• Journal of the Optical Society of Korea
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• 제16권1호
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• pp.42-46
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• 2012

We have developed a fluorescence optical detection system using a digital micromirror device (DMD) for monitoring 3D cell culture matrices in situ. Full 3D imaging with fast scanning speed was implemented by the combined action of a DMD and a motorized stage. Imaging results with fluorescent microbeads measure the minimum axial resolution of the system as $6.3{\mu}m$, while full 1-mm scanning through 3D alginate-based matrix was demonstrated. For cell imaging, improved images were obtained by removing background fluorescence although the scanning distance was reduced because of low intracellular fluorescence efficiency. The system is expected to be useful to study various dynamics and behaviors of 3-dimensionally cultured cells in microfluidic systems.

• Proceedings of the KIEE Conference
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• 대한전기학회 2002년도 하계학술대회 논문집 C
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• pp.1985-1987
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• 2002

Silicon bulk micromachined micromirrors are designed and fabricated for out-of-plane right angle reflection. The micromirror is comprised of a minor plate, springs, magnetic bars and electrodes. Single crystalline silicon is used for a flatness improvement of a mirror plate. Out-of-plane right angle reflection requires a 45 degree operation of the micromirror. The micromirrors are operated by applying a magnetic field, which is generated by a coil located below a substrate. For an individual mirror operation, each mirror is clamped using an electrostatic force against the electromagnetic force. Angular deflections are measured and compared with theoretical data. The micro mirror operates up to 45 degree when magnetic field is 4 kA/m which is generated by a 115 mA coil current Simple addressing is tested, and it is shown that a clamping voltage is less than 5V.

• Journal of the Korean Society for Precision Engineering
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• 제23권7호
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• pp.146-151
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• 2006

In order to increase the productivity of conventional microstereolithography, a new method using a digital micromirror device ($DMD^{TM}$) as the dynamic patter generator is proposed. The deviation from the level of clear optical images to the level of photopolymer surface is a key for the fabrication of an accurate 3D structure, so this deviation is minimized by controlling the viscosity of FA 1260T with organic solvents. After finding the appropriate process variables, the feasibility of microstructure fabrication such as a microgear and a microsphere is demonstrated. Microstereolithography with $DMD^{TM}$ showed the potential to replace the existing focused beam microstereolithography.

• Laser Solutions
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• 제9권1호
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• pp.1-7
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• 2006

In order to increase the productivity of conventional microstereolithography (MSL), digital micromirror device($DMD^{TM}$) based MSL is proposed and the feasibility of 3D rnicrocomponents fabrication is demonstrated in two ways; free surface and constrained surface techniques. The clearness of optical images at the exposure plane was confirmed for the fabrication of an accurate 3D structure by controlling the dynamic viscosity of FA1260T and the shape accuracy of a structure fabricated with epoxy-based resin ($Somos^{\circledR}$ 10120) was analyzed to determine the optimum curing conditions. After finding the appropriate process variables, the feasibility of multiple microstructures is then demonstrated. Due to the high productivity, MSL using $DMD^{TM}$ showed the potential to replace the existing focused laser beam MSL.

• The Transactions of the Korean Institute of Electrical Engineers C
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• 제49권8호
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• pp.487-494
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• 2000

This paper describes the design, fabrication and experiments of surface-micromachined aluminum micromirror array with hidden pin-joints. Instead of the conventional elastic spring components as connection between mirror plate and supporting structure, we used pin-joint composed of pin and staples to support the mirror plate. The placement of pin-joint under the mirror plate makes large active surface area possible. These flexureless micromirrors are driven by electrostatic force. As the mirror plate has discrete deflection angles, the device can be ap;lied to adaptive optics and digitally-operating optical applications. Four-level metal structural layers and semi-cured photoresist sacrificial layers were used in the fabrication process and sacrificial layers were removed by oxygen plasma ashing. Static characteristics of fabricated samples were measured and compared with modeling results.

