• Journal of the Korean Vacuum Society
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• v.5 no.1
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• pp.6-13
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• 1996

The kinetics of native oxide formation on the (Al, Ga)As and (Cd, Mn)Te have been studied by X-ray photoelectron spectroscopy(XPS) and Auger electron spectroscopy(AES). The regrowth of native oxide after 3keV Ar ion sputter etch and deionized water etch has been studied. The previous report exhibited that the native oxide on CdTe and GaAs can be removed completely by deionzied(DI) water only[1]. On the other hand, the airgrown native oxide on (Al, Ga)As become nonhomogeneous and the regrown native oxide on (Cd,Mn)Te can be partially removed.

• Bulletin of the Korean Chemical Society
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• v.20 no.11
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• pp.1340-1344
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• 1999

The electrochemical behavior of oxide layers on aluminium was studied using electrochemical impedance spectroscopy. Impedance spectra were taken at a compact and a porous oxide layer of Al. The anodic films on Al have a variable stoichiometry with gradual reduction of oxygen deficiency towards the oxide-electrolyte interface. Thus, the interpretation of impedance spectra for oxide layers is complicated, with the impedance of surface layers differing from those of ideal capacitors. This layer behavior with conductance gradients was caused by an inhomogeneous dielectric. The frequency response cannot be described by a single RC element. The oxide layers of Al are properly described by the Young model of dielectric constant with a vertical decay of conductivity.

• Bulletin of the Korean Chemical Society
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• v.33 no.5
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• pp.1465-1469
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• 2012

For given electrolytes, different behaviors of anodic aluminum oxide (AAO) and anodic titanium oxide (ATO) during electrochemical thinning are explained by ionic and electronic current modes. Branched structures are unavoidably created in AAO since the switch of ionic to electronic current is slow, whereas the barrier oxide in ATO is thinned without formation of the branched structures. In addition, pore opening can be possible in ATO if chemical etching is performed after the thinning process. The thinning was optimized for complete pore opening in ATO and potential-current behavior is interpreted in terms of ionic current-electronic current switching.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.350-350
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• 2012

본 연구에서는 Oxide 두께가 각각 4, 6 nm인 Symmetric NMOSFET의 전기적 특성 분석에 관한 연구를 진행하였다. 게이트 전압에 따른 Drain saturation current (IDSAT), Threshold Voltage(VT) 및 드레인 전압에 따른 Off-states 특성 변화를 분석하였다. 소자 측정 결과 oxide 두께가 4 nm인 경우 Vt는 0.3 V, IDSAT은 73 ${\mu}A$ (@VD=0.05)로, oxide 두께가 6 nm인 경우 Vt는 0.65 V, IDSAT은 66 ${\mu}A$ (@VD=0.05)로 각각 측정되었다. 이는 oxide 두께가 얇은 경우 게이트 전압 인가 시 Electric field 증가에 따른 것으로 판단된다. 또한 드레인 전압 인가에 따른 소자 특성 분석 결과 oxide 두께가 4nm인 경우 급격한 Gate leakage 증가를 보였으며, 이에 따라 Off-state에서의 leakage current가 증가함을 확인하였다. 본 연구는 Oxide 두께에 따른 MOSFET 소자의 전기적 특성 분석을 위해 진행되었으며, 상기 결과와 같이 oxide 두께 가변은 Idsat, Vt, leakage current 등의 주요 파라미터에 영향을 주어 NMOSFET 소자의 전기적 특성을 변화시킴을 확인하였다.

• Bulletin of the Korean Chemical Society
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• v.35 no.9
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• pp.2749-2752
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• 2014

Recent studies have shown that single-stranded DNA adsorbed onto graphene oxide is protected from DNase I cleavage. However, double-stranded DNA bound to graphene oxide and could be digested by DNase I. To elucidate whether single-stranded DNA is protect from DNase I in the presence of graphene oxide, this study conducted DNase I digestion using single-stranded DNA and single-stranded DNA containing the duplex region in the presence of graphene oxide. Addition of DNase I resulted in restoration of the fluorescence emission that had been quenched when DNA was adsorbed to graphene oxide. It indicates that DNase I cleaved the adsorbed single-stranded DNA onto graphene oxide, which was sufficient for the detection of DNase I activity.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.306.2-306.2
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• 2016

