• Title/Summary/Keyword: polycrystalline

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Crystal Growth of Polycrystalline Silicon by Directional Solidification (일방향 응고법에 의한 단결정 Si의 결정성장에 관한 연구)

  • 김계수;이창원;홍준표
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.3 no.2
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    • pp.149-156
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    • 1993
  • Polycrystalline silicon was produced from metallurgical-grade Si by unidirectional solidification. Variations of impurity concentration and resistivity in the ingots have been investigated. X-ray diffraction analysis has also been performed to examine the crystal orientation. According to the X-ray diffraction analysis on the polycrystalline silicon, preferential orientation was changed from ( 220) into ( III ) with decreasing growth rate. Also, with increasing growth rate and fraction solidified, the resistivity tends to decrease.

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Characteristics of polycrystalline 3C-SiC micro pressure sensors for high temperature applications (초고온용 다결정 3C-SiC 마이크로 압력센서의 특성)

  • Thien, Duong Xuan;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.387-388
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    • 2008
  • High temperature micro pressure sensors were fabricated by polycrystalline (poly) 3C-SiC piezoresistors formed by oxidized SOI substrates with APCVD. These have been designed by bulk micromachining below $1{\times}1mm^2$ diaphragm and Si membrane $20{\mu}m$ thick. The pressure sensitivity of fabricated pressure sensor was 0.1 mV/Vbar. The non-linearity of sensor was ${\pm}0.44%$ FS and the hysteresis was 0.61% FS.TCS of pressure sensor was -1867 ppm/$^{\circ}C$, its TCR was -792 ppm/$^{\circ}C$, and TCGF to 5 bar was -1042 ppm/$^{\circ}C$ from 25 to $400^{\circ}C$.

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3.5 inch QCIF AMOLED Panel with Ultra Low Temperature Polycrystalline Silicon Thin Film Transistor on Plastic Substrate

  • Kim, Yong-Hae;Chung, Choong-Heui;Moon, Jae-Hyun;Park, Dong-Jin;Lee, Su-Jae;Kim, Gi-Heon;Song, Yoon-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.717-720
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    • 2007
  • We fabricated the 3.5 inch QCIF AMOLED panel with ultra low temperature polycrystalline silicon TFT on the plastic substrate. To reduce the leakage current, we used the triple layered gate metal structure. To reduce the stress from inorganic dielectric layer, we applied the organic interlayer dielectric and the photoactive insulating layer. By using the interlayer dielectric as a capacitor, the mask steps are reduced up to five.

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Fabrication of CdS Solar Cells Prepared by Chemical Pyrolysis Deposition (화학적 열분해방법에 의한 CdS 태양전지의 제작)

  • 고정곤;김홍복;허윤성
    • Journal of the Korea Safety Management & Science
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    • v.4 no.2
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    • pp.199-207
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    • 2002
  • The polycrystalline CdS of large scale were grown by chemical pyrolysis deposition for $Cu_2$S/CdS heterojunction solar cells. For high quality CdS polycrystalline thin films, the chemical solution was deposited on indium tin oxide(ITO) glasses at the temperature of 50$0^{\circ}C$ for 15 second and annealed at 35$0^{\circ}C$ for 20 minute or 50$0^{\circ}C$ for 30 second. To fabricate high efficiency solar cells, optical and electrical properties, morphology by SEM and x-ray diffraction on polycrystalline CdS thin films were investigated. From the I-V characteristics of $Cu_2$S/CdS heterojunction, the open circuit voltage, $V_{oc}$ was 0.7 V and the short circuit current, $I_{sc}$ was 4.2 mA. We found that the fill factor(FF) was 0.5 and the efficiency was 2.5%.

Growth of Transferable Polycrystalline Si Film on Mica Substrate (운모기판을 이용한 다결정 Si 전이막 성장 연구)

  • Park Jin Woo;Eom Ji Hye;Ahn Byung Tae;Jun Young Kwon
    • Korean Journal of Materials Research
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    • v.14 no.5
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    • pp.343-347
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    • 2004
  • We investigated the growth feasibility of polycrystalline Si film on mica substrate for the transfer of the layer to a plastic substrate. The annealing temperature was limited up to $600^{\circ}C$ because of crack development in the mica substrate. Amorphous Si film was deposited on mica substrate by PECVD and was crystallized by furnace annealing. During the annealing, bubbles were formed at the Si/mica interface. The bubble formation was avoided by the Ar-plasma treatment before amorphous Si deposition. A uniform and clean polycrystalline Si film was obtained by coating $NiCl_2$ on the amorphous Si film and annealing at $500^{\circ}C$ for 10 h. The conventional Si lithography was possible on the mica substrate and the devices fabricated on the substrate could be transferred to a plastic substrate.

