• 제목/요약/키워드: optoelectronic materials

검색결과 281건 처리시간 0.029초

Review of Low-Dimensional Nanomaterials for Blue-Light Emission

  • Won Kook Choi
    • 센서학회지
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    • 제32권6호
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    • pp.391-402
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    • 2023
  • Low-dimensional (zero-dimensional (0-dim), 2-dimensional (2-dim)) nanoparticles, such as chalcogenide compound semiconductors, III-V semiconductors, transition metal dichalcogenides (TMDs), II-VI semiconductors, nanocarbons, hybrid quantum dots (QDs), and perovskite QDs (PQDs), for which blue light emission has been observed, are reviewed. Current synthesis and device fabrication technologies as well as their prospective applications on next-generation quantum-dot-based light-emitting diodes are discussed.

Ohmic contacts to p-type GaN for high brightness LED applications

  • Seong, Tae-Yeon
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.23-23
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    • 2003
  • GaN-related semiconductors are of great technological importance for the fabrication of optoelectronic devices, such as blue and ultra violet light emitting diodes (LEDs), laser diodes, and photo-detectors. One of the most important applications of GaN-based LEDs is solid-state lighting, which could replace incandescent bulbs and ultimately fluorescent lamps. For solid-state lighting applications, the achievement of high extraction efficiency in LED structures is essential. For flip-chip LEDs (FCLEDS), the formation of low resistance and high reflective p-GaN contact is crucial. So far, a wide variety of different methods have been employed to improve the ohmic properties of p-type contacts to GaN. For example, surface treatments using different chemical solutions have been successfully used to produce high-quality ohmic contacts, Metallization schemes, such as Ta/Ti contacts to p-GaN, were also investigated. For these contacts, the removal of hydrogen atoms from the Mg atoms doped n the GaN was argued to be responsible for low contact resistances.

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Epitaxial Growth of Three-Dimensional ZnO and GaN Light Emitting Crystals

  • Yang, Dong Won;Park, Won Il
    • 한국세라믹학회지
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    • 제55권2호
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    • pp.108-115
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    • 2018
  • The increasing demands for three-dimensional (3D) electronic and optoelectronic devices have triggered interest in epitaxial growth of 3D semiconductor materials. However, most of the epitaxially-grown nano- and micro-structures available so far are limited to certain forms of crystal arrays, and the level of control is still very low. In this review, we describe our latest progress in 3D epitaxy of oxide and nitride semiconductor crystals. This paper covers issues ranging from (i) low-temperature solution-phase synthesis of a well-regulated array of ZnO single crystals to (ii) systematic control of the axial and lateral growth rate correlated to the diameter and interspacing of nanocrystals, as well as the concentration of additional ion additives. In addition, the critical aspects in the heteroepitaxial growth of GaN and InGaN multilayers on these ZnO nanocrystal templates are discussed to address its application to a 3D light emitting diode array.

Synthesis and Characterization of New Nickel Sulfide Precursor

  • Lee, Sang Chan;Park, Bo Keun;Chung, Taek-Mo;Hong, Chang Seop;Kim, Chang Gyoun
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.365.2-365.2
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    • 2014
  • Nickel sulfide (NiS) has been utilized in optoelectronic applications, such as transformation-toughening agent for materials used in semiconductor applications, catalysts, and cathodic materials in rechargeable lithium batteries. Recently, high quality nickel sulfide thin films have been explored using ALD/CVD technique. Suitable precursors are needed to deposit thin films of inorganic materials. However, nickel sulfide precursors available for ALD/CVD process are very limited to nickel complexes with dithiocarbamate and alkanethiolate ligands. Therefore, it is essential to prepare novel nickel sulfide suitable for ALD/CVD precesses. Herein we report on the synthesis and characterization of new nickel sulfide complex with designed aminothiolate ligand. Furthermore thin films of NiS have been prepared on silicon oxide substrates by spin coating nickel precursor 10 wt% in THF. The novel complex has been characterized by means of 1H-NMR, elemental analysis, thermogravimetric analysis (TGA), X-ray Diffraction (XRD) and scanning electron microscope (SEM).

