• 한국재료학회:학술대회논문집
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• 한국재료학회 2011년도 춘계학술발표대회
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• pp.6.1-6.1
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• 2011

Nanoscale block copolymer (BCP) patterns have been pursued for applications in sub-30 nm nanolithography. BCP self-assembly processing is scalable and low cost, and is well-suited for integration with existing semiconductor fabrication techniques. However, one of the major technical challenges for BCP self-assembly is limited tunability in pattern geometry, dimension, and functionality. We suggest methods for extending the degree of tunability by choosing highly incompatible polymer blocks and utilizing solvent vapor treatment techniques. Siloxane BCPs have been developed as self-assembling resists due to many advantages such as high etch-selectivity, good etch-resistance, long-range ordering, and reduced line-edge roughness. The large incompatibility leads to extensive degree of pattern tunability since the effective volume fraction can be easily manipulated by solvent-based treatment techniques. Thus, control of the microdomain size, periodicity, and morphology is possible by changing the vapor pressure and the mixing ratio of selective solvents. This allows a range of different pattern geometry such as dots, lines and holes and critical dimension simply by changing the processing conditions of a given block copolymer without changing a polymer chain length. We demonstrate highly extensive tunability (critical dimension ~6~30 nm) of self-assembled patterns prepared by a siloxane BCP with extreme incompatibility.

• Macromolecular Research
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• 제17권3호
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• pp.181-186
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• 2009

We fabricated ordered micro/nano patterns induced by controlled dewetting on the topographically patterned PS/P4VP bilayer thin film. The method is based on utilizing microimprinting lithography to induce a topographically heterogeneous bilayer film that allows the controlled dewetting upon subsequent thermal annealing. The dewetting that was initiated strictly at the boundary of the thicker and thinner regions was guided by the presence of the topographic structure. The dewetting front velocity of the microdomains in the confined regions was linearly proportional to the measurement time, which enabled us to control the size of the dewet domain with annealing time. In particular, the submicron sized dot arrays between lines were generated with ease when the dewetting was confined into geometry with a few microns in size. The kinetically driven, non-lithographical pattern structures accompanied the pattern reduction to 400%. The pattern arrays on a transparent glass substrate were especially useful for non-circular microlens arrays where the focal length of the lens was easily tunable by controlling the thermal annealing.

• 반도체디스플레이기술학회지
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• 제19권4호
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• pp.11-17
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• 2020

In this study, a new method for fabricating flexible transparent electrodes based on silver nanowire-polymer (AgNW-PEDOT:PSS) composite materials having a mesh pattern formed by a solution-based process without lithography was proposed. By optimizing conditions such as the amount of ultraviolet (UV) photosensitizer injected into the suspension of AgNW and PEDOT:PSS, UV exposure time, and deionized (DI) washing time, a clear and uniform mesh pattern was obtained. For the fabricated AgNW-PEDOT:PSS-based mesh-type electrodes, characteristics such as electrical sheet resistance, light transmittance, haze, and bending flexibility were analyzed according to the mixing ratio of AgNW and PEDOT:PSS included in the suspension. The fabricated mesh electrodes typically exhibited a low electrical sheet resistance of less than 20 Ω/sq while maintaining a high transmittance of 80% or more. In addition, it was confirmed from the results of analyzing the effect of PEDOT:PSS on the characteristics of the mesh-type AgNW-PEDOT electrode that the optical visibility was greatly enhanced by reducing the surface roughness and haze, and the bending flexibility was remarkably improved.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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• pp.493-495
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• 2005

The director profiles of the Bloch walls are directly visualized using fluorescence confocal polarizing microscopy. Both pure twist Bloch walls and diffuse Bloch walls are analyzed. Polar anchoring energy was measured from optical simulation of the transmitted light interference pattern or the fluorescence intensity profile of a pure twist wall..

• 한국조명전기설비학회:학술대회논문집
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• 한국조명전기설비학회 2006년도 춘계학술대회 논문집
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• pp.176-179
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• 2006

We present the method to obtain four speckle patterns with relative phase shift of $\pi/2$ by passive devices such as wave plate and polarizer, and calculate the phase at each point of the speckle pattern in shearographic system using Wollaston in And, to demonstrate the feasibility of the proposed system, we present the experimental results using polymer insulator.