• Journal of the Optical Society of Korea
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• 제16권2호
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• pp.127-132
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• 2012

This study discusses photoresist forming using a composite grayscale to fabricate a Fresnel lens. Grayscale lithography is a common production method used to facilitate the forming of lenses with different curvatures and depths. However, this approach is time consuming and expensive. This study proposes a method for overcoming these obstacles by integrating a digital micromirror device and microscope to supplant the traditional physical grayscale mask. This approach provides a simple and practical maskless optical lithography system. According to the results, the two adjacent grayscales displayed substantial differences between the high grayscale and influence the low grayscale that ultimately affected photoresist formation. Furthermore, we show that change of up to 150% in the slope can be achieved by changing the grayscale gradient in the central zone and the ring profile. The results of the optical experiment show a focus change with different gray gradients.

• Proceedings of the KIEE Conference
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• 대한전기학회 1998년도 하계학술대회 논문집 G
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• pp.2527-2529
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• 1998

Measurement equipment, which consists of He-Ne laser, objective lens, CCD camera and position sensitive detector, was developed for the dynamic response of micromirror. This equipment can measure the tilting direction and angle, the rise time and frequency response of micromirror to the input signal. It was found that the rise time of the micromirror was less than 10${\mu}m$ and the resonant frequency was about 25kHz.

• Journal of the Optical Society of Korea
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• 제16권3호
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• pp.221-227
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• 2012

We propose optical proximity corrections (OPCs) for digital micromirror device (DMD)-based maskless lithography. A pattern writing scheme is analyzed and a theoretical model for obtaining the dose distribution profile and resulting structure is derived. By using simulation based on this model we were able to reduce the edge placement error (EPE) between the design width and the critical dimension (CD) of a fabricated photoresist, which enables improvement of the CD. Moreover, by experiments carried out with the parameter derived from the writing scheme, we minimized the corner-rounding effect by controlling light transmission to the corners of a feature by modulating a DMD.

• The Transactions of the Korean Institute of Electrical Engineers C
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• 제55권3호
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• pp.149-155
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• 2006

This paper presents a torsional micromirror detached from PZT actuators (TMD), whose rotational motion is achieved by push bars in the PZT actuators detached from the micromirror. The push bar mechanism is intended to reduce the bending, tensile and torsional constraints generated by the conventional bending bar mechanism, where the torsional micromirror is attached to the PZT actuators (TMA). We have designed, fabricated and tested prototypes of TMDs for single-axis and dual-axis rotation, respectively. The single-axis TMD generates the static rotational angle of $6.1^{\circ}$ at 16 VDC, which is 6 times larger than that of single-axis TMA, $0.9^{\circ}$. However, the rotational response curve of TMD shows hysteresis due to the static friction between the cover and the push bar in the PZT actuator. We have shown that 63.2% of the hysteresis is due to the static friction caused by the initial contact force of the PZT actuaor. Without the initial contact force, the rotational response curve of TMD shows linear voltage-angle characteristics. The dual-axis TMD generates the static rotational angles of $5.5^{\circ}$ and $4.7^{\circ}$ in x-axis and y-axis, respectively at 16 VDC. The measured resonant frequencies of dual-axis TMD are $2.1\pm0.1$ kHz in x-axis and $1.7\pm0.1$ kHz in y-axis. The dual-axis TMD shows stable operation without severe wear for 21.6 million cycles driven by 16 Vp-p sinusoidal wave signal at room temperature.

• The Transactions of the Korean Institute of Electrical Engineers C
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• 제50권12호
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• pp.639-647
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• 2001

We present an integrated optical microswitch, composed of silicon waveguides, gold-coaled silicon micromirrors, and electrostatic contact actuators, for applications to the optical signal transceivers. For a low switching voltage, we modify the conventional curled electrode microactuator into a electrostatic microactuator with touch-down beams. We fabricate the silicon waveguides and the electrostatically actuated micromirrors using the ICP etching process of SOI wafers. We observe the single mode wave propagation through the silicon waveguide with the measured micromirror loss of $4.18\pm0.25dB$. We analyze major source of the micromirror loss, thereby presenting guidelines for low-loss micromirror designs. From the fabricated microswitch, we measure the switching voltage of 31.74V at the resonant frequency of 6.89kHz. Compared to the conventional microactuator, the present contact microactuator achieves 77.4% reduction of the switching voltage. We also discuss a feasible method to reduce the switching voltage to 10V level by using the electrode insulation layers having the residual stress less than 30MPa.