• Proceedings of the KIEE Conference
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• 1998.07g
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• pp.2476-2479
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• 1998

The masticatory muscle relaxation appliance is developed to improve the malhabit of tooth clenching of the wearer. The repeated clenching of the tooth causes excessive attrition of tooth set. The intraoral appliance measures the tooth clenching pressure data and transmits the data to masticatory muscle relaxation appliance. The appliance compares the pressure data with the reference value and generates the warning signal. The relaxation appliance also stores the clenching pressure data for clenching habit analysis. The appliance is designed with a microprocessor, real time clock, nonvolatile read write memory and dual serial communication ports.

• Proceedings of the Korean Vacuum Society Conference
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• 2007.08a
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• pp.307-307
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• 2007

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.11a
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• pp.429-432
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• 1999

The growth of $\textrm{YMnO}_3$ films directly on Si(100) substrates by RF magnetron sputtering system has been performed. The structural properties of $\textrm{YMnO}_3$ films on Si(100) by rapid thermal annealing(RTA) analysed by XRD(X-ray diffraction). The c-axis oriented $\textrm{YMnO}_3$ peaks were observed deposited in $\textrm{YMnO}_3$/Si(100) structure at RF power of 100W and at a temperature range of $840^{\circ}C$~$870^{\circ}C$ in oxygen ambient.

• Electrical & Electronic Materials
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• v.6 no.3
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• pp.220-227
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• 1993

본 논문에서는 산화막의 두께가 23.angs.이며 질화막의 두께를 각각 530.angs., 1000.angs.으로한 캐패시터형 MNOS소자를 제작하고 기억특성을 비교, 분석하였다. 특성조사를 위해 자동 .DELTA. $V_{FB}$ 추적장치를 설계, 제작하여 사용하였다. 기억트랩밀도는 질화막 두께 530.angs.인 소자가 1000.angs.인 소자보다 0.18 x $10^{16}$ $m^{-2}$ 크며, 0.31 x $10^{8}$ V/m 낮은 산화막 전기장에서 전자가 주입되었으며 $10^{4}$sec경과후 포획전자의 유지율도 우수하였다. 또한 포획된 전자는 실리콘쪽으로의 역터넬링으로 인한 감쇠가 우세하게 나타났다. 펄스전압 인가에 따른 플랫밴드전압의 변화가 선형적으로 증가하는 영역에서는 산화막 전류가 지배적이었으며 포화하다 감소하는 영역에서는 질화막 전류의 영향이 컸다. 소거동작은 포획된 전자의 방출과 실리콘으로 부터의 정공주입이 동시에 일어남을 관측하였다.

• Transactions on Electrical and Electronic Materials
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• v.4 no.5
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• pp.24-27
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• 2003

We have been investigated phase-change with temperature and electric field in chalcogenide Ge$_2$Sb$_2$Te$\sub$5/ thin film. T$\sub$c/(crystallization temperature) is confirmed by measuring the resistance with the varying temperature on the hotplate. We have measured I-V characteristics with Ge$_2$Sb$_2$Te$\sub$5/ chalcogenide thin film. It is compared with I-V characteristics after impress the variable pulse. The pulse has variable height and duration.

• Proceedings of the Korean Information Science Society Conference
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• 2007.06b
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• pp.310-314
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• 2007

Log-Structured File system은 쓰기에 최적화한 파일 시스템으로 변경된 데이터를 최대한 모아서 순차적으로 기록하는 방식을 가지고 있다. 그러나 실제 시스템에서는 주기적인 동기화로 인해 작은 크기의 데이터들이 디스크로 쓰여지게 되면서 원래의 디자인 목표를 살리지 못하게 된다. 본 연구에서는 최근 급속도로 발전하고 있는 비휘발성 메모리(NVRAM)를 이용해서 주기적인 동기화를 없애고 작은 단위의 쓰기는 NVRAM을 통해 흡수하도록 하였다. 이를 통하여 DRAM만 있는 LFS에 비해 33% 가량 TPC-C 수행 성능이 향상되고, 더 빠르고 고른 응답 시간을 보일 수 있었다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.199-200
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• 2007

본 논문에서는 $SiO_2$ Gate 유전체를 대체할 재료의 하나인 $TiO_2$, Gate 유전체의 기판 증착 온도에 따른 특성을 알아보고자 한다. 디바이스의 고집적화가 높아짐에 따라 얇은 두께의 Gate 유전체의 절대적인 필요에 따라 두께를 최소화하면서 유전율은 높아 전기적 특성이 우수한 소재를 찾게 되었다. 본 논문의 실험에서는 비휘발성 메모리 소자 제작시 Gate Blocking Layer 적용을 위해 High-k 물질인 $TiO_2$, 박막 증착 실험을 하였고, APCVD 방법을 사용하여 성장하였다. 증착 온도에 따른 I-V 특성을 분석하고 그에 따른 소자의 물리적 구조를 SEM을 통해 확인하면서 소자 제작시 최적의 온도를 찾고자 하였다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.340-343
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• 2004

The phase transition between amorphous and crystalline states in chalcogenide semiconductor films can controlled by electric pulses or pulsed laser hem: hence some chalcogenide semiconductor films can be applied to electrically write/erase nonvolatile memory devices, where the low conductive amorphous state and the high conductive crystalline state are assigned to binary states. This letters researched into the characteristic of phase change transition in differential Chalcogenide thin films materials. The electrode used Al and experimented on 100nm, 300nm, 500nm respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.377-380
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• 2004

The phase transition between amorphous and crystalline states in chalcogenide semiconductor films can controlled by electric pulses or pulsed laser beam; hence some chalcogenide semiconductor films can be applied to electrically write/erase nonvolatile memory devices, where the low conductive amorphous state and the high conductive crystalline state are assigned to binary states. GeSbTe(GST), AsSbTe(AST), SeSbTe(SST) used to phase change materials by appling electrical pulses. Thickness of ternary chalcogenide thin films have about 100nm. Upper and lower electrode were made of Al. It is compared with I-V characteristics after impress the variable pulses.

• Journal of KIISE:Computing Practices and Letters
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• v.16 no.3
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• pp.336-340
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• 2010

Flash storages are prevalent as portable storage in computing systems. When we consider the detachability of Flash storage devices, data integrity becomes an important issue. To assure extreme data integrity, file systems synchronously write all file data to storage accompanying hot write references. In this study, we concentrate on the effect of hot write references on Flash storage, and we consider the effect of absorbing the hot write references via nonvolatile write cache on the performance of the FTL schemes in Flash storage. In 80 doing, we quantify the performance of typical FTL schemes for workloads that contain hot write references through a wide range of experiments on a real system environment. Through the results, we conclude that the impact of the underlying FTL schemes on the performance of Flash storage is dramatically reduced by absorbing the hot write references via nonvolatile write cache.