• Title/Summary/Keyword: n-ZnO

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A Study on Morphology Control of (Ga1-xZnx)(N1-xOx) Nanofibers according to the Composition and Crystallinity of Oxide Nanofibers Synthesized by Electrospinning (전기방사로 합성된 산화물 나노섬유의 조성 및 결정화도에 따른 (Ga1-xZnx)(N1-xOx) 나노섬유의 형상 제어 연구)

  • Kim, Jeong Hyun;Oh, Sung-Tag;Lee, Young-In
    • Journal of Powder Materials
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    • v.28 no.3
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    • pp.259-266
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    • 2021
  • The (Ga1-xZnx)(N1-xOx) solid solution is attracting extensive attention for photocatalytic water splitting and wastewater treatment owing to its narrow and controllable band gap. To optimize the photocatalytic performance of the solid solution, the key points are to decrease its band gap and recombination rate. In this study, (Ga1-xZnx)(N1-xOx) nanofibers with various Zn fractions are prepared by electrospinning followed by calcination and nitridation. The effect of the composition and crystallinity of electrospun oxide nanofibers on the morphology and optical properties of the obtained solid-solution nanofibers are systematically investigated. The results show that the final shape of the (Ga1-xZnx) (N1-xOx) material is greatly affected by the crystallinity of the oxide nanofibers before nitridation. The photocatalytic properties of (Ga1-xZnx)(N1-xOx) with different Ga:Zn atomic ratios are investigated by studying the degradation of rhodamine B under visible light irradiation.

Optical and Electrical Properties of Sputtered ZnO:Al Thin Films with Various Annealing Temperature (후열처리에 따른 스퍼터된 ZnO:Al 박막의 전기적, 광학적 특성)

  • Kim, D.K.;Kim, H.B.
    • Journal of the Korean Vacuum Society
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    • v.22 no.1
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    • pp.20-25
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    • 2013
  • ZnO:Al thin films deposited by RF magnetron sputtering were post-annealed and the electrical and optical properties of ZnO:Al thin films were investigated before and after anneling. We confirmed that the ZnO:Al thin film was affected by post-annealing temperature. As post-annealing temperature increases, crystallinity and transmittance in visible area (400~800 nm) of ZnO:Al thin films decreased. While sheet resistance of thin films increased sharply with increasing to $400^{\circ}C$. This result is due to reduce of carrier concentration caused by absorption of $O_2$ or $N_2$ at surface of thin film.

Formation Reaction of Mn-Zn Ferrite by Wet Process (습식합성에 의한 Mn-Zn Ferrite의 생성반응에 관한 연구)

  • 이경희;이병하;허원도;황우연
    • Journal of the Korean Ceramic Society
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    • v.30 no.1
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    • pp.25-33
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    • 1993
  • Formation reaction of Mn-Zn ferrite depending on various synthetic conditions of wet process was investigated using FeCl2.nH2O(n≒4), MnCl2.4H2O, ZnCl2 as starting materials. A stable intermediate precipitate was formed by the addition of H2O2. And the precipitate was hard to transform to spinel phase of Mn-Zn Fe2O4. Single phase of Mn-Zn Fe2O4 spinel was obtained above 8$0^{\circ}C$ reaction temperature. The powder had spherical particle shape and 0.02~0.05${\mu}{\textrm}{m}$ particle size. Fe(OH)2 solid solution, -FeO(OH) solid solution, -FeOOH, Mn-Zn Fe2O4 spinel were formed with air flow rate 180$\ell$/hr. However, single phase of Mn-Zn Fe2O4 spinel with cubic particle shape and 0.1~0.2${\mu}{\textrm}{m}$ particle size was formed with synthetic conditions of 8$0^{\circ}C$ and 90 munutes. The particle shape of the -FeOOH was needle-like.

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High performance of ZnO thin film transistors using $SiN_x$ and organic PVP gate dielectrics

  • Kim, Young-Woong;Park, In-Sung;Kim, Young-Bae;Choi, Duck-Kyun
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.17 no.5
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    • pp.187-191
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    • 2007
  • The device performance of ZnO-thin film transistors(ZnO-TFTs) with gate dielectrics of $SiO_2,\;SiN_x$ and Polyvinylphenol(PVP) having a bottom gate configuration were investigated. ZnO-TFTs can induce high device performance with low intrinsic carrier concentration of ZnO only by controlling gas flow rates without additional doping or annealing processes. The field effect mobility and on/off ratio of ZnO-TFTs with $SiN_x$ were $20.2cm^2V^{-1}s^{-1}\;and\;5{\times}10^6$ respectively which is higher than those previously reported. The device adoptable values of the mobility of $1.37cm^2V^{-1}s^{-1}$ and the on/off ratio of $6{\times}10^3$ were evaluated from the device with organic PVP dielectric.

