• Title/Summary/Keyword: post-annealing treatment

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The Effects of Post-Treatments for Wet Spun PVDF on the Piezoelectric Property (습식방사 된 PVDF 섬유의 후 처리를 통한 결정구조의 변화)

  • Yu, Seung Mi;Oh, Hyun Ju;Hwang, Sang-Kyun;Chung, Yong Sik;Hwang, Hui Yun;Kim, Seong Su
    • Composites Research
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    • v.26 no.2
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    • pp.123-128
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    • 2013
  • The PVDF (polyvinylidene fluoride) fibers were prepared using the wet spinning processing. To improve ${\beta}$-phase crystalline which closely related piezoelectric property PVDF wet spun fibers conducted post treatment. Post treatment is consisted of heat stretching and annealing process. The heat stretching and annealing conditions were controlled by changing temperature between glass transition temperature and melting temperature. From these experimental data, the resulting crystal structure of the ${\beta}$-phase crystalline was confirmed by FT-IR and XRD experiments. From these analysis results, optimum stretching and annealing conditions of the wet spun PVDF fibers were founded to increase high ${\beta}$-phase crystalline. Furthermore results showed that thermal processing had a direct effect on modifying the crystalline microstructure and also confirmed that heat stretching and annealing could increase the degree of crystallinity and ${\beta}$-phase crystalline. Finally, piezoelectric constant ($d_{11}$) of the post heat treated PVDF fibers reinforced composite were measured to investigate the feasibility for the sensing materials.

Effects of Post-Annealing on Crystallization and Electrical Behaviors of ITO Thin Films Sputtered on PES Substrates (PES 필름상에 스퍼터링한 ITO 박막의 열처리에 따른 결정화 거동 및 전기적 특성 변화)

  • So, Byung-Soo;Kim, Young-Hwan
    • Journal of the Korean Ceramic Society
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    • v.43 no.3 s.286
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    • pp.185-192
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    • 2006
  • The effects of annealing on structural and electrical properties of ITO/PES (Indium Tin Oxide/Polyethersulfone) films was investigated. Amorphous ITO thin films were grown on plastic substrates, PES using low temperature DC magnetron sputtering. Various post annealing techniques were attempted to research variations of microstructure and electrical properties: i) conventional thermal annealing, ii) excimer laser annealing, iii) UV irradiation. The electrical properties were obtained using Hall effect measurements and DC 4-point resistance measurement. The microstructural features were characterized by FESEM, XRD, Raman spectroscopy in terms of morphology and crystallinity. Optimized UV treatment exhibits the enhanced conductivity and crystallinity, compared to those of conventional thermal annealing.

Effect of Post Deposition Annealing Temperature on the Hydrogen Gas Sensitivity of SnO2 Thin Films (증착 후 열처리온도에 따른 SnO2 박막의 수소 검출 민감도 변화)

  • You, Y.Z.;Kim, S.K.;Lee, Y.J.;Heo, S.B.;Lee, H.M.;Kim, Daeil
    • Journal of the Korean Society for Heat Treatment
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    • v.25 no.5
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    • pp.239-243
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    • 2012
  • $SnO_2$ thin films were prepared on the Si substrate by radio frequency (RF) magnetron sputtering and then post deposition vacuum annealed to investigate the effect of annealing temperature on the structural properties and hydrogen gas sensitivity of the films. The films that annealed at $300^{\circ}C$ show the higher sensitivity than the other films annealed at $150^{\circ}C$. From atomic force microscope observation, it is supposed that post deposition annealing promotes the rough surface and also, increase gas sensitivity of $SnO_2$ films for hydrogen gas. These results suggest that the vacuum annealed $SnO_2$ thin films at optimized temperatures are promising for practical high-performance hydrogen gas sensors.

Post-annealing of Al-doped ZnO films in hydrogen atmosphere (Al이 도핑된 투명전극용 ZnO 박막의 수소 열처리에 관한 특성연구)

  • Oh, Byeong-Yun;Jeong, Min-Chang;Lee, Woong;Myoung, Jae-Min
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.05a
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    • pp.58-61
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    • 2005
  • In an effort to improve the electrical properties of ZnO:Al transparent electrode films, post-annealing treatment in hydrogen atmosphere was attempted with varying annealing time at 573 K for compatibility with typical display device fabrication processes. It was observed that carrier concentrations and mobilities increased with longer annealing time with small changes in crystallinity. This resulted in substantial decrease in resistivity from $4.80{\times}10^{-3}$ to $8.30{\times}10^{-4}{\Omega}cm$ due to increased carrier concentration. Such improvements in electrical properties are attributed to the passivation of the grain boundary surfaces. The optical properties of the films, which changed in accordance with the Burstein-Moss effect, were consistent with the observed changes in electrical properties.

