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http://dx.doi.org/10.3807/JOSK.2012.16.3.221

Optical Proximity Corrections for Digital Micromirror Device-based Maskless Lithography  

Hur, Jungyu (Department of Mechanical System Engineering, Graduate School, Tongmyoung University)
Seo, Manseung (Department of Robot System Engineering, Tongmyong University)
Publication Information
Journal of the Optical Society of Korea / v.16, no.3, 2012 , pp. 221-227 More about this Journal
Abstract
We propose optical proximity corrections (OPCs) for digital micromirror device (DMD)-based maskless lithography. A pattern writing scheme is analyzed and a theoretical model for obtaining the dose distribution profile and resulting structure is derived. By using simulation based on this model we were able to reduce the edge placement error (EPE) between the design width and the critical dimension (CD) of a fabricated photoresist, which enables improvement of the CD. Moreover, by experiments carried out with the parameter derived from the writing scheme, we minimized the corner-rounding effect by controlling light transmission to the corners of a feature by modulating a DMD.
Keywords
Digital micromirror device; Maskless lithography; Optical proximity correction; Edge placement error; Corner-rounding effect;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
Times Cited By Web Of Science : 0  (Related Records In Web of Science)
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