Browse > Article

Comparison of Resonance Characteristics in FBAR Devices by Thermal Treatments  

Mai Linh (School of Engineering, Information and Communications University (ICU))
Song Hae-il (School of Engineering, Information and Communications University (ICU))
Yoon Giwan (Information and Communications University (ICU))
Publication Information
Journal of information and communication convergence engineering / v.3, no.3, 2005 , pp. 137-141 More about this Journal
Abstract
The paper presents some methods to improve characteristics of film bulk acoustic resonator (FBAR) devices. The FBAR devices were fabricated on Bragg reflectors. Thermal treatments were done by sintering and/or annealing processes. The measurement showed a considerable improvement of return loss $(S_{11})$ and quality factor $(Q_{s/p}).$ These thermal treatment techniques seem very promising for enhancing FBAR resonance performance.
Keywords
Film bulk acoustic resonator (FBAR); Bragg reflector; Thermal annealing; Return loss; Q­factor; Inter-fabrication annealing; and Post-annealing;
Citations & Related Records
연도 인용수 순위
  • Reference
1 J. H. Collins, 'A short history of microwave acoustics,' IEEE Trans. Microwave Theory Tech., vol. MTT-32, pp. 1127-1139, Sept. 1984
2 S. V. Krishnaswamy, J. F. Rosenbaum, S. S. Horwitz, and R. A. Moore, 'Film bulk acoustic wave resonator and filter technology,' IEEE MTT-S Dig., pp. 153-155, 1992   DOI
3 Newell W.E., 'Face-mounted piezoelectric resonators', Proc. IEEE, 1965, 53, pp. 575-581   DOI   ScienceOn
4 Yoon G., and Park J.D., 'Fabrication of ZnO-based film bulk acoustic resonator devices using W/$SiO_2$ multilayer reflector', IEE Electron. Lett., 2000, 36,pp. 1435-1438   DOI   ScienceOn
5 Lakin, K.M., KLINE, G.R., and MCCARRON, K.T.: 'High-Q microwave acoustic resonators and filters', IEEE Trans. Microw. Theory Tech., 1993, 41, pp. 2139
6 Park. S.H., et al.: 'Film bulk acoustic resonator fabrication for radio frequency filter applications', Jpn. J. Appl. Phys., 2000, 39, pp. 4115-4119   DOI
7 Sang-ho Kim, et al., 'The Fabrication of Thin-Film Bulk Acoustic Wave Resonators Employing a ZnO/Si Composite Diaphragm Structure Using Porous Silicon Layer Etching', IEEE Elec. Device Letters, Vol. 20, NO.3, March 1999, pp. 113-115   DOI   ScienceOn
8 Lakin K.M., MCCARRON K. T., and MCDONALD J. F., 'Temperature compensated bulk acoustic thin film resonantors', Proc. IEEE Ultrasonics Symp., San Juan, Puerto Rico, 2000, pp. 855-858   DOI
9 Yim M., et al., 'Significant resonance characteristic improvements by combined used of thermal annealing and Co electrode in ZnO-based FBARs', IEE Electron. Lett. 2003, 39, pp. 1638 - 1640   DOI   ScienceOn
10 Lakin K.M., et al., 'Solidly mounted resonators and filter'. Proc. IEEE Ultrasonics Symp., Seattle, WA, USA, 1995, pp. 905-908   DOI
11 Kim D.H., et al., 'Improvements of resonance characteristics due to thermal annealing of Bragg reflectors in ZnO-based FBAR devices', IEE Electron. Lett. 2003, 39, pp. 962 - 964   DOI   ScienceOn
12 S. V. Krishnaswamy, J. F. Rosenbaum, S. S. Horwitz, and R. A. Moore, 'Film bulk acoustic wave resonator and filter technology,' IEEE MTT-S Dig., pp. 153-155, 1992   DOI
13 Mai L., et a1., 'dependence of resonance characteristics on thermal annealing in ZnO-based FBAR devices', KIMICS J., 2004, 2, NO.3., pp. 149-152
14 J. Kaitila, M. Yliammi, and J. Molarius, 'ZnO Based Thin Film Bulk Acoustic Wave Filters for EGSM Band', IEEE Ultrasonics Symposium, pp. 803-806, 2001   DOI
15 J.J. Lutsky, R. S. Naik, R. Sodini, and C. G. Sodini, 'A sealed cavity TFR process for RF bandpass filters,' in IEDM Tech. Dig., 1996, pp. 441-444
16 Lakin K.M., G. R. Kline, and K. T. McCrron, 'High-Q microwave acoustic resonators and filters,' IEEE Trans. MTT-S Dig., vol. 41, pp. 1517-1520, 1993   DOI
17 R. B. Stokes and J. D. Crawfold, 'X-band thin film acoustic filters on GaAs,' IEEE Trans. Microwave Theory Tech., vol. 41, pp. 1075-1080, July 1993   DOI   ScienceOn
18 Pinkett S.T., et al., 'Temperature characteristics of ZnO-based thin film bulk acoustic wave resonators'. Proc. IEEE, Ultrasonics Symp., Atlanta, CA. USA, 2001, pp. 823-826   DOI