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나노입자 기반 발광 소재 연구동향 (Technology Trend of Luminescent Nanomaterials)

  • 정혜원;손재성
    • 한국분말재료학회지
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    • 제25권2호
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    • pp.170-177
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    • 2018
  • Colloidally synthesized luminescent nanocrystals (NCs) have attracted tremendous attention due to their unique nanoscale optical and electronic properties. The emission properties of these NCs can be precisely tuned by controlling their size, shape, and composition as well as by introducing appropriate dopant impurities. Nowadays, these NCs are actively utilized for various applications such as optoelectronic devices including light emitting diodes (LEDs), lasers, and solar cells, and bio-medical applications such as imaging agents and bio-sensors. In this review, we classify luminescent nanomaterials into quantum dots (QDs), upconversion nanoparticles (UCNPs), and perovskite NCs and present their intrinsic emission mechanism. Furthermore, the recently emerging issues of efficiency, toxicity, and durability in these materials are discussed for better understanding of industry demands. As well, the future outlook will be offered for researchers to guide the direction of future research.

Fabrication of High-Resolution Pixels in Organic Light-Emitting Displays Using Laser-Inscribed Sacrificial Layer

  • Choi, Won-Suk;Kim, Min-Hoi;Na, Yu-Jin;Koo, Kyung-Mo;Lee, Sin-Doo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.755-757
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    • 2009
  • We developed a novel patterning method of organic light emitting materials using a laser-inscribed sacrificial layer for fabricating high-resolution pixels in organic light emitting displays (OLEDs). Our patterning process is capable of achieving high spatial resolution of about 10 ${\mu}m$. Moreover, it has no detrimental effect on the electrical properties of organic materials. This patterning approach is expected to be applicable for patterning and integrating a wide range of organic materials for organic electronic and optoelectronic devices.

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Langmuir Blodgett법에 의한 광전자소자 (Langmuir-Blodgett Methods and Photelectronic Devices)

  • 신동명
    • 한국광학회지
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    • 제2권2호
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    • pp.108-113
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    • 1991
  • This paper describes the necessity and utility of Langmuir-Blodgett (L-B) methods in developing molecular electronic devices. It also covers the application area and limitations of the methods. With L-B methods, the membrane thickness can be controlled in a range of 50 nm and 1000 nm depending on nature of the materials and layering methods. The molecular arrangement within the membrane can be altered by altering the surface pressure and nature of the layering materials. Such a variation can be altered by altering the surface pressure and nature of the layering materials. Such a variation can offer a new application of the methods to the future electronic devices. More over 2nd and 3rd nonlinearity generated in the nonsymmetric thin membrane will be used in the development of the optoelectronic devices.

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ZnO ALE를 위한 Si, sapphire기판의 ECR 플라즈마 전처리 (ECR Plasma Pretreatment on Sapphire and Silicon Substrates for ZnO ALE)

  • 임종민;신경철;이종무
    • 한국재료학회지
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    • 제14권5호
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    • pp.363-367
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    • 2004
  • Recently ZnO epitaxial layers have been widely studied as a semiconductor material for optoelectronic devices. Sapphire and silicon are commonly selected as substrate materials for ZnO epitaxial growth. In this communication, we report the effect of the ECR plasma pretreatment of sapphire and silicon substrates on the nucleation in the ZnO ALE (atomic layer epitaxy). It was found that ECR plasma pretreatment reduces the incubation period of the ZnO nucleation. Oxygen ECR plasma enhances ZnO nucleation most effectively since it increases the hydroxyl group density at the substrate surface. The nucleation enhancing effect of the oxygen ECR plasma treatment is stronger on the sapphire substrate than on the silicon substrate since the saturation density of the hydroxyl group is lower at the sapphire surface than that at the silicon surface.

페로브스카이트 태양전지용 홀 전도체 개발과 비납계 페로브스카이트 연구 동향

  • 송명관
    • 세라미스트
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    • 제21권1호
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    • pp.98-111
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    • 2018
  • The lead-based perovskite (CH3NH3PbI3) material has a high molar coefficient, high crystallinity at low temperature, and long range of balanced electron-hole transport length. In addition, PCE of perovskite solar cells (PSCs) has been dramatically improved by over 22% by amending the electronic quality of perovskite and by using state-of-the-art hole transporting materials (HTMs) such as tetrakis(N,N-di-p-methoxyphenylamine)-9,9'-spirobifluorene (spiro-OMeTAD) due to enhanced charge transport toward the electrode via properly aligned energy levels with respect to the perovskite. Replacing the spiro-OMeTAD with new HTMs with the desired properties of appropriate energy levels, high hole mobility in its pristine form, low cost, and easy processable materials is necessary for attaining highly efficient and stable PSCs, which are anticipated to be truly compatible for practical application. Furthermore, Recently Pb-free perovskite materials much attention as an alternative light-harvesting active layer material instead of lead based perovskite in photovoltaic cells. In this work, we demonstrate a Pb-free perovskite material for the light harvesting and emitter as optoelectronic devices.