• 제목/요약/키워드: optoelectronic device

검색결과 127건 처리시간 0.025초

CR과 DR의 kVp 변화에 따른 PSNR 상관관계 (PSNR Correlation between CR and DR according to Changed KvP)

  • 김지선;안병주
    • 한국방사선학회논문지
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    • 제8권7호
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    • pp.417-422
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    • 2014
  • 본 연구에서는 방사선의 투사에너지에 따라 달라지는 산란선의 영향정도를 객관적이고 정량적인 방법인 PSNR로 평가할 수 있는 새로운 방법은 제시하고자 하였다. Target을 CR로 두었을 때와 Target을 DR로 두었을 때의 MSE와 PSNR의 값에는 변화가 없었으며, 관전압에 따란 MSE와 PSNR값에 변화가 나타났다. CR과 DR 모두 관전압 변화에 따라서 MSE와 PSNR의 변화가 있는 것으로 보아 Computon 산란선 영향이 있는 것으로 나타났다. CR과 DR의 경우 80 kVp영역에서 MSE와 PSNR의 변화가 급격하게 일어나는 현상이 발생하는 것은 광전효과에 의한 광전자와 Computon 산란에 의한 Computon 전자, 그리고 Computon 산란선이 동시에 검출기에 영향을 미친 것으로 나타났다. 향후 CR과 DR장치의 영상에서 광전효과의 에너지 대역인 60 kVp를 기준으로 하여 70 kVp, 80 kVp, 90 kVp, 100 kVp의 MSE와 PSNR 의 값을 비교하여 관전압의 변화에 따라 CR과 DR의 장치의 산란선과 화질저하에 대한 연구가 이루어지길 제안한다.

활성화 이온빔 처리된 Sapphire기판 위에 성장시킨 MOCVD-GaN 박막의 격자변형량 측정 (Measurements of Lattice Strain in MOCVD-GaN Thin Film Grown on a Sapphire Substrate Treated by Reactive Ion Beam)

  • 김현정;김긍호
    • Applied Microscopy
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    • 제30권4호
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    • pp.337-345
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    • 2000
  • 사파이어 기판을 이용한 GaN 박막성장에서 완충층의 사용과 기판의 질화처리는 GaN 박막 내의 격자결함을 줄이는 가장 보편적인 방법이다. GaN박막의 초기 핵생성과 성장 거동을 향상시키기 위한 새로운 방법으로 사파이어 표면을 질소 활성화 이온빔으로 처리하는 방법이 시도되었다. 활성화 이온빔 처리의 결과 약 10nm두께의 비정질 $AlO_xN_y$ 층이 형성되었으며 GaN의 성장온도에서 부분적으로 결정화되어 계면 부위에 고립된 비정질 영역으로 존재하였다. 계면에 존재하는 비정질 층은 기판과 박막사이에서 발생하는 열응력을 효과적으로 감소시키는 역할이 가능하며 이를 확인하기 위하여 활성화 이온빔 처리에 의한 GaN박막 내의 격자변형량 차이를 비교하였다. GaN박막에서 얻어진 $[\bar{2}201]$ 정대축고차 Laue도형을 전산모사 도형과 비교하여 격자변형량을 측정하였다. 본 연구의 결과 활성화 이온빔 처리를 하지 않은 기판 위에 성장시킨 GaN박막의 격자변형량은 처리한 경우에 비해 6배 이상 높은 값을 가졌으며 따라서 활성화 이온빔 처리에 의해 GaN박막의 열응력은 크게 감소함을 확인하였다.

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ZnO/SiO2 가지형 나노계층구조의 제작 및 광학적 특성 연구 (Fabrication and Optical Property of ZnO/SiO2 Branch Hierarchical Nanostructures)