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Effects of Post-deposition Annealing on the Copper Films Electrodeposited on the ECR Plasma Cleaned Copper Seed Layer (ECR plasma로 전처리된 Cu seed층 위에 전해도금 된 Cu 막에 대한 Annealing의 효과)

  • Lee, Han-seung;Kwon, Duk-ryel;Park, Hyun-ah;Lee, Chong-mu
    • Korean Journal of Materials Research
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    • v.13 no.3
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    • pp.174-179
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    • 2003
  • Thin copper films were grown by electrodeposition on copper seed layers which were grown by sputtering of an ultra-pure copper target on tantalum nitride-coated silicon wafers and subsequently, cleaned in ECR plasma. The copper films were then subjected to ⅰ) vacuum annealing, ⅱ) rapid thermal annealing (RTA) and ⅲ) rapid thermal nitriding (RTN) at various temperatures over different periods of time. XRD, SEM, AFM and resistivity measurements were done to ascertain the optimum heat treatment condition for obtaining film with minimum resistivity, predominantly (111)-oriented and smoother surface morphology. The as-deposited film has a resistivity of ∼6.3 $\mu$$\Omega$-cm and a relatively small intensity ratio of (111) and (200) peaks. With heat treatment, the resistivity decreases and the (111) peak becomes dominant, along with improved smoothness of the copper film. The optimum condition (with a resistivity of 1.98 $\mu$$\Omega$-cm) is suggested as the rapid thermal nitriding at 400oC for 120 sec.

Growth of Spinel CoMn2O4 Thin Films and Post-growth Annealing Effects on Their Physical Properties (CoMn2O4 스피넬 박막의 합성과 후열처리가 박막의 물리적 특성에 미치는 영향)

  • Kim, D.R.;Kim, J.K.;Yoon, S.W.;Song, J.H.
    • Journal of the Korean Magnetics Society
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    • v.25 no.5
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    • pp.144-148
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    • 2015
  • We grew spinel structured $CoMn_2O_4$ thin films and have studied post-growth annealing effects on their physical properties. After post-growth annealing at $700^{\circ}C$ that is lower than the growth temperature ($720^{\circ}C$), crystal structure became cleared accompanying a change of surface structure. In the temperature dependences of magnetization, phase transitions were observed at ~100 K for both before and after post-growth treated samples which were not observed for the bulk. For both samples, ferromagnetic behaviors were observed above 100 K while it turned to ferrimagnetism at low temperature below 100 K. In particular, the ferrimagnetic behavior became strong after the post-growth treatment. These results indicate that the post-growth annealing process plays an important role in determining the physical properties of spinel $CoMn_2O_4$ thin film.

Effect of post-annealing on single-walled carbon nanotubes synthesized by arc-discharge

  • Park, Suyoung;Choi, Sun-Woo;Jin, Changhyun
    • Journal of Ceramic Processing Research
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    • v.20 no.4
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    • pp.388-394
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    • 2019
  • In this study, high-purity single-walled carbon nanotubes (SWCNTs) were prepared by removing the unreacted metal constituents and amorphous carbon impurities using a post-annealing process. Unlike conventional thermal processing techniques, this technique involved different gas atmospheres for efficient removal of impurities. A heat treatment was conducted in the presence of chlorine, oxygen, and chlorine + oxygen gases. The nanotubes demonstrated the best characteristics, when the heat treatment was conducted in the presence of a mixture of chlorine and oxygen gases. The scanning electron microscopy, transmission electron microscopy, ultraviolet absorbance, and sheet resistance measurements showed that the heat treatment process efficiently removed the unreacted metal and amorphous carbon impurities from the as-synthesized SWCNTs. The high-purity SWCNTs exhibited improved electrical conductivities. Such high-purity SWCNTs can be used in various carbon composites for improving the sensitivity of gas sensors.

Comparison of Resonance Characteristics in FBAR Devices by Thermal Treatments

  • Mai Linh;Song Hae-il;Yoon Giwan
    • Journal of information and communication convergence engineering
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    • v.3 no.3
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    • pp.137-141
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    • 2005
  • The paper presents some methods to improve characteristics of film bulk acoustic resonator (FBAR) devices. The FBAR devices were fabricated on Bragg reflectors. Thermal treatments were done by sintering and/or annealing processes. The measurement showed a considerable improvement of return loss $(S_{11})$ and quality factor $(Q_{s/p}).$ These thermal treatment techniques seem very promising for enhancing FBAR resonance performance.

The effect of rapid thermal annealing treatment for ferroelectric properties of PZT thin films (RTA를 이용한 후열처리가 PZT 박막의 강유전 특성에 미치는 영향)

  • Ju, Pil-Yeon;Park, Young;Jeong, Kyu-Won;Lim, Dong-Gun;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.136-139
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    • 1999
  • The post-annealing treatments on RF (Radio Frequency) magnetron sputtered PZI(Pb$\_$1.05/(Zr$\_$0.52/, Ti$\_$0.48/)O$_3$thin films(4000${\AA}$) have been investigated. for a structure of PZT/Pt/Ti/SiO$_2$/Si Crystallization pproperties of PZT films were strongly dependent on RTA(Rapid Thermal Annealing) annealing temperature. We were able to obtain a perovskite structure of PZT at a low temperature of 600$^{\circ}C$. P-E curves of Pd/PZT/Pt capacitor annealed at 700$^{\circ}C$ demonstrate typical hysteresis loops. The measured values of P$\_$r/, E$\_$c/, by post annealed at 700$^{\circ}C$ were 12.1 ${\mu}$C/$\textrm{cm}^2$, 120KV/cm respectively.

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