• Title/Summary/Keyword: protective film

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Study of a MgO Protective Layer Deposited with Oxygen Ion Beam Assisted Deposition in an AC PDP (Oxygen Ion Beam Assisted Deposition법에 의해 형성된 AC PDP용 MgO 보호막의 특성 연구)

  • Kwon, Sang-Jik;Li, Zhao-Hui
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.7
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    • pp.615-619
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    • 2007
  • MgO layer plays an important role for plasma display panels (PDPs). In this experiment, ion beam assisted deposition (IBAD) methode was uesed to deposit a MgO thin film and the assisting oxygen ion beam energy was varied from 100 eV to 500 eV. In order to investigate the relationship between the secondary electron emission and the defect levels of the MgO layer, we measured the cathodoluminescence (CL) spectra of the MgO thin films, and we analyzed the CL peak intensity and peak transition. The results showed that the assisting ion beam energy played an important role in the peak intensity and the peak transition of the CL spectrum. The properties of MgO thin film were also analyzed using XRD and SEM, these results showed the assisting ion beam energy had direct effect on characteristics of MgO thin film.

The Biocompatibility of HA Film Deposition on Anodized Titanium Alloy

  • Lee, Kang;Choe, Han-Choel;Kim, Byung-Hoon;Ko, Yeong-Mu
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.10a
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    • pp.213-214
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    • 2009
  • A thin film hydroxyapatite (HA) films was deposited on anodized titanium by RF sputtering method. The anodized titanium enhanced the biocompatibility of the Ti and the bioactivity was improved further by the HA deposited on the anodized Ti. $TiO_2$ layer with $0.2{\sim}0.5{\mu}$ diameter pore size was formed on the Ti surface by anodization. Anodized $TiO_2$ layer analysis HA film deposited, oxide pore size and number decreased compared with non-HA deposited surface. The corrosion resistance of HA deposited/anodized Ti was higher than that of the non-treatment Ti alloy in Hank's solution, indicating better protective effect. From the results of cell culture using MTT assays, the best cell proliferation showed in HA deposited surface after anodization of Ti surfaces compared with another surface treatment.

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Surface Protection Obtained by Anodic Oxidation of New Ti-Ta-Zr Alloy

  • Vasilescu, C.;Drob, S.I.;Calderon Moreno, J.M.;Drob, P.;Popa, M.;Vasilescu, E.
    • Corrosion Science and Technology
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    • v.17 no.2
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    • pp.45-53
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    • 2018
  • A new 80Ti-15Ta-5Zr wt% alloy surface was protected by anodic oxidation in phosphoric acid solution. The protective oxide layer (TiO2, ZrO2 and Ta suboxides and thickness of 15.5 nm) incorporated $PO{_4}^{3-}$ ions from the solution, according to high resolution XPS spectra. The AFM analysis determined a high roughness with SEM detected pores (20 - 50 nm). The electrochemical studies of bare and anodically oxidized Ti-15Ta-5Zr alloy in Carter-Brugirard saliva of different pH values and saliva with 0.05M NaF, pointed to a nobler surface for the protected alloy, with a thicker electrodeposited oxide layer acting as a barrier against aggressive ions. The oxidized alloy significantly decreased corrosion current densities and total quantity of ions released into the oral environment in comparison with the bare one, at higher polarisation resistance and protective capacity of the electrodeposited layer. The impedance data revealed a bi-layered oxidation film formed by: a dense, compact, barrier layer in contact with the metallic substrate, decreasing the potential gradient across the metal/oxide layer/solution interface, reducing the anodic dissolution and a more permissive, porous layer in contact with the electrolyte. The open circuit potential for protected alloy shifted to nobler values, with thickening of the oxidation film signifying long-term protection.

