor. The photocatalytic activity of zinc oxide is varied according to the particle shape and change of crystallinity. Therefore, It is very important to specify the additives and the experimental variables. In this study, the zinc oxide were synthesized by using a microwave assisted hydrothermal synthesis. The precursor was used as the zinc nitrate, the pH value was controlled as 11 by NaOH. Surfactants are the ethanolamine, cetyltrimethylammonium bromide, sodium dodecyl sulfate, sorbitan monooleate was added by changing the concentration. The composite particles had the shape of a star-like, curcular cone, seed shape, flake-sphere. Physical and chemical properties of the obtained zinc oxide was characterized using x-ray diffractometer, field emission scanning electron microscopy, thermogravimetric analysis and optical properties was characterized using UV-visible spectroscopy, photoluminescence and raman spectroscopy.

Fabrication and Characterization of Si Quantum Dots in a Superlattice by Si/C Co-Sputtering (실리콘과 탄소 동시 스퍼터링에 의한 실리콘 양자점 초격자 박막 제조 및 특성 분석)

  • Kim, Hyun-Jong;Moon, Ji-Hyun;Cho, Jun-Sik;Park, Sang-Hyun;Yoon, Kyung-Hoon;Song, Jin-Soo;O, Byung-Sung;Lee, Jeong-Chul
    • Korean Journal of Materials Research
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    • v.20 no.6
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    • pp.289-293
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    • 2010
  • Silicon quantum dots (Si QDs) in a superlattice for high efficiency tandem solar cells were fabricated by magnetron rf sputtering and their characteristics were investigated. SiC/$Si_{1-x}C_x$ superlattices were deposited by co-sputtering of Si and C targets and annealed at $1000^{\circ}C$ for 20 minutes in a nitrogen atmosphere. The Si QDs in Si-rich layers were verified by transmission electron microscopy (TEM) and X-ray diffraction. The size of the QDs was observed to be 3-6 nm through high resolution TEM. Some crystal Si and -SiC peaks were clearly observed in the grazing incident X-ray diffractogram. Raman spectroscopy in the annealed sample showed a sharp peak at $516\;cm^{-1}$ which is an indication of Si QDs. Based on the Raman shift the size of the QD was estimated to be 4-6 nm. The volume fraction of Si crystals was calculated to be about 33%. The change of the FT-IR absorption spectrum from a Gaussian shape to a Lorentzian shape also confirmed the phase transition from an amorphous phase before annealing to a crystalline phase after annealing. The optical absorption coefficient also decreased, but the optical band gap increased from 1.5 eV to 2.1 eV after annealing. Therefore, it is expected that the optical energy gap of the QDs can be controlled with growth and annealing conditions.

The Influence of Oxygen Gas Flow Rate on Growth of Tin Dioxide Nanostructures (이산화주석 나노구조물의 성장에서 산소가스 유량이 미치는 영향)

  • Kim, Jong-Il;Kim, Ki-Chul
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.19 no.10
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    • pp.1-7
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    • 2018
  • Tin dioxide, $SnO_2$, is applied as an anode material in Li-ion batteries and a gas sensing materials, which shows changes in resistance in the presence of gas molecules, such as $H_2$, NO, $NO_2$ etc. Considerable research has been done on the synthesis of $SnO_2$ nanostructures. Nanomaterials exhibit a high surface to volume ratio, which means it has an advantage in sensing gas molecules and improving the specific capacity of Li-ion batteries. In this study, $SnO_2$ nanostructures were grown on a Si substrate using a thermal CVD process with the vapor transport method. The carrier gas was mixed with high purity Ar gas and oxygen gas. The crystalline phase of the as-grown tin oxide nanostructures was affected by the oxygen gas flow rate. The crystallographic property of the as-grown tin oxide nanostructures were investigated by Raman spectroscopy and XRD. The morphology of the as-grown tin oxide nanostructures was confirmed by scanning electron microscopy. As a result, the $SnO_2$ nanostructures were grown directly on Si wafers with moderate thickness and a nanodot surface morphology for a carrier gas mixture ratio of Ar gas 1000 SCCM : $O_2$ gas 10 SCCM.