Electrical Properties of P-ZnO:(Al,N) Co-doped ZnO Films Fabricated by RF Magnetron Sputtering

  • Jin, Hu-Jie;Kim, Deok-Kyu;So, Byung-Moon;Park, Choon-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.442-443
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    • 2007
  • Al-N co-doped ZnO films were fabricated on n-Si (100) and homo-buffer layers in the mixture of oxygen and nitrogen at $450^{\circ}C$ by magnetron sputtering. Target was ZnO ceramic mixed with $2wt%Al_2O_3$. XRD spectra show that as-grown and $600^{\circ}C$ annealed films are prolonged along crystal c-axis. However they are not prolonged in (001) plane vertical to c-axix. The films annealed at $800^{\circ}C$ are not prolonged in any directions. Codoping makes ZnO films unidirectional variation. XPS show that Al content hardly varies and N escapes with increasing annealing temperature from $600^{\circ}C\;to\;800^{\circ}C$. The electric properties of as-grown films were tested by Hall Effect with Van der Pauw configuration show some of them to be p-type conduction.

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Realization of p-type ZnO Thin Films Using Codoping N and Al by RF Magnetron Sputtering

  • Jin, Hu-Jie;So, Byung-Moon;Park, Bok-Kee;Park, Choon-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.107-108
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    • 2006
  • ZnO is a promising material for UV or blue LEDs p-Type ZnO thin films which are imperative for the p-n junction of LEDs are difficult to achieve because of strong compensation of intrinsic defects such as zinc interstitial and oxygen vacancy. The method of codoping group three elements and group five elements is effective for the realization of p-type ZnO films. In this study, We codoped N and Al m ZnO thin films by RF magnetron sputtering and annealed the films in sputtering chamber. Some films showed p-type conductivity m Seeback effect measurement.

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Facile in situ Formation of CuO/ZnO p-n Heterojunction for Improved H2S-sensing Applications

  • Shanmugasundaram, Arunkumar;Kim, Dong-Su;Hou, Tian Feng;Lee, Dong Weon
    • Journal of Sensor Science and Technology
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    • v.29 no.3
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    • pp.156-161
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    • 2020
  • In this study, hierarchical mesoporous CuO spheres, ZnO flowers, and heterojunction CuO/ZnO nanostructures were fabricated via a facile hydrothermal method. The as-prepared materials were characterized in detail using various analytical methods such as powder X-ray diffraction, micro Raman spectroscopy, X-ray photoelectron spectroscopy, field-emission scanning electron microscopy, and transmission electron microscopy. The obtained results are consistent with each other. The H2S-sensing characteristics of the sensors fabricated based on the CuO spheres, ZnO flowers, and CuO/ZnO heterojunction were investigated at different temperatures and gas concentrations. The sensor based on ZnO flowers showed a maximum response of ~141 at 225 ℃. The sensor based on CuO spheres exhibited a maximum response of 218 at 175 ℃, whereas the sensor based on the CuO/ZnO nano-heterostructure composite showed a maximum response of 344 at 150 ℃. The detection limit (DL) of the sensor based on the CuO/ZnO heterojunction was ~120 ppb at 150 ℃. The CuO/ZnO sensor showed the maximum response to H2S compared with other interfering gases such as ethanol, methanol, and CO, indicating its high selectivity.

Preparation and Characterization of Mixed Matrix Membrane Consisting of Polyethersulfone and ZnO Nanoparticles (Polyethersulfone과 ZnO 나노입자로 조성된 혼합기질막의 제조와 특성 평가)