An Experimental Study on the Thermal Physiological Response in the Pesticide Proof Clothing Textile Materials for a Fruit-grower (과수용 농약방제복 소재 특성에 따른 인체생리반응에 관한 연구)

  • Hwang, Kyoung-Sook;Kim, Kyung-Ran;Lee, Kyung-Suk;Kim, Hyo-Cher;Baek, Yoon-Jeong
    • Journal of the Korean Society of Clothing and Textiles
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    • v.32 no.11
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    • pp.1792-1801
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    • 2008
  • This study was to develope the pesticide-proof clothes(PPC) for fruit-grower which has been well known over applied agricultural chemicals. The ergonomic evaluation of PPC were tested in two ways. Male adults volunteered the tests to evaluate the safety to pesticide in the field and the thermal comforts in the climate-chamber($30^{\circ}C$, 60%R.H.). PPC were made of 4 different fabrics. Two of them were on the market(coated non-woven and coated nylon). Others were water-repellent treatment and coated waterproof film by developed polyester. The field study was conducted for farmers growing apples to evaluate pesticide exposure. In this experiment, we collected data with patch test on the head, chest, back, right upperarm, right forearm, left thigh and left calf. From the results, the developed PPC showed the more excellent comfort than an existing PPC with nylon coated polyurethane. But the developed PPC of water-repellent fabric was penetrated into the PPC. Therefore, we designed the functional pesticide-proof clothes of 2 different developed polyester fabrics(water-repellent treatment in chest, abdomen, the lower of back, waist, and calf; coated waterproof film in head, shoulder, the upper of back, the crotch, hip, upper arm and thigh).

Structural and Discharge Characteristics of MgO Deposited by Oxygen-Ion-Beam-Assisted Deposition in AC PDP (산소 이온 빔 보조 증착된 AC PDP용 MgO 보호막의 특성 연구)

  • Li, Zhao-Hui;Kim, Kwang-Ho;Ahn, Min-Hung;Hong, Seng-Jae;Im, Seung-Kyeok;Kwon, Sang-Jik
    • Journal of the Korean Vacuum Society
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    • v.16 no.5
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    • pp.338-342
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    • 2007
  • The magnesium oxide (MgO) protective layer plays an important role in plasma display panels (PDPs). In this paper, we describe the structural and discharge properties of MgO thin films, which were prepared by the ion-beam-assisted deposition (IBAD) of oxygen as the protective layer of PDPs. The energy of the oxygen ion beam was used as the parameter to control the deposition. We found that the oxygen ion beam energy was effective in determining in structural and discharge characteristics. The lowest firing inception voltage, the highest brightness and the highest luminous efficiency were obtained when the MgO thin film was deposited with an oxygen ion beam energy of 300 eV. The crystallization of the MgO thin film was also measured by X-ray diffraction analysis, and the surface quality was measured by atomic force microscopy.

Sputtering Yield and Secondary Electron Emission Coefficient(${\gamma}$) of the MgO, $MgAl_2O_4$ and $MgAl_2O_4/MgO$ Thin Film Grown on the Cu Substrate by Using the Focused Ion Beam (Cu 기판위에 성장한 MgO, $MgAl_2O_4$$MgAl_2O_4/MgO$ 박막의 집속이온빔을 이용한 스퍼터링수율 측정과 이차전자방출계수 측정)

