• Proceedings of the Materials Research Society of Korea Conference
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• 2011.05a
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• pp.6.1-6.1
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• 2011

Nanoscale block copolymer (BCP) patterns have been pursued for applications in sub-30 nm nanolithography. BCP self-assembly processing is scalable and low cost, and is well-suited for integration with existing semiconductor fabrication techniques. However, one of the major technical challenges for BCP self-assembly is limited tunability in pattern geometry, dimension, and functionality. We suggest methods for extending the degree of tunability by choosing highly incompatible polymer blocks and utilizing solvent vapor treatment techniques. Siloxane BCPs have been developed as self-assembling resists due to many advantages such as high etch-selectivity, good etch-resistance, long-range ordering, and reduced line-edge roughness. The large incompatibility leads to extensive degree of pattern tunability since the effective volume fraction can be easily manipulated by solvent-based treatment techniques. Thus, control of the microdomain size, periodicity, and morphology is possible by changing the vapor pressure and the mixing ratio of selective solvents. This allows a range of different pattern geometry such as dots, lines and holes and critical dimension simply by changing the processing conditions of a given block copolymer without changing a polymer chain length. We demonstrate highly extensive tunability (critical dimension ~6~30 nm) of self-assembled patterns prepared by a siloxane BCP with extreme incompatibility.

• Macromolecular Research
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• v.17 no.3
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• pp.181-186
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• 2009

We fabricated ordered micro/nano patterns induced by controlled dewetting on the topographically patterned PS/P4VP bilayer thin film. The method is based on utilizing microimprinting lithography to induce a topographically heterogeneous bilayer film that allows the controlled dewetting upon subsequent thermal annealing. The dewetting that was initiated strictly at the boundary of the thicker and thinner regions was guided by the presence of the topographic structure. The dewetting front velocity of the microdomains in the confined regions was linearly proportional to the measurement time, which enabled us to control the size of the dewet domain with annealing time. In particular, the submicron sized dot arrays between lines were generated with ease when the dewetting was confined into geometry with a few microns in size. The kinetically driven, non-lithographical pattern structures accompanied the pattern reduction to 400%. The pattern arrays on a transparent glass substrate were especially useful for non-circular microlens arrays where the focal length of the lens was easily tunable by controlling the thermal annealing.

• Journal of the Semiconductor & Display Technology
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• v.19 no.4
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• pp.11-17
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• 2020

In this study, a new method for fabricating flexible transparent electrodes based on silver nanowire-polymer (AgNW-PEDOT:PSS) composite materials having a mesh pattern formed by a solution-based process without lithography was proposed. By optimizing conditions such as the amount of ultraviolet (UV) photosensitizer injected into the suspension of AgNW and PEDOT:PSS, UV exposure time, and deionized (DI) washing time, a clear and uniform mesh pattern was obtained. For the fabricated AgNW-PEDOT:PSS-based mesh-type electrodes, characteristics such as electrical sheet resistance, light transmittance, haze, and bending flexibility were analyzed according to the mixing ratio of AgNW and PEDOT:PSS included in the suspension. The fabricated mesh electrodes typically exhibited a low electrical sheet resistance of less than 20 Ω/sq while maintaining a high transmittance of 80% or more. In addition, it was confirmed from the results of analyzing the effect of PEDOT:PSS on the characteristics of the mesh-type AgNW-PEDOT electrode that the optical visibility was greatly enhanced by reducing the surface roughness and haze, and the bending flexibility was remarkably improved.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07a
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• pp.493-495
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• 2005

The director profiles of the Bloch walls are directly visualized using fluorescence confocal polarizing microscopy. Both pure twist Bloch walls and diffuse Bloch walls are analyzed. Polar anchoring energy was measured from optical simulation of the transmitted light interference pattern or the fluorescence intensity profile of a pure twist wall..

• Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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• 2006.05a
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• pp.176-179
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• 2006

We present the method to obtain four speckle patterns with relative phase shift of $\pi/2$ by passive devices such as wave plate and polarizer, and calculate the phase at each point of the speckle pattern in shearographic system using Wollaston in And, to demonstrate the feasibility of the proposed system, we present the experimental results using polymer insulator.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.38 no.1
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• pp.51-57
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• 2014

Ultrasonic imprinting is a novel process for replicating micropatterns on thermoplastic polymer substrates with low energy consumption and short cycle time. The polymer substrate is softened by the frictional heat and repetitive deformation energy under ultrasonic excitation; thus, a number of micropatterns are replicated on the softened polymer substrate. In the present work, the effect of mold temperature on the replication characteristics of ultrasonic imprinting is investigated. The temperature change in the patterned region is measured by varying the mold temperature. Numerical simulation is then performed for investigating pattern replication characteristics under various mold temperatures. In addition, pattern replication ratio and uniformity are compared through various experimental measurements. Through the results of these comparisons, it is found that the mold temperature has a significant positive effect on the replication characteristics of ultrasonic imprinting.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.32 no.4
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• pp.303-309
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• 2008

Dense and fine polymer patterns often collapse, as they come into contact with each other at their protruding tips. Resist pattern collapse depends on the aspect ratio of patterns and the surface tension of rinsing materials. The pattern collapse is a very serious problem in microfabrication, because it is one of the factors which limit the device dimensions. The reasons for the pattern collapse are known as the surface tension of rinse liquid, centrifugal force and rinse liquid flow produced in the developing process. In this work, we tried to evaluate the pattern collapse of three-dimensional microstructures that were fabricated by two-photon induced photopolymerization, and showed the way how to reduce the deformation of microstructures.

• Laser Solutions
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• v.7 no.3
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• pp.37-46
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• 2004

The shape and size variations of the nanopatterns produced on a polymer film using a near-field scanning optical microscope(NSOM) are investigated with respect to the process variables. A cantilever type nanoprobe having a 100nm aperture at the apex of the pyramidal tip is used with the NSOM and a He-Cd laser at a wavelength of 442nm as the illumination source. Patterning characteristics are examined for different laser beam power at the entrance side of the aperture($P_{in}$), scan speed of the piezo stage(V), repeated scanning over the same pattern, and operation modes of the NSOM(DC and AC modes). The pattern size remained almost the same for equal linear energy density. Pattern size decreased for lower laser beam power and greater scan speed, leading to a minimum pattern width of around 50nm at $P_{in}=1.2{\mu}W\;and\;V=12{\mu}m/s$. Direct writing of an arbitrary pattern with a line width of about 150nm was demonstrated to verify the feasibility of this technique for nanomask fabrication. Application on high-density data storage is discussed.

• Journal of the Korean Society of Clothing and Textiles
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• v.35 no.11
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• pp.1271-1284
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• 2011

This study improves the fitness of Air Force winter service uniforms through the development of a shirt pattern drafting method and automatic pattern drafting program for MTM production. A calculation formula is formed through a correlation analysis and regression analysis using Size Korea 2004 3D measurement data after analyzing 4 kinds of existing shirt pattern drafting methods and 3 types of shirt patterns currently used for the Air Force service uniform. The results of this study are as follows: The developed pattern drafting method has 4 parts that use calculated dimensions: neck base width, front interscye, back interscye and scye depth. Other body measuring parts that have a high correlation with calculation parts are inserted into regression analysis as independent variables to create dimension calculation formulas. The result of the final study patterns were better than existing winter service uniforms in nearly all items for the appearance evaluation and motion adaptability evaluations. The method was converted into an automatic pattern drafting program using C++ after the completion of pattern drafting method development.

• Polymer(Korea)
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• v.29 no.3
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• pp.294-299
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• 2005

Thermo-responsive poly(N-isopropylacrylamide) (PIPAAm) was covalently patterned by masked el electron beam irradiation. Introduction of PIPAAm on tissue culture polystyrene dish was confirmed by ATR-FTIR and ESCA measurements. Hepatocytes were cultured at $37^{circ}C$ on these surfaces. Cells adhered on PIPAAm-grafted domains were detached by reducing culture temperature to $20^{circ}C$. Endothelial cells were then seeded and cultured on the same surfaces. Seeded endothelial cells were selectively attached on hepatocytes detached and PIPAAm-grafted domains and could be co-cultured with hepatocytes on the same culture dishes with clear pattern. This co-culture method enabled long-term co-culture of hepatocytes with endothelial cells.