  • Lee, Seung-Hun;Lee, Min-Su;Youm, Kyung-Ho
    • Membrane Journal
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    • v.26 no.6
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    • pp.463-469
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    • 2016
  • In this research, a new expectation in enhancing the PES (polyethersulfone) polymer phase inversion membrane performances with nanoparticles is proposed by using ZnO. This paper investigated the synthesis of PES phase inversion membranes including ZnO nanoparticles and evaluates the performance of these mixed matrix membranes. The PES-ZnO mixed matrix membranes were fabricated by phase inversion method using the PES-ZnO-NMP(N-methyl-1-pyrrolidone) casting solutions with low ZnO nanoparticles content of 0.375 wt%. The influence of ZnO nanoparticles on the characteristics of PES-ZnO mixed matrix membranes was investigated with scanning electron microscope observations of membrane cross-sections, contact angle measurements, tensile strength measurements, pure water flux measurements and ultrafiltration experiments of BSA solution. Those results showed that the performance advancements in comparison with the pure PES membrane without ZnO in terms of increasing hydrophilicity as well as reducing membrane fouling by adding ZnO nanoparticles even in low concentration.

A Study on the Characteristic of n-ZnO:In/p-Si (111) Heterostructure by Pulsed Laser Deposition (PLD 법으로 증착된 n-ZnO:In/p-Si (111) 이종접합구조의 특성연구)

  • Jang, Bo-Ra;Lee, Ju-Young;Lee, Jong-Hoon;Kim, Jun-Je;Kim, Hong-Seung;Lee, Dong-Wook;Lee, Won-Jae;Cho, Hyeong-Kyun;Lee, Ho-Seong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.5
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    • pp.419-424
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    • 2009
  • ZnO films doped with different contents of indium ($0.1{\sim}10$ at.%) were deposited on Si (111) substrate by Pulsed Laser Deposition (PLD). The structural, electrical and optical properties of the films were investigated using XRD, AFM, Hall and PL measurement. Results showed that un-doped ZnO film had (002) plane as the c-axis orientated growth, whereas indium doped ZnO films exhibited the peak of (002) and the weak (101) plane. In addition, in the indium doped ZnO films, the electron concentration is ten times higher than that of un-doped ZnO film, while the resistivity is ten times lower than that of un-doped ZnO film. The indium doped ZnO films have UV emission about 380 nm and show a red shift with increasing contents of indium. The I-V curve of the fabricated diode show the typical diode characteristics and have the turn on voltage of about 2 V.

Control of electrical types in the P-doped ZnO thin film by Ar/$O_2$ gas flow ratio

  • Kim, Young-Yi;Han, Won-Suk;Kong, Bo-Hyun;Cho, Hyung-Koun;Kim, Jun-Ho;Lee, Ho-Seoung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.11-11
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    • 2008
  • ZnO has a very large exciton binding energy (60 meV) as well as thermal and chemical stability, which are expected to allow efficient excitonic emission, even at room temperature. ZnO based electronic devices have attracted increasing interest as the backplanes for applications in the next-generation displays, such as active-matrix liquid crystal displays (AMLCDs) and active-matrix organic light emitting diodes (AMOLEDs), and in solid state lighting systems as a substitution for GaN based light emitting diodes (LEDs). Most of these electronic devices employ the electrical behavior of n-type semiconducting active oxides due to the difficulty in obtaining a p-type film with long-term stability and high performance. p-type ZnO films can be produced by substituting group V elements (N, P, and As) for the O sites or group I elements (Li, Na, and K) for Zn sites. However, the achievement of p-type ZnO is a difficult task due to self-compensation induced from intrinsic donor defects, such as O vacancies (Vo) and Zn interstitials ($Zn_i$), or an unintentional extrinsic donor such as H. Phosphorus (P) doped ZnO thin films were grown on c-sapphire substrates by radio frequency magnetron sputtering with various Ar/ $O_2$ gas ratios. Control of the electrical types in the P-doped ZnO films was achieved by varying the gas ratio with out post-annealing. The P-doped ZnO films grown at a Ar/ $O_2$ ratio of 3/1 showed p-type conductivity with a hole concentration and hole mobility of $10^{-17}cm^{-3}$ and $2.5cm^2/V{\cdot}s$, respectively. X-ray diffraction showed that the ZnO (0002) peak shifted to lower angle due to the positioning of $p^{3-}$ ions with a smaller ionic radius in the $O^{2-}$ sites. This indicates that a p-type mechanism was due to the substitutional Po. The low-temperature photoluminescence of the p-type ZnO films showed p-type related neutral acceptor-bound exciton emission. The p-ZnO/n-Si heterojunction LEO showed typical rectification behavior, which confirmed the p-type characteristics of the ZnO films in the as-deposited status, despite the deep-level related electroluminescence emission.

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