  • Jung K.W.;Lee H.J.;Jung W.H.;Oh H.J.;Park C.W.;Choi E.H.;Seo Y.H.;Kang S.O.
    • Journal of the Korean Vacuum Society
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    • v.15 no.4
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    • pp.395-403
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    • 2006
  • It is known that $MgAl_2O_4$ has higher resistance to moisture than MgO, in humid ambient MgO is chemically unstable. It reacts very easily with moisture in the air. In this study, the characteristic of $MgAl_2O_4$ and $MgAl_2O_4/MgO$ layers as dielectric protection layers for AC- PDP (Plasma Display Panel) have been investigated and analysed in comparison for conventional MgO layers. MgO and $MgAl_2O_4$ films both with a thickness of $1000\AA$ and $MgAl_2O_4/MgO$ film with a thickness of $200/800\AA$ were grown on the Cu substrates using the electron beam evaporation. $1000\AA$ thick aluminium layers were deposited on the protective layers in order to avoid the charging effect of $Ga^+$ ion beam while the focused ion beam(FIB) is being used. We obtained sputtering yieds for the MgO, $MgAl_2O_4$ and $MgAl_2O_4/MgO$ films using the FIB system. $MgAl_2O_4/MgO$ protective layers have been found th show $24{\sim}30%$ lower sputtering yield values from 0.244 up to 0.357 than MgO layers with the values from 0.364 up to 0.449 for irradiated $Ga^+$ ion beam with energies ranged from 10 kV to 14 kV. And $MgAl_2O_4$ layers have been found to show lowest sputtering yield values from 0.88 up to 0.109. Secondary electron emission coefficient(g) using the ${\gamma}$- FIB. $MgAl_2O_4/MgO$ and MgO have been found to have similar g values from 0.09 up to 0.12 for indicated $Ne^+$ ion with energies ranged from 50 V to 200 V. Observed images for the surfaces of MgO and $MgAl_2O_4/MgO$ protective layers, after discharge degradation process for 72 hours by SEM and AFM. It is found that $MgAl_2O_4/MgO$ protective layer has superior hardness and degradation resistance properties to MgO protective layer.

Effects of an $Al_2$O$_3$Surfasce Protective Layer on the Sensing Properties of $SnO_2$Thin Film Gas Sensors (Al$_2$O$_3$ 표면 보호층이 박막형 $SnO_2$ 가스센서의 감지 특성에 미치는 영향)

  • Seong, Gyeong-Pil;Choe, Dong-Su;Kim, Jin-Hyeok;Mun, Jong-Ha;Myeong, Tae-Ho
    • Korean Journal of Materials Research
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    • v.10 no.11
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    • pp.778-783
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    • 2000
  • Effects of the $Al_2$O$_3$surface protective layer, deposited on the SnO$_2$sensing layer by aerosol flame deposition (AFD) method, on the sensing properties of SnO$_2$thin film ags sensors were investigated.Effects of Pt doping to the $Al_2$O$_3$surface protective layer on the selectivity of CH$_4$ gas were also investigated. 0.3$\mu\textrm{m}$ thick SnO$_2$thin sensing layers on Pt electrodes were prepared by R.F. magnetron sputtering with R.F. power of 50 W, at working pressure of 4mTorr, and at 20$0^{\circ}C$ for 30 min. $Al_2$O$_3$surface protective layers on SnO$_2$layers were prepared by AFD using a diluted aluminum nitrade (Al(NO$_3$).9$H_2O$) solution. The sensitivity of CO gas in the SnO$_2$gas sensor with an $Al_2$O$_3$surface protective layer was significantly decreased. But that of CH$_4$gas remained almost same with pure SnO$_2$gas sensor. This result shows that the selectivity of CH$_4$gas is increased because of the $Al_2$O$_3$surface protective layer. In the case of SnO$_2$gas sensors with Pt-doped $Al_2$O$_3$surface protective layers, low sensing property to CO gas and high sensing property to CH$_4$were observed. This results in the increasing of selectivity of CH$_4$gas selectivity are discussed.