• 대한기계학회논문집A
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• 제38권1호
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• pp.51-57
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• 2014

초음파 임프린팅은 열가소성 고분자 기판에 미세패턴을 복제할 수 있는 공정으로 타 성형방법에 비해 에너지소모가 적고 성형시간이 단축되는 장점이 있다. 초음파 임프린팅 공정에서는 고분자 기판의 표면에 초음파 진동에너지를 인가하여 소재간의 마찰열과 미세하게 반복되는 변형에너지의 축적을 통해 고분자 표면을 국부적으로 가소화시켜 미세패턴이 전사된다. 본 연구에서는 초음파 임프린팅에서 금형 온도가 미세패턴의 전사성에 미치는 영향을 분석하였다. 이를 위해 금형온도를 변화시켜가며 임프린팅을 수행하여 미세패턴 성형 영역에서의 온도변화를 관찰하였고, 상기 온도변화를 고려하여 미세패턴의 충진과정을 전산모사를 통해 고찰하였다. 또한 금형온도 변화에 따른 패턴의 전사율 및 전사균일도를 측정하여 비교하였다. 상기 결과를 통해 금형온도를 높일수록 초음파 임프린팅시 미세패턴의 전사특성이 향상됨을 확인할 수 있었다.

• 대한기계학회논문집A
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• 제32권4호
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• pp.303-309
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• 2008

Dense and fine polymer patterns often collapse, as they come into contact with each other at their protruding tips. Resist pattern collapse depends on the aspect ratio of patterns and the surface tension of rinsing materials. The pattern collapse is a very serious problem in microfabrication, because it is one of the factors which limit the device dimensions. The reasons for the pattern collapse are known as the surface tension of rinse liquid, centrifugal force and rinse liquid flow produced in the developing process. In this work, we tried to evaluate the pattern collapse of three-dimensional microstructures that were fabricated by two-photon induced photopolymerization, and showed the way how to reduce the deformation of microstructures.

• 한국레이저가공학회지
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• 제7권3호
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• pp.37-46
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• 2004

The shape and size variations of the nanopatterns produced on a polymer film using a near-field scanning optical microscope(NSOM) are investigated with respect to the process variables. A cantilever type nanoprobe having a 100nm aperture at the apex of the pyramidal tip is used with the NSOM and a He-Cd laser at a wavelength of 442nm as the illumination source. Patterning characteristics are examined for different laser beam power at the entrance side of the aperture($P_{in}$), scan speed of the piezo stage(V), repeated scanning over the same pattern, and operation modes of the NSOM(DC and AC modes). The pattern size remained almost the same for equal linear energy density. Pattern size decreased for lower laser beam power and greater scan speed, leading to a minimum pattern width of around 50nm at $P_{in}=1.2{\mu}W\;and\;V=12{\mu}m/s$. Direct writing of an arbitrary pattern with a line width of about 150nm was demonstrated to verify the feasibility of this technique for nanomask fabrication. Application on high-density data storage is discussed.

• 한국의류학회지
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• 제35권11호
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• pp.1271-1284
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• 2011

This study improves the fitness of Air Force winter service uniforms through the development of a shirt pattern drafting method and automatic pattern drafting program for MTM production. A calculation formula is formed through a correlation analysis and regression analysis using Size Korea 2004 3D measurement data after analyzing 4 kinds of existing shirt pattern drafting methods and 3 types of shirt patterns currently used for the Air Force service uniform. The results of this study are as follows: The developed pattern drafting method has 4 parts that use calculated dimensions: neck base width, front interscye, back interscye and scye depth. Other body measuring parts that have a high correlation with calculation parts are inserted into regression analysis as independent variables to create dimension calculation formulas. The result of the final study patterns were better than existing winter service uniforms in nearly all items for the appearance evaluation and motion adaptability evaluations. The method was converted into an automatic pattern drafting program using C++ after the completion of pattern drafting method development.

• 폴리머
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• 제29권3호
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• pp.294-299
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• 2005

온도응답성 고분자인 PIPAAm을 포토마스크를 사용하여 전자빔조사에 의해 패턴상으로 세포배양용 폴리스티렌 접시표면에 그래프트하였다. 폴리스티렌 표면에의 PIPAAm의 그래프트는 AIR-FTIR과 ESCA에 의한 표면분석을 통해 확인하였다. 이러한 표면에 간실질세포를 $37^{circ}C$에서 배양하였고, 균일하게 간세포가 배양된 배양접시를 PIPAAm의 LCST 이하인 $20^{circ}C$로 배양온도를 낮추어 PIPAAm이 그래프트된 도메인에 접착된 간실질세포를 탈착시키고 배양접시를 다시 $37^{circ}C$로 올린 후 두 번째 세포인 혈관내피세포를 파종하여 PIPAAm이 그래프트된 도메인에만 선택적으로 접착시킴으로써 같은 평면상에서 간실질세포와 혈관내피세포를 공배양할 수 있게 되었다. 이러한 방법으로 생체외에서 간실질세포와 혈관내피세포를 장기간에 걸쳐 공배양할 수 있었다.