  • 고영환;김명섭;유재수
    • 한국진공학회지
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    • 제20권5호
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    • pp.381-386
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    • 2011
  • 실리콘(silicon) 기판위에 전기화학증착법(electrochemical deposition)을 이용하여 성장된 ZnO (zinc oxide) 나노로드 표면에 $SiO_2$ (silicon dioxide)를 전자빔증발법(e-beam evaporation)을 이용하여 증착하였으며, 이는 자연적으로 경사입사(oblique angle) 증착이 이루어져 $SiO_2$ 나노로드가 자발 형성되어, ZnO/$SiO_2$ 가지형 나노계층구조형태가 제작될 수 있음을 확인하였다. 실험을 위해서 $SiO_2$ 증착률을 0.5 nm/s로 고정하고 $SiO_2$ 증착시간을 변화시켰으며, 각각 나노구조의 형태와 광학적 특성을 분석하였다. 실리콘 기판위에 전기화학증착법으로 성장된 ZnO 나노로드는 수직으로 정렬된 1차원의 나노구조의 기하학적 형태를 갖고 있어, 입사되는 빛의 파장이 300 nm에서 535 nm인 영역에서 10% 미만의 반사방지(antireflection) 특성을 보였으며, $SiO_2$ 증착시간이 100 s일 때의 ZnO/$SiO_2$ 가지형 나노계층구조에서는 점차적 변화를 갖는 유효 굴절률 분포로 인해 개선된 반사 방지 특성을 확인하였다. 이러한 반사방지 특성과 branch 계층형태의 나노구조형태는 광전소자 및 태양광 소자 응용에 있어서 유용한 소재로 사용될 수 있다.

Citrate 농도에 따른 수용액 화학조 증착 ZnO 성장 및 ZnO 박막의 Cu(In,Ga)Se2 태양전지 응용 (Effect of the Concentration of Citrate on the Growth of Aqueous Chemical Bath Deposited ZnO and Application of the Film to Cu(In,Ga)Se2 Solar Cells)

  • 조경수;장현준;오재영;김재우;이준수;최예솔;홍기하;정중희
    • 한국재료학회지
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    • 제30권4호
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    • pp.204-210
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    • 2020
  • ZnO thin films are of considerable interest because they can be customized by various coating technologies to have high electrical conductivity and high visible light transmittance. Therefore, ZnO thin films can be applied to various optoelectronic device applications such as transparent conducting thin films, solar cells and displays. In this study, ZnO rod and thin films are fabricated using aqueous chemical bath deposition (CBD), which is a low-cost method at low temperatures, and environmentally friendly. To investigate the structural, electrical and optical properties of ZnO for the presence of citrate ion, which can significantly affect crystal form of ZnO, various amounts of the citrate ion are added to the aqueous CBD ZnO reaction bath. As a result, ZnO crystals show a nanorod form without citrate, but a continuous thin film when citrate is above a certain concentration. In addition, as the citrate concentration increases, the electrical conductivity of the ZnO thin films increases, and is almost unchanged above a certain citrate concentration. Cu(In,Ga)Se2 (CIGS) solar cell substrates are used to evaluate whether aqueous CBD ZnO thin films can be applicable to real devices. The performance of aqueous CBD ZnO thin films shows performance similar to that of a sputter-deposited ZnO:Al thin film as top transparent electrodes of CIGS solar cells.

Hexagonal Boron Nitride Monolayer Growth without Aminoborane Nanoparticles by Chemical Vapor Deposition

  • Han, Jaehyu;Yeo, Jong-Souk
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.409-409
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    • 2014
  • Recently hexagonal boron nitride (h-BN), III-V compound of boron and nitrogen with strong covalent $sp^2$ bond, is a 2 dimensional insulating material with a large direct band gap up to 6 eV. Its outstanding properties such as strong mechanical strength, high thermal conductivity, and chemical stability have been reported to be similar or superior to graphene. Because of these excellent properties, h-BN can potentially be used for variety of applications such as dielectric layer, deep UV optoelectronic device, and protective transparent substrate. Ultra flat and charge impurity-free surface of h-BN is also an ideal substrate to maintain electrical properties of 2 dimensional materials such as graphene. To synthesize a single or a few layered h-BN, chemical vapor deposition method (CVD) has been widely used by using an ammonia borane as a precursor. Ammonia borane decomposes into hydrogen (gas), monomeric aminoborane (solid), and borazine (gas) that is used for growing h-BN layer. However, very active monomeric aminoborane forms polymeric aminoborane nanoparticles that are white non-crystalline BN nanoparticles of 50~100 nm in diameter. The presence of these BN nanoparticles following the synthesis has been hampering the implementation of h-BN to various applications. Therefore, it is quite important to grow a clean and high quality h-BN layer free of BN particles without having to introduce complicated process steps. We have demonstrated a synthesis of a high quality h-BN monolayer free of BN nanoparticles in wafer-scale size of $7{\times}7cm^2$ by using CVD method incorporating a simple filter system. The measured results have shown that the filter can effectively remove BN nanoparticles by restricting them from reaching to Cu substrate. Layer thickness of about 0.48 nm measured by AFM, a Raman shift of $1,371{\sim}1,372cm^{-1}$ measured by micro Raman spectroscopy along with optical band gap of 6.06 eV estimated from UV-Vis Spectrophotometer confirm the formation of monolayer h-BN. Quantitative XPS analysis for the ratio of boron and nitrogen and CS-corrected HRTEM image of atomic resolution hexagonal lattices indicate a high quality stoichiometric h-BN. The method presented here provides a promising technique for the synthesis of high quality monolayer h-BN free of BN nanoparticles.