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Investigation on the Effects of Hydrogen Charging on Oxidation Behavior of Ultrahigh-Strength Automotive Steels (초고강도 자동차용 강의 환원정전류인가에 따른 산화 거동 변화 연구)

  • Ha, Heon-Young;Kim, Hye-Jin;Moon, Joonoh;Lee, Tae-Ho;Jo, Hyo-Haeng;Lee, Chang-Geun;Yoo, Byung-Kil;Yang, Won-Seog
    • Corrosion Science and Technology
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    • v.16 no.6
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    • pp.317-327
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    • 2017
  • The change in the oxidation behavior of three types of B-added ultrahigh strength martensitic steels containing Ti and Nb induced by applying constant cathodic current was investigated. In a 3% NaCl+0.3% $NH_4SCN$ solution, the overall polarization behavior of the three alloys was similar, and degradation of the oxide film was observed in the three alloys after applying constant cathodic current. A significant increase in the anodic current density was observed in the Nb-added alloy, while it was diminished in the Ti-added alloy. Both Ti and Nb alloying decreased the hydrogen overpotential by forming NbC and TiC particles. In addition, the thickest oxide film was formed on the Ti-added alloy, but the addition of Nb decreased the film thickness. Therefore, it was concluded that the remarkable increase in the anodic current density of Nb-added alloy induced by applying constant cathodic current density was attributed to the formation of the thinnest oxide film less protective to hydrogen absorption, and the addition of Ti effectively blocked the hydrogen absorption by forming TiC particles and a relatively thick oxide film.

Effect of pre-treatment in 0.5 M oxalic acid containing various NH4F concentrations on PEO Film Formation of AZ91 Mg Alloy (NH4F가 첨가된 0.5 M 옥살산 전처리가 AZ91 마그네슘 합금의 PEO 피막 형성에 미치는 영향)

  • Kwon, Duyoung;Song, Pung-Keun;Moon, Sungmo
    • Journal of the Korean institute of surface engineering
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    • v.55 no.1
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    • pp.24-31
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    • 2022
  • This study investigated the effect of pre-treatment on the PEO film formation of AZ91 Mg alloy. The pre-treatment was conducted for 10 min at room temperature in 0.5 M oxalic acid (C2H2O4) solution containing various ammonium fluoride (NH4F) concentrations. The pre-treated AZ91 Mg specimens were anodized at 100 mA/cm2 of 300 Hz AC for 2 min in 0.1 M NaOH + 0.4 M Na2SiO3 solution. When AZ91 Mg alloy was pretreated in 0.5 M oxalic acid with NH4F concentration less than 0.3 M, continuous dissolution of the AZ91 Mg alloy occurred together with the formation of black smuts and arc initiation time for PEO film formation was very late. It was noticed that corrosion rate of the AZ91 Mg alloy became faster if small amount of NH4F concentration, 0.1 M, is added. The fast corrosion is attributable to fast formation of porous fluoride together with porous oxides in the reaction products. On the other hand, when AZ91 Mg alloy was pretreated in 0.5 M oxalic acid with sufficient NH4F more than 0.3 M, a thin and dense protective film was formed on the AZ91 Mg alloy surface which resulted in faster initiation of arcs and formation of PEO film.

A Novel Large Area Negative Sputter Ion Beam source and Its Application

  • Kim, Steven
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.73-73
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    • 1999
  • A large area negative metal ion beam source is developed. Kinetic ion beam of the incident metal ions yields a whole nucleation and growth phenomena compared to the conventional thin film deposition processes. At the initial deposition step one can engineer the surface and interface by tuning the energy of the incident metal ion beams. Smoothness and shallow implantation can be tailored according to the desired application process. Surface chemistry and nucleation process is also controlled by the energy of the direct metal ion beams. Each individual metal ion beams with specific energy undergoes super-thermodynamic reactions and nucleation. degree of formation of tetrahedral Sp3 carbon films and beta-carbon nitride directly depends on the energy of the ion beams. Grain size and formation of polycrystalline Si, at temperatures lower than 500deg. C is obtained and controlled by the energy of the incident Si-ion beams. The large area metal ion source combines the advantages of those magnetron sputter and SKIONs prior cesium activated metal ion source. The ion beam source produces uniform amorphous diamond films over 6 diameter. The films are now investigated for applications such as field emission display emitter materials, protective coatings for computer hard disk and head, and other protective optical coatings. The performance of the ion beam source and recent applications will be presented.

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