• 제목/요약/키워드: patterning effect

검색결과 146건 처리시간 0.034초

초음파 패턴성형시 유동방향 구속에 따른 미세패턴의 성형특성 고찰 (Effect of Material Flow Direction on the Replication Characteristics of the Ultrasonic Patterning Process)

  • 서영수;이기연;박근
    • 소성∙가공
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    • 제21권2호
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    • pp.119-125
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    • 2012
  • The present study addresses a direct patterning process on a plastic film using ultrasonic vibration energy. In this process, a tool horn containing micro-patterns is attached to an ultrasonic power supply, and is used with ultrasonic vibration to replicate micro-patterns on the surface of a plastic film. To improve the replication characteristics of the micro-patterns, the effect of the die shape of the ultrasonic patterning process was investigated with respect to the flow direction control. Finite element analyses were performed to predict the flow characteristics of the polymer with variations in die design parameters. Experiments were conducted using the optimally-designed die, from which it was possible to attain much improved pattern replication.

Fabrication of High-Resolution Pixels in Organic Light-Emitting Displays Using Laser-Inscribed Sacrificial Layer

  • Choi, Won-Suk;Kim, Min-Hoi;Na, Yu-Jin;Koo, Kyung-Mo;Lee, Sin-Doo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.755-757
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    • 2009
  • We developed a novel patterning method of organic light emitting materials using a laser-inscribed sacrificial layer for fabricating high-resolution pixels in organic light emitting displays (OLEDs). Our patterning process is capable of achieving high spatial resolution of about 10 ${\mu}m$. Moreover, it has no detrimental effect on the electrical properties of organic materials. This patterning approach is expected to be applicable for patterning and integrating a wide range of organic materials for organic electronic and optoelectronic devices.

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빔 위치 관련 제어인자가 집속이온빔 패턴 증착공정에 미치는 영향 (The Influence of Parameters Controlling Beam Position On-Sample During Deposition Patterning Process with Focused Ion Beam)

  • 김준현;송춘삼;김윤제
    • 대한기계학회논문집A
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    • 제32권3호
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    • pp.209-216
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    • 2008
  • The application of focused ion beam (FIB) depends on the optimal interaction of the operation parameters between operating parameters which control beam and samples on the stage during the FIB deposition process. This deposition process was investigated systematically in C precursor gas. Under the fine beam conditions (30kV, 40nm beam size, etc), the effect of considered process parameters - dwell time, beam overlap, incident beam angle to tilted surface, minimum frame time and pattern size were investigated from deposition results by the design of experiment. For the process analysis, influence of the parameters on FIB-CVD process was examined with respect to dimensions and constructed shapes of single and multi- patterns. Throughout the single patterning process, optimal conditions were selected. Multi-patterning deposition were presented to show the effect of on-stage parameters. The analysis have provided the sequent beam scan method and the aspect-ratio had the most significant influence for the multi-patterning deposition in the FIB processing. The bitmapped scan method was more efficient than the one-by-one scan type method for obtaining high aspect-ratio (Width/Height > 1) patterns.

PDMS 기판상에 금속층의 안정적 증착 및 패터닝 (The stable e-beam deposition of metal layer and patterning on the PDMS substrate)

  • 백주열;권구한;이상훈
    • 센서학회지
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    • 제14권6호
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    • pp.423-429
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    • 2005
  • In this paper, we proposed the fabrication process of the stable e-beam evaporation and the patterning of metals layer on the polydimethylsiloxane (PDMS) substrate. The metal layer was deposited under the various deposition rate, and its effect to the electrical and mechanical properties (e.g.: adhesion-strength of metal layer) was investigated. The influence of surface roughness to the adhesion-strength was also examined via the tape test. Here, we varied the roughness by changing the reactive ion etching (RIE) duration. The electrode patterning was performed through the conventional photolithography and chemical etching process after e-beam deposition of $200{\AA}$ Ti and $1000{\AA}$ Au. As a result, the adhesion strength of metal layer on the PDMS surface was greatly improved by the oxygen plasma treatment. The e-beam evaporation on the PDMS surface is known to create the wavy topography. Here, we found that such wavy patterns do not effect to the electrical and mechanical properties. In conclusion, the metal patterns with minimum $20{\mu}m$ line width was produced well via the our fabrication process, and its electrical conductance was almost similar to the that of metal patterns on the silicon or glass substrates.

Fabrication of Ordered Nanoporous Alumina Membrane by PDMS Pre-Patterning

  • 김별;이진석
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.265.1-265.1
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    • 2013
  • Nanoporous anodic aluminum oxide (AAO), a self-ordered hexagonal array has various applications for nanofabrication such as nanotemplate, and nanostructure. In order to obtain highly-ordered porous alumina membranes, Masuda et al. proposed a two-step anodization process however this process is confined to small domain size and long hours. Recently, alternative methods overcoming limitations of two-step process were used to make prepatterned Al surface. In this work, we confirmed that there is a specific tendency used a PDMS stamp to obtain a pre-patterned Al surface. Using the nanoindentaions of a PDMS stamp as chemical carrier for wet etching, we can easily get ordered nanoporous template without two-step process. This chemical etching method using a PDMS stamp is very simple, fast and inexpensive. We use two types of PDMS stamps that have different intervals (800nm, 1200nm) and change some parameters have influenced the patterning of being anodized, applied voltage, soaking and stamping time. Through these factors, we demonstrated the patterning effect of large scale PDMS stamp.