Microstructural Evolution during High-Temperature Deformation of Coarse-Grained BaTiO3

  • Park, Eun-Tae
    • The Korean Journal of Ceramics
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    • v.5 no.2
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    • pp.99-103
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    • 1999
  • Compressive creep of dense polycrystalline $BaTiO_3$, with average grain sizes of 19.3-52.4$\mu\textrm{m}$, has been investigated at 1100-$1300^{\circ}C$ in air or under controlled atmospheres $(10^2-10^5Pa \;O_2)$. Some cavity growth occurred during deformation because of non-steady-state damage accumulation in the form of cavitation. Comparison of the creep data of polycrystalline BaTiO3 with existing diffusivity and creep data for perovskite oxides suggested that deformation of polycrystalline $BaTiO_3$ was controlled by the extrinsic lattice diffusion of barium or titanium.

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Study for polycrystalline 3C-SiC thin films growth by LPCVD (LPCVD에 의한 다결정 3C-SiC 결정성장에 관한 연구)

  • Kim, Kang-San;Chung, Gwiy-Sang
    • Proceedings of the KIEE Conference
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    • 2006.07c
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    • pp.1313-1314
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    • 2006
  • The polycrystalline 3C-SiC thin films heteroepitaxially grown by LPCVD method using single precursor 1,3-disilabutane at $850^{\circ}C$. The crystallinity of the 3C-SiC thin film was analyzed by XRD and FT-IR. Residual strain was investigated by Raman scattering. The surface morphology was also observed by AFM and voids or dislocations between SiC and $SiO_2$ were measured by SEM. The grown poly 3C-SiC thin film is very good crystalline quality, surface like mirror, and low defect and strain. Therefore, the polycrystalline 3C-SiC is suitable for harsh environment MEMS applications.

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Ohmic contact formation of polycrystalline 3C-SiC for high-temperature MEMS applications (초고온 MEMS용 다결정 3C-SiC의 Ohmic Contact 형성)

  • Ohn, Chang-Min;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.406-407
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    • 2006
  • This paper describes the ohmic contact formation between a TiW film as a contact material deposied by RF magnetron sputter and polycrystalline 3C-SiC films deposied on thermally grown Si wafers. The specific contact resistance (${\rho}_c$) of the TiW contact was measured by using the C-TLM. The contact phase and interfacial reaction between TiW and 3C-SiC at high-temperature were also analyzed by XRD and SEM. All of the samples didn't show cracks of the TiW film and any interfacial reaction after annealing. Especially, when the sample was annealed at $800^{\circ}$ for 30min., the lowest contact resistivity of $2.90{\times}10^{-5}{\Omega}cm^2$ was obtained due to the improved interfacial adhesion.

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Development of Polycrystalline Diamond Tungsten Carbide Combination Circular Saw and Comparison of Tool Wear (PCD 초경 복합 원형 톱 개발과 공구마모 비교)

  • Joo, Chang-Min;Park, Yoon-Ok;Kim, Su-Jin
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.20 no.9
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    • pp.48-56
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    • 2021
  • Tungsten carbide (WC) circular saws have been widely used to cut plywood. Recently, expensive polycrystalline diamond (PCD) were adopted to extend the tool life of circular saws. This study developed a PCD-WC combination circular saw and compared its performance with that of existing WC and PCD saws. Flank wear of WC saw blades and edge chipping of rectangular PCD was observed during the experiments. The PCD-WC saw replaced half of the chamfered teeth with PCD and applied tough WC for all rectangular teeth. In the experiments, edge chipping was not observed in rectangular WC teeth and the flank wear of chamfered teeth was decreased compared with that of conventional circular saws.

A study on the growth of 3 inch grade AlN crystal (직경 3인치의 AlN 단결정 성장에 관한 연구)

  • Kang, Seung-Min
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.29 no.3
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    • pp.140-142
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    • 2019
  • AlN (Aluminum Nitride) crystal which could be used to substrates for UV LEDs was grown by PVT ((Physical Vapor Transport) method. 3 inch AlN single crystal with a thickenss of 4 mm was grown using Polycrystalline seed for 120 hours. In this report, a result of 3 inch polycrystalline bulk AlN growth behavior using large size crucible and growth condition were reported.