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http://dx.doi.org/10.5757/JKVS.2007.16.5.338

Structural and Discharge Characteristics of MgO Deposited by Oxygen-Ion-Beam-Assisted Deposition in AC PDP  

Li, Zhao-Hui (Department of Electrics Engineering, Kyungwon University)
Kim, Kwang-Ho (Department of Electrics Engineering, Kyungwon University)
Ahn, Min-Hung (Department of Electrics Engineering, Kyungwon University)
Hong, Seng-Jae (Department of Electrics Engineering, Kyungwon University)
Im, Seung-Kyeok (Department of Electrics Engineering, Kyungwon University)
Kwon, Sang-Jik (Department of Electrics Engineering, Kyungwon University)
Publication Information
Journal of the Korean Vacuum Society / v.16, no.5, 2007 , pp. 338-342 More about this Journal
Abstract
The magnesium oxide (MgO) protective layer plays an important role in plasma display panels (PDPs). In this paper, we describe the structural and discharge properties of MgO thin films, which were prepared by the ion-beam-assisted deposition (IBAD) of oxygen as the protective layer of PDPs. The energy of the oxygen ion beam was used as the parameter to control the deposition. We found that the oxygen ion beam energy was effective in determining in structural and discharge characteristics. The lowest firing inception voltage, the highest brightness and the highest luminous efficiency were obtained when the MgO thin film was deposited with an oxygen ion beam energy of 300 eV. The crystallization of the MgO thin film was also measured by X-ray diffraction analysis, and the surface quality was measured by atomic force microscopy.
Keywords
PDP; MgO; IBAD;
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