• 대한전자공학회:학술대회논문집
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• 대한전자공학회 1998년도 하계종합학술대회논문집
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• pp.481-484
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• 1998

In this study, oxide(TEOS) CMPs were carried out for various head pressures. Table and head speeds are fixed at 25 RPM. Head pressures are 5, 7.5, 10, 12.5 PSI, and under these conditions, 1,587, 1,631, 2,556, 2,871.agns./min of oxide (TEOS) removal rates and 14.7, 18.5, 9.52, 7.9% of uniformities are obtained, respectively. Also, these experiments for local and global planarizations were done using the patterned 4" wafers. These conditions are applicable to STI(shallow trench isolation) structures and planarizations for sub-half micron lithography.aphy.

• 구강회복응용과학지
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• 제18권3호
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• pp.171-178
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• 2002

본 연구의 목적은 순수 티타늄에 열처리를 통해 서로 다른 두께의 산화막을 형성하여 온도차이에 따른 골결합에 대한 영향을 관찰하고자 하는 것이다. 총 52개의 임플란트를 제작하여 열처리를 하지 않은 26개의 임플란트를 대조군으로, $600^{\circ}F(316^{\circ}C)$에서 10분간 열처리한 13개의 임플란트를 실험군 1로, $1200^{\circ}F(649^{\circ}C)$에서 10분간 열처리한 13개의 임플란트를 실험군 2로 하여 13마리의 가토의 경골에 식립한 후 12주 후의 removal torque를 측정 비교함으로써 다음과 같은 결과를 얻었다. 1. 실험군 2에서는 결정구조가 생성된 것이 관찰되었으나, 실험군 1에서는 무정형이었다. 2. 대조군에 비해 열처리를 한 실험군들이 더 큰 removal torque 값을 나타냈다(p=0.0059, 0.0039). 3. 실험군 2가 실험군 1에 비해 큰 removal torque 값을 나타냈다(p=0.0488).

• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 추계학술대회
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• pp.922-927
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• 2003

In this paper, slurry fluid motion, abrasive particle motion, and roles of groove patterns on the pads are numerically investigated in the 2D and 3D geometries. The simulation results are analyzed in terms of experimental removal rate and WIWNU (within wafer non-uniformity) for ILD (inter level dielectric) CMP process. Numerical investigations reveal that the grooves in the pad behave as uniform distributor of abrasive particles and enhance the removal rate by increasing shear stress. Higher removal rate and desirable uniformity are numerically and experimentally observed at the pad with grooves. Numerical analysis is very well matched with experimental results and helpful for understanding polishing mechanism and local physics.

• 한국대기환경학회지
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• 제6권2호
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• pp.161-167
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• 1990

The reaction of sulfur dioxide with cupric oxide supported on zeolite was investigated over a temperature range of $250{\sim}450^{{\circ}C$. After the completion of the $SO_2$ removal reaction, the cupric sulfate produced was regenerated to copper by hydrogen or LPG. The experimental results showed that the removal efficiency of $SO_2$ was improved with temperature increase and with $SO_2$ inlet concentration decrease. The reaction of $SO_2$ with CuO/Zeolite was well explained by the shrinking unreacted core model using first order chemical reaction control and diffusion control. THe reaction rate constant and the effective diffusivity were respectively as follows: 1k (cm/s) = 2.519 exp[-10991 (cal/mol)/RT] $De(cm^2/s) = 2.06 \times 10^{-5} exp[-8380 (cal/mol)/RT]$

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.555-556
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• 2007

Through the single head kinematics, sliding distance is a movement of a pad within wafer. The sliding distance is very important to frictional heat, material removal, and so on. A Temperature distribution is similar to sliding distance. But is not same. Because of complex process factor in CMP. A platen velocity is a dominant factor in a temperature and material removal. WIWNU is low in head faster condition.

