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http://dx.doi.org/10.3795/KSME-A.2008.32.4.303

Investigation into Deformation of Three-Dimensional Microstructures via Surface Tension of a Rinsing Material During a Developing Process  

Park, Sang-Hu (부산대학교 정밀금형 및 금형가공연구소 (ERC) / 부산대학교 기계공학부)
Yang, Dong-Yol (한국과학기술원 기계공학과)
Publication Information
Transactions of the Korean Society of Mechanical Engineers A / v.32, no.4, 2008 , pp. 303-309 More about this Journal
Abstract
Dense and fine polymer patterns often collapse, as they come into contact with each other at their protruding tips. Resist pattern collapse depends on the aspect ratio of patterns and the surface tension of rinsing materials. The pattern collapse is a very serious problem in microfabrication, because it is one of the factors which limit the device dimensions. The reasons for the pattern collapse are known as the surface tension of rinse liquid, centrifugal force and rinse liquid flow produced in the developing process. In this work, we tried to evaluate the pattern collapse of three-dimensional microstructures that were fabricated by two-photon induced photopolymerization, and showed the way how to reduce the deformation of microstructures.
Keywords
Two-Photon Polymerization; 3D Pattern Collapse; Three-Dimensional Microstructure; Surface Tension;
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Times Cited By KSCI : 2  (Citation Analysis)
Times Cited By SCOPUS : 0
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