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Optical transition dynamics in ZnO/ZnMgO multiple quantum well structures with different well widths grown on ZnO substrates

  • Li, Song-Mei;Kwon, Bong-Joon;Kwack, Ho-Sang;Jin, Li-Hua;Cho, Yong-Hoon;Park, Young-Sin;Han, Myung-Soo;Park, Young-Sik
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.121-121
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    • 2010
  • ZnO is a promising material for the application of high efficiency light emitting diodes with short wavelength region for its large bandgap energy of 3.37 eV which is similar to GaN (3.39 eV) at room temperature. The large exciton binding energy of 60 meV in ZnO provide provides higher efficiency of emission for optoelectronic device applications. Several ZnO/ZnMgO multiple quantum well (MQW) structures have been grown on various substrates such as sapphire, GaN, Si, and so on. However, the achievement of high quality ZnO/ZnMgO MQW structures has been somehow limited by the use of lattice-mismatched substrates. Therefore, we propose the optical properties of ZnO/ZnMgO multiple quantum well (MQW) structures with different well widths grown on lattice-matched ZnO substrates by molecular beam epitaxy. Photoluminescence (PL) spectra show MQW emissions at 3.387 and 3.369 eV for the ZnO/ZnMgO MQW samples with well widths of 2 and 5 nm, respectively, due to the quantum confinement effect. Time-resolved PL results show an efficient photo-generated carrier transfer from the barrier to the MQWs, which leads to an increased intensity ratio of the well to barrier emissions for the ZnO/ZnMgO MQW sample with the wider width. From the power-dependent PL spectra, we observed no PL peak shift of MQW emission in both samples, indicating a negligible built-in electric field effect in the ZnO/$Zn_{0.9}Mg_{0.1}O$ MQWs grown on lattice-matched ZnO substrates.

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CBD 공법을 이용하여 Cd2+ 원소 Alloying 시간을 조절한 Cu2Zn1-xCdxSn(SxSe1-x)4 박막 태양전지의 광전지 성능 향상 분석 (Analysis of Photovoltaic Performance Improvement of Cu2Zn1-xCdxSn(SxSe1-x)4 Thin Film Solar Cells by Controlling Cd2+ Element Alloying Time Using CBD Method)

  • 박상우;장수영;장준성;김진혁
    • 한국재료학회지
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    • 제32권11호
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    • pp.481-488
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    • 2022
  • The Cu2ZnSn(SxSe1-x)4 (CZTSSe) absorbers are promising thin film solar cells (TFSCs) materials, to replace existing Cu(In,Ga)Se2 (CIGS) and CdTe photovoltaic technology. However, the best reported efficiency for a CZTSSe device, of 13.6 %, is still too low for commercial use. Recently, partially replacing the Zn2+ element with a Cd2+element has attracting attention as one of the promising strategies for improving the photovoltaic characteristics of the CZTSSe TFSCs. Cd2+ elements are known to improve the grain size of the CZTSSe absorber thin films and improve optoelectronic properties by suppressing potential defects, causing short-circuit current (Jsc) loss. In this study, the structural, compositional, and morphological characteristics of CZTSSe and CZCTSSe thin films were investigated using X-ray diffraction (XRD), X-ray fluorescence spectrometer (XRF), and Field-emission scanning electron microscopy (FE-SEM), respectively. The FE-SEM images revealed that the grain size improved with increasing Cd2+ alloying in the CZTSSe thin films. Moreover, there was a slight decrease in small grain distribution as well as voids near the CZTSSe/Mo interface after Cd2+ alloying. The solar cells prepared using the most promising CZTSSe absorber thin films with Cd2+ alloying (8 min. 30 sec.) exhibited a power conversion efficiency (PCE) of 9.33 %, Jsc of 34.0 mA/cm2, and fill factor (FF) of 62.7 %, respectively.