• 대한기계학회논문집B
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• 제29권4호
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• pp.435-440
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• 2005

In this paper, slurry fluid motion, abrasive particle motion, and roles of groove patterns on the pads are numerically investigated in the 2D and 3D geometries. The simulation results are analyzed in terms of experimental removal rate and WIWNU (Within Wafer Non-Uniformity) for ILD (Inter Level Dielectric) CMP process. Numerical investigations reveal that the grooves in the pad behave as uniform distributor of abrasive particles and enhance the removal rate by increasing shear stress. Higher removal rate and desirable uniformity are numerically and experimentally observed at the pad with grooves. Numerical analysis is very well matched with experimental results and helpful fur understanding polishing mechanism and local physics.

• Nuclear Engineering and Technology
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• 제54권2호
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• pp.627-636
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• 2022

In nuclear power plants and other nuclear facilities the removal of cobalt from radioactive liquid waste is needed to reduce the radioactivity concentration in effluents. In liquid wastes containing strong organic complexing agents such as EDTA cobalt removal can be problematic due to the high stability of the Co-EDTA complex. In this study, the removal of cobalt from NaNO₃ solutions using antimony oxide (Sb₂O₃) synthesized from potassium hexahydroxoantimonate was investigated in the absence and presence of EDTA. The uptake studies on the ion exchange material were conducted both in the dark (absence of UV-light) and under UV-C irradiation. Ca²⁺ or Ni²⁺ were included in the experiments as competing cations to test the selectivity of the ion exchanger. Results show that UV-C irradiation noticeably enhances the cobalt sorption efficiency on the antimony oxide. It was shown that nickel decreased the sorption of cobalt to a higher extent than calcium. Finally, the sorption data collected for Co²⁺ on antimony oxide was modeled using six different isotherm models. The Sips model was found to be the most suitable model to describe the sorption process. The Dubinin-Radushkevich model was further used to calculate the adsorption energy, which was found to be 6.2 kJ mol^-1.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.161-161
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• 2008

The oxide film of silicon wafer has been mainly polished by fumed silica, colloidal silica or ceria slurry. Because colloidal silica slurry is uniform and highly dispersed composed of spherical shape particles, by which the oxide film polished remains to be less scratched in finishing polishing process. Even though the uniformity and spherical shape is advantage for reducing the scratch, it may also be the factor to decrease the removal rate. We have studied the correlation of silica abrasive particles and CMP characteristics by varying pH, down force, and table rotation rate in polishing. It was found that the CMP polishing is dependent on the morphology, aggregation, and the surface property of the silica particles.

• 한국환경과학회지
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• 제16권6호
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• pp.745-750
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• 2007

Large scale of loess has been applied on the south - sea shore of the Korean peninsula to treat red tides, due to many fishery's devastation by red tides every year. However, coastal ecosystem is ruined by the huge amount of loess applied every year. Almost all creatures, living under water such as sea weeds, clams, and fishes, where loess was applied, are disappearing. In this paper, alternative methods of the loess application are investigated. The amount of loess could be reduced by the alternative methods, Especially, loess mixed with calcium oxide has excellent effects to reduce Cochlodinium polykrikoides numbers. It was found that when loess is used with calcium oxide(CaO), removal efficiency of red tides is highly increased. Moreover, the amount of loess could be reduced dramatically.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.567-568
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• 2006

To investigate the recycle possibility of slurry for the oxide-chemical mechanical polishing (oxide-CMP) application, three kinds of retreated methods were introduced as follows: First, the effects on the addition of silica abrasives and the diluted silica slurry (DSS) on CMP performances were investigated. Second, the characteristics of mixed abrasive slurry (MAS) using non-annealed and annealed alumina ($Al_2O_3$) powder as an abrasive added within DSS were evaluated to achieve the improvement of removal rates (RRs) and within-wafer non-uniformity (WIWNU%). Third, the oxide-CMP wastewater was examined in order to evaluate the possible ways of reusing it. And then, we have discussed the CMP characteristics of silica slurry retreated by mixing of original slurry and used slurry (MOS).