Niobium oxide thin films were synthesized by reactive rf magnetron sputtering. The target was metallic niobium with 2 inch in diameter and the substrate was n-type Si wafer. To control the surface properties of the films, Nb oxide thin films were obtained at various mixing ratios of argon and oxygen gases. Nb oxide thin films were analyzed with alpha step, scanning electron microscopy (SEM), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The result of alpha step showed that the thickness of Nb oxide thin films were decreased with increasing the oxygen gas ratios. SEM images showed that the granular morphology was formed at 0% of oxygen gas ratio and then disappeared at 20 and 75% of oxygen gas ratio. The amorphous Nb oxide was observed by XRD at all films. The oxidation state of Nb and O were studied with high resolution Ni 2p and O 1s XPS spectra. And the change in the chemical environment of Nb oxide thin films was investigated by XPS with Ar+ sputtering.

• Journal of the Korean Ceramic Society
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• v.24 no.3
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• pp.215-222
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• 1987

${\alpha}$-Ferric Hydrous Oxide and ${\alpha}$-Ferric Oxide were obtained as following processes that Ferric Nitrate solution was adjusted to pH 6-8 with Ammonium Hydroxide, refluxed the Iron precipitate for 1 hr. at 80$^{\circ}C$, washed it with water and Methanol (95%), dried it to obtain ${\alpha}$-Ferric Hydrous Oxide at 60$^{\circ}C$, and then heated in atmosphere to prepare ${\alpha}$-Ferric Oxide for 1 hr. at 450$^{\circ}C$. Mica particles cleaned with ultrasonicator (45KHz) in water were mixed with Ferric Nitrate solution and treated it to adsorb ${\alpha}$-Ferric Oxide on the surface of mica particles by using the abovementioned processes, but the heated temperature was at 500$^{\circ}C$. The maximum wavelength of reflected light on the surface of mica-${\alpha}$-Ferric Oxide (50%) was appeared at 546nm but -Ferric Oxide free mica only was at 436 nm. The maximum wavelength was shifted to longer when the weight ratios of ${\alpha}$-Ferric Oxide to mica was changed from 1% to 50%.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.10
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• pp.896-901
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• 2005

The microstructure and electrical properties of praseodymium-based zinc oxide varistors were investigated at various cobalt oxide contents in the range of $0.5{\~}5.0 mol\%$. The ceramic density increased in the range of $5.25{\~}5.55 g/cm^3$ with increasing cobalt oxide content. The varistor doped with cobalt oxide of $1.0 mol\%$ exhibited the highest nonlinearity, with 66.6 in nonlinear exponent and 1.2 $\mu$A in leakage current. The donor concentration, density of interface states, and tamer height were in the range of $(1.06{\~}1.69){\times}10^{18}/cm^3$, $(3.11 {\~}3.56){\times}10^{12}/cm^2$, and 0.80${\~}$1.07 eV, respectively.

• Proceedings of the KIEE Conference
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• 1989.07a
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• pp.377-379
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• 1989

Very thin gate oxide(100-300A) MOS capacitor has been fabricated. The effect of series resistance must be calculated and the exact metal-semiconductor work function difference should be obtained to get the fixed oxide charge density exisiting in oxide. Dilute oxidation make sagy to control oxide thickness and reduce fixed oxide charge density. In case of dilute oxidation, fixed oxide charge density depends on oxidation time. If oxide is very thin, the annealing effect is ignored.

• Proceedings of the IEEK Conference
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• 1999.06a
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• pp.970-973
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• 1999

When the size of the device is decreased, the hot carrier degradation presents a severe problem for long-term device reliability. In this paper we fabricated & tested the 0.26${\mu}{\textrm}{m}$ NMOSFET with wet gate oxide and nitride oxide gate to compare that the characteristics of hot carrier effect, charge to breakdown, transistor Id_Vg curve and charge trapping using the Hp4145 device tester As a result we find that the characteristics of nitride oxide gate device better than wet gate oxide device, especially a hot carrier lifetime(nitride oxide gate device satisfied 30years, but the lifetime of wet gate oxide was only 0.1year), variation of Vg, charge to breakdown and charge trapping etc.