Assessment of Ni Catalyst Properties for Removal of O2 and CO Impurity in Inert Gas (불활성 가스의 O2와 CO 불순물 제거를 위한 Ni 촉매의 물성 평가)

  • Kim, Kwangbae;Jin, Saera;Kim, Eunseok;Lim, Yesol;Lee, Hyunjun;Kim, Seonghoon;Noh, Yunyoung;Song, Ohsung
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.21 no.4
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    • pp.588-595
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    • 2020
  • This study examined the catalytic property of Ni-catalyst used in the gas purifying process to manufacture inert gases of N2 and Ar with high-purity over 9N for semiconductor industrial applications. Two types of Ni-catalysts with a cylindrical shape (C1) and churros shape structure (C2) were compared for the assessment. Optical microscopy and FESEM were used to analyze the shape and microstructure of the Ni-catalyst. EDS, XRD, and micro-Raman characterization were performed to examine the composition and properties. BET and Pulse Titration analyses were conducted to check the surface area and catalytic property of the Ni-catalyst. From the composition analysis results, C1 contained a relatively large amount of graphite as an impurity, and C2 contained higher Ni contents than C1. From specific surface area analysis, the specific surface area of C2 was approximately 1.69 times larger than that of C1. From catalytic property analysis, outstanding performance in O2 and CO impurity removal was observed at room temperature. Therefore, C2, having low-impurity and large specific surface area, is a suitable catalyst for the high-purity inert gas process in the semiconductor industry because of its outstanding performance in O2 and CO impurity removal at room temperature.

Development of Biomass-Derived Anode Material for Lithium-Ion Battery (리튬이온 전지용 바이오매스 기반 음극재 개발)

  • Jeong, Jae Yoon;Lee, Dong Jun;Heo, Jungwon;Lim, Du-Hyun;Seo, Yang-Gon;Ahn, Jou-Hyeon;Choi, Chang-Ho
    • Clean Technology
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    • v.26 no.2
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    • pp.131-136
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    • 2020
  • Biomass bamboo charcoal is utilized as anode for lithium-ion battery in an effort to find an alternative to conventional resources such as cokes and petroleum pitches. The amorphous phase of the bamboo charcoal is partially converted to graphite through a low temperature graphitization process with iron oxide nanoparticle catalyst impregnated into the bamboo charcoal. An optimum catalysis amount for the graphitization is determined based on the characterization results of TEM, Raman spectroscopy, and XRD. It is found that the graphitization occurs surrounding the surface of the catalysis, and large pores are formed after the removal of the catalysis. The formation of the large pores increases the pore volume and, as a result, reduces the surface area of the graphitized bamboo charcoal. The partial graphitization of the pristine bamboo charcoal improves the discharge capacity and coulombic efficiency compared to the pristine counterpart. However, the discharge capacity of the graphitized charcoal at elevated current density is decreased due to the reduced surface area. These results indicate that the size of the catalysis formed in in-situ graphitization is a critical parameter to determine the battery performance and thus should be tuned as small as one of the pristine charcoal to retain the surface area and eventually improve the discharge capacity at high current density.

RF and Optical properties of Graphene Oxide

  • Im, Ju-Hwan;Rani, J.R.;Yun, Hyeong-Seo;O, Ju-Yeong;Jeong, Yeong-Mo;Park, Hyeong-Gu;Jeon, Seong-Chan
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2012.05a
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    • pp.68.1-68.1
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    • 2012
  • The best part of graphene is - charge-carriers in it are mass less particles which move in near relativistic speeds. Comparing to other materials, electrons in graphene travel much faster - at speeds of $10^8cm/s$. A graphene sheet is pure enough to ensure that electrons can travel a fair distance before colliding. Electronic devices few nanometers long that would be able to transmit charge at breath taking speeds for a fraction of power compared to present day CMOS transistors. Many researches try to check a possibility to make it a perfect replacement for silicon based devices. Graphene has shown high potential to be used as interconnects in the field of high frequency electrical devices. With all those advantages of graphene, we demonstrate characteristics of electrical and optical properties of graphene such as the effect of graphene geometry on the microwave properties using the measurements of S-parameter in range of 500 MHz - 40 GHz at room temperature condition. We confirm that impedance and resistance decrease with increasing the number of graphene layer and w/L ratio. This result shows proper geometry of graphene to be used as high frequency interconnects. This study also presents the optical properties of graphene oxide (GO), which were deposited in different substrate, or influenced by oxygen plasma, were confirmed using different characterization techniques. 4-6 layers of the polycrystalline GO layers, which were confirmed by High resolution transmission electron microscopy (HRTEM) and electron diffraction analysis, were shown short range order of crystallization by the substrate as well as interlayer effect with an increase in interplanar spacing, which can be attributed to the presence of oxygen functional groups on its layers. X-ray photoelectron Spectroscopy (XPS) and Raman spectroscopy confirms the presence of the $sp^2$ and $sp^3$ hybridization due to the disordered crystal structures of the carbon atoms results from oxidation, and Fourier Transform Infrared spectroscopy (FTIR) and XPS analysis shows the changes in oxygen functional groups with nature of substrate. Moreover, the photoluminescent (PL) peak emission wavelength varies with substrate and the broad energy level distribution produces excitation dependent PL emission in a broad wavelength ranging from 400 to 650 nm. The structural and optical properties of oxygen plasma treated GO films for possible optoelectronic applications were also investigated using various characterization techniques. HRTEM and electron diffraction analysis confirmed that the oxygen plasma treatment results short range order crystallization in GO films with an increase in interplanar spacing, which can be attributed to the presence of oxygen functional groups. In addition, Electron energy loss spectroscopy (EELS) and Raman spectroscopy confirms the presence of the $sp^2$ and $sp^3$ hybridization due to the disordered crystal structures of the carbon atoms results from oxidation and XPS analysis shows that epoxy pairs convert to more stable C=O and O-C=O groups with oxygen plasma treatment. The broad energy level distribution resulting from the broad size distribution of the $sp^2$ clusters produces excitation dependent PL emission in a broad wavelength range from 400 to 650 nm. Our results suggest that substrate influenced, or oxygen treatment GO has higher potential for future optoelectronic devices by its various optical properties and visible PL emission.

