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Microstereolithography using a Digital Micromirror Device as the Dynamic Pattern Generator  

Joo Jae-Young (광주과학기술원 기전공학과)
Kim Sung-Hoon (광주과학기술원 기전공학과)
Byun Hong-Seok (국방과학기술원)
Lee Kwan-Heng (광주과학기술원 기전공학과)
Jeong Sung-Ho (광주과학기술원 기전공학과)
Publication Information
Journal of the Korean Society for Precision Engineering / v.23, no.7, 2006 , pp. 146-151 More about this Journal
Abstract
In order to increase the productivity of conventional microstereolithography, a new method using a digital micromirror device ($DMD^{TM}$) as the dynamic patter generator is proposed. The deviation from the level of clear optical images to the level of photopolymer surface is a key for the fabrication of an accurate 3D structure, so this deviation is minimized by controlling the viscosity of FA 1260T with organic solvents. After finding the appropriate process variables, the feasibility of microstructure fabrication such as a microgear and a microsphere is demonstrated. Microstereolithography with $DMD^{TM}$ showed the potential to replace the existing focused beam microstereolithography.
Keywords
Microstereolithography; stereolithography; digital micromirror device;
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