1 |
A. K. Wong, Resolution Enhancement Techniques in Optical Lithography (SPIE Publications, Washington, USA, 2001).
|
2 |
J. F. Chen, T. Laidig, K. E. Wampler, and R. Caldwell, "Optical proximity correction for intermediate-pitch features using sub-resolution scattering bars," J. Vac. Sci. Technol. B 15, 2426-2433 (1997).
|
3 |
J. Liang, R. N. Kohn Jr., M. F. Becker, and D. J. Heinzen, "High-precision laser beam shaping using a binary-amplitude spatial light modulator," Appl. Opt. 49, 1323-1330 (2010).
DOI
|
4 |
A. Khoh, G. S. Samudra, Y. Wu, T. Milster, and B.-I. Choi, "Image formation by use of the geometrical theory of diffraction," J. Opt. Soc. Am. A 21, 959-967 (2004).
DOI
ScienceOn
|
5 |
D.-H. LEE, "Optical system with 4 resolution for maskless lithography using digital micromirror device," J. Opt. Soc. Korea 14, 266-276 (2010).
DOI
ScienceOn
|
6 |
Y.-H. Huang and J.-Y. Jeng, "Forming a fresnel zone lens: effects of photoresist on digital-micromirror-device maskless lithography with grayscale exposure," J. Opt. Soc. Korea 16, 127-132 (2012).
DOI
ScienceOn
|
7 |
Y. C. Pati and T. Kailath, "Phase-shifting masks for microlithography: automated design and mask requirements," J. Opt. Soc. Am. A 11, 2438-2452 (1994).
DOI
ScienceOn
|
8 |
X. Guo, J. Dub, X. Luo, Q. Deng, and C. Duc, "RET simulations for SLM-based maskless lithography," Microelec. Eng. 85, 929-933 (2008).
DOI
ScienceOn
|
9 |
M. V. Kessels and K. Heggarty, "Optical proximity correction for a versatile LCD based direct write maskless photoplotter," Microelec. Eng. 86, 2385-2391 (2009).
DOI
ScienceOn
|
10 |
C. Sun, N. Fang, D. M. Wu, and X. Zhang, "Projection microstereolithography using digital micro-mirror dynamic mask," Sens. Actuators A: Physical 121, 113-120 (2005).
DOI
ScienceOn
|
11 |
W. D. Meisburger, "Apparatus for SLM-based optical lithography with gray level capability," U.S. Patent 7639416 B2 (2009).
|
12 |
G. R. V. Kumar and K. Sayanagi, "Measurement of optical transfer function by its moments," J. Opt. Soc. Am. 58, 1369-1376 (1968).
DOI
|
13 |
J. R. Sheats and B. W. Smith, Microlithography: Science and Technology (Marcel Dekker, New York, USA, 1998).
|
14 |
J.-S. Park, C.-H. Park, S.-U. Rhie, Y.-H. Kim, M.-H. Yoo, J.-T. Kong, H.-W. Kim, and S.-I. Yoo, "An efficient rule-based OPC approach using a DRC tool for 0.18 ," ASIC Proc. IEEE 2000, 81-85 (2000).
|
15 |
H. Zhang, J. Morrow, and F. M. Schellenberg, "Optical proximity correction: a detail comparison of techniques and their effectiveness," Microelec. Eng. 41-42, 79-82 (1998).
DOI
ScienceOn
|
16 |
Y. Li, S. M. Yu, and Y. L. Li, "Intelligent optical proximity correction using genetic algorithm with model- and rule-based approaches," Comput. Mater. Sci. 45, 65-76 (2009).
DOI
ScienceOn
|
17 |
O. W. Otto, J. G. Garofalo, K. K. Low, C. M. Yuan, R. C. Henderson, C. Pierrat, K. L. Kostelak, S. Vaidya, and P. K. Vasudev, "Automated optical proximity correction: a rules-based approach," Proc. SPIE 2197, 278-293 (1994).
|
18 |
M. D. Levenson, N. S. Viswanathan, and R. A. Simpson, "Improving resolution in photolithography with a phase-shifting mask," IEEE Trans. Electr. Dev. 29, 1828-1836 (1982).
DOI
ScienceOn
|
19 |
Y. Liu, A. Zakhor, and M. Zuniga, "Computer aided design of phase shift mask designs with reduced complexity," IEEE Trans. Semiconductor Manufacturing 9, 170-181 (1996).
DOI
ScienceOn
|
20 |
Z. Cui, J. Dua, Q. Huanga, J. Sua, and Y. Guoa, "Optical proximity correction by grey tone photolithography," Microelec. Eng. 53, 153-156 (2000).
DOI
ScienceOn
|
21 |
H. Shirota and A. Kuwabara, "Pattern writing apparatus and pattern writing method," U.S. Patent 6903798 (2005).
|
22 |
U. B. Ljungblad, P. Askebjer, T. Karlin, T. Sandstrom, and H. Sjoeberg, "A high-end mask writer using a spatial light modulator," Proc. SPIE 5721, 43-52 (2005).
|
23 |
T. Okuyama and H. Washiyama, "Multi-exposure drawing method and apparatus therefor," U.S. Patent 7136087 (2006).
|
24 |
M. Seo and H. Kim, "Lithography upon micromirrors," Computer-Aided Design 39, 202-217 (2007).
DOI
ScienceOn
|