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가로 가둠을 통한 자성층간 결합 기여도 조절 (Tailoring Magnetic Interlayer Coupling Contribution via Lateral Confinement)

  • 이동렬
    • 한국자기학회지
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    • 제26권5호
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    • pp.149-153
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    • 2016
  • Fe/Gd 다층박막 내 자성층간 결합에 미치는 패턴의 영향을 연구하였다. 이를 위하여 하나의 다층박막 시료를 나누어서 패턴한 것과 패턴하지 않은 것으로 제작하여 비교하였다. X선 자기 원편광 이색성(X-ray magnetic circular dichrosim: XMCD)을 이용하여 Gd 원소에 선택적인 자화 벡터의 온도 변화를 비교한 결과, 패턴 시료의 경우 Gd 자화 벡터의 온도의존성이 패턴 전에 비해 뚜렷하게 변화했음을 관측하였다. 이는 패턴 효과와 반강자성의 층간 결합 효과가 서로 경쟁하여 나타난 결과이다.

Photosensitive Electrode Paste Formulation and Its Effect on Photolithographic Process

  • Park, Lee-Soon;Im, Moo-Sik;Park, Jin-Woo;Kim, Hong-Tak;Ryu, Jae-Hwa;Park, Seung-Tae
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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    • pp.381-384
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    • 2003
  • Photosensitive electordes(Ag and Black) are widely used in the patterning of both address and bus electrodes on the rear and front panel of plasma display panel (PDP). As the need for high resolution(>XGA) and large area(>60 inches) PDP is increased, basic understanding of each component of formulation on the photolithographic process of patterning electrodes are required in order to increase the yield in the production of PDP. In this work, the materials and amount of necessary components of photosensitive electrode paste and their effect on the photolithographic process of patterning electrodes were studied.

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Effect of the Plasma-assisted Patterning of the Organic Layers on the Performance of Organic Light-emitting Diodes

  • Hong, Yong-Taek;Yang, Ji-Hoon;Kwak, Jeong-Hun;Lee, Chang-Hee
    • Journal of Information Display
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    • 제10권3호
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    • pp.111-116
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    • 2009
  • In this paper, a plasma-assisted patterning method for the organic layers of organic light-emitting diodes (OLEDs) and its effect on the OLED performances are reported. Oxygen plasma was used to etch the organic layers, using the top electrode consisting of lithium fluoride and aluminum as an etching mask. Although the current flow at low voltages increased for the etched OLEDs, there was no significant degradation of the OLED efficiency and lifetime in comparison with the conventional OLEDs. Therefore, this method can be used to reduce the ohmic voltage drop along the common top electrodes by connecting the top electrode with highly conductive bus lines after the common organic layers on the bus lines are etched by plasma. To further analyze the current increase at low voltages, the plasma patterning effect on the OLED performance was investigated by changing the device sizes, especially in one direction, and by changing the etching depth in the vertical direction of the device. It was found that the current flow increase at low voltages was not proportional to the device sizes, indicating that the current flow increase does not come from the leakage current along the etched sides. In the etching depth experiment, the current flow at low voltages did not increase when the etching process was stopped in the middle of the hole transport layer. This means that the current flow increase at low voltages is closely related to the modification of the hole injection layer, and thus, to the modification of the interface between the hole injection layer and the bottom electrode.

고분자 폴리머 잉크를 이용한 고속 연속 전기 방사 프린팅 (High Speed and Continuous Electrospinning Printing Using Polymer Ink)

  • 장대해;권계시
    • 대한기계학회논문집B
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    • 제39권4호
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    • pp.379-384
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    • 2015
  • 최근 전기방사를 이용한 프린팅이 미세 패터닝 분야에 응용이 되고 있다. 전기방사를 이용한 패터닝은 연속 프린팅 방식으로 기존의 요구적출형 방식에 비해 패터닝 속도가 빠르다는 장점이 있다. 안정적인 연속 프린팅을 위해서는 고분자의 폴리머를 프린팅하려고 하는 잉크에 혼합하는 것이 필요하다. 본 연구에서는 PEO 를 이러한 첨가 폴리머로 사용하였다. 이러한 폴리머의 첨가에 대한 잉크의 점도 및 Taylor cone 형성에 대해 미치는 영향을 조사하였다. 마지막으로 전기방사 프린팅의 예로서 실버 페이스트 잉크를 유리 기판 위에 패터닝하였다.