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Characterization of B-doped a-SiC:H Thin Films Grown by Plasma-Enhanced Chemical Vapor Deposition (플라즈마 화학증착법으로 제조된 B-doped a-SiC:H 박막의 물성)

  • Kim, Hyeon-Cheol;Sin, Hyeok-Jae;Lee, Jae-Shin
    • Korean Journal of Materials Research
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    • v.9 no.10
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    • pp.1006-1011
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    • 1999
  • B-doped hydrogenated amorphous silicon carbide (a-SiC:H) thin films were prepared by plasma-enhanced chemical-vapor deposition in a gas mixture of $SiH_4$, $CH_4$ and $B_2H_6$. Microstructures and chemical properties of a-SiC:H films grown with varing the volume ratio of $CH_4$ to $SiH_4$ were characterized with various analysis methods including scanning electron microscopy(SEM), X-ray diffractometry(XRD), Raman spectroscopy, Fourier-transform infrared (FTIR) spectroscopy. X-ray photoelectron spectroscopy(XPS), UV absorption spectroscopy and photoconductivity measurements. While Si:H films grown without $CH_4$ showed amorphous state, the addition of $CH_4$ during deposition enhanced the development of a microcrystalline phase. By introducing C atoms into the film, Si-Si and Si--$\textrm{H}_{n}$ bonds of a -Si:H films were gradually replaced by Si-C, C-C, and Si--$\textrm{C}_{n}\textrm{H}_{m}$ bonds. Consequently, the electrical resistivity and optical bandgap of a-SiC:H films were increased with the C concentration in the film.

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On the effect of saline immersion to the removal torque for resorbable blasting media and acid treated implants (Resorbable blasting media 및 산처리한 임플란트의 제거회전력에 생리식염수를 적시는 것이 미치는 영향)

  • Kwon, Jae-uk;Cho, Sung-am
    • Journal of Dental Rehabilitation and Applied Science
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    • v.34 no.1
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    • pp.1-9
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    • 2018
  • Purpose: The purpose of this study is to investigate the effect of the titanium implant soaked in saline after RBM and acid etched surface treatment on the initial osseointegration by comparing the removal torque and the surface analysis compared to the titanium implant with only RBM and acid etched surface treatment. Materials and Methods: The control group was RBM and acid etched surface treated implants (RBM + HCl), and the test group was implants soaked in saline for 2 weeks after RBM and acid etched surface treatment (RBM + HCl + Sal). The control and test group implants were placed in the left and right tibiae of 10 rabbits, respectively, and at the same time, the insertion torque (ITQ) was measured. After 10 days, the removal torque (RTQ) was measured by exposing the implant site. FE-SEM, EDS, Surface roughness and Raman spectroscopy were performed for the surface analysis of the new implant specimens used in the experiments. Results: There was significant difference in insertion torque and removal torque between control group and experimental group (P = 0.014 < 0.05). Surface roughness of experimental group is higher than control group. Conclusion: Saline soaking after RBM and acid etched surface treatment of titanium implants were positively affect the initial osseointegration as compared to titanium implants with only RBM and acid etched surface treatment.