• Journal of Mechanical Science and Technology
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• 제20권4호
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• pp.554-560
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• 2006

This paper describes the demonstration of successful fabrication and initial characterization of micromachined pressure sensors and micromachined jets (microjets) fabricated for use in macro flow control and other applications. In this work, the microfabrication technology was investigated to create a micromachined fluidic control system with a goal of application in practical fluids problems, such as UAV (Unmanned Aerial Vehicle)-scale aerodynamic control. Approaches of this work include: (1) the development of suitable micromachined synthetic jets (microjets) as actuators, which obviate the need to physically extend micromachined structures into an external flow; and (2) a non-silicon alternative micromachining fabrication technology based on metallic substrates and lamination (in addition to traditional MEMS technologies) which will allow the realization of larger scale, more robust structures and larger array active areas for fluidic systems. As an initial study, an array of MEMS pressure sensors and an array of MEMS modulators for orifice-based control of microjets have been fabricated, and characterized. Both pressure sensors and modulators have been built using stainless steel as a substrate and a combination of lamination and traditional micromachining processes as fabrication technologies.

• 한국공작기계학회:학술대회논문집
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• 한국공작기계학회 1999년도 춘계학술대회 논문집
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• pp.1-14
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• 1999

• 대한전자공학회논문지SD
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• 제44권12호
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• pp.7-11
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• 2007

본 논문에서는 MMIC 응용을 위한 dielectric-supported air-gapped microstrip line (DAML) 구조를 이용하여 dual-mode stepped impedance 링 공진기를 설계 제작하였다. 링 공진기는 표면 마이크로머시닝 기술을 이용하여 만들어졌다. DAML ring resonator는 다층구조로써 공기중에 위치한 신호선과 MMIC 응용에 적합하도록 CPW가 한 평면에 구성되 있으며 DAML-CPW 트랜지션이 자유로운게 특징이다. DAML 링 공진기는 $10{\mu}m$ 높이로 GaAs 기판 으로부터 띄어져 있다. 대역통과 여파기는 dual-mode 공진을 하며 stepped impedance 이용한 구조이다. 측정결과로 중심주파수 97 GHz에선 감쇠특성은 15 dB, 삽입손실은 2.65 dB를 보였으며, 상대 대역폭은 12 %를 나타냈다. 이같은 구조의 대역통과 여파기는 MMIC 와의 직접화에 유리하다.

• 센서학회지
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• 제14권1호
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• pp.1-6
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• 2005

This paper describes a novel concept of a chemically sensitive scanning force microscope (CS-SFM). It consists of the conventional SFM and the time-of-flight mass spectrometer (TOF-MS). A switchable cantilever (SC) fabricated by the micromachining technology combines each advantage of two completely different systems, SFM and TOF-MS. The CS-SFM offers to produce both images of topography and chemical information simultaneously. First we employed a rotatable tip holder based on 4 piezotube actuators for demonstration of the possibility of the CS-SFM concept. Second the CS-SFM concept is optimized with the micromachining technology. The micromachined SC with an integrated bimorph actuator and a piezoresistive strain sensor provides a reasonable switching speed of ${\sim}10$ ms which is very attractive for the CS-SFM application. The SC is currently being integrated in an ultra-high-vacuum system to perform various experiments.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2002년도 춘계학술대회 논문집
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• pp.497-502
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• 2002

This paper describes a design methodology of a tri-axial silicon-based farce sensor with square membrane by using micromachining technology (MEMS). The sensor has a maximum farce range of 5 N and a minimum force range of 0.1N in the three-axis directions. A simple beam theory was adopted to design the shape of the micro-force sensor. Also the optimal positions of piezoresistors were determined by the strain distribution obtained from the commercial finite element analysis program, ANSYS. The Wheatstone bridge circuits were designed to consider the sensitivity of the force sensor and its temperature compensation. Finally the process for microfabrication was designed using micromachining technology.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2005년도 추계 학술대회
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• pp.124-128
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• 2005

To produce a highly sensitive uncooled microbolometer, the development of a high-performance thermometric material is essential. In this work, amorphous vanadium-tungsten oxide was developed as a thermometric material at a low temperature of $300^{\circ}C$, and the microbolometer, coupled with the material, was designed and fabricated using surface micromachining technology. The vanadium-tungsten oxide showed good properties for application to the microbolometer, Such as a high temperature coefficient of resistance of over -4.0 $\%$/K and good compatibility with the surface micromachining and integrated circuit fabrication process due to its low fabrication temperature. As a result, the uncooled microbolometer could be fabricated with high detectivity over $1.0\;{\times}\;10^9\;cmHz^{1/2}/W$ at a bias current of $7.5\;{\mu}A$ and a chopper frequency of 10-20 Hz

• 대한전기학회:학술대회논문집
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• 대한전기학회 1998년도 하계학술대회 논문집 G
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• pp.2518-2520
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• 1998

Silicon can be reactive ion etched (RIE) either isotropically or anisotropically. In this paper, a new micromachining technology combining these two etching characteristics is proposed. In the proposed method, the fabrication steps are as follows. First. a polysilicon layer, which is used as the bottom electrode, is deposited on the silicon wafer and patterned. Then the silicon substrate is etched anisotropically to a few micrometer depth that forms a cavity. Then an PECVD oxide layer is deposited to passivate the cavity side walls. The oxide layers at the top and bottom faces are removed while the passivation layers of the side walls are left. Then the substrate is etched again but in an isotropic etch condition to form a round trench with a larger radius than the anisotropic cavity. Then a sacrificial PECVD oxide layer is deposited and patterned. Then a polysilicon structural layer is deposited and patterned. This polysilicon layer forms a pivot structure of a rocker-arm. Finally, oxide sacrificial layers are etched away. This new micromachining technology is quite simpler than conventional method to fabricate joint structures, and the devices that are fabricated using this technology do not require a flexing structure for motion.

• KIEE International Transactions on Electrophysics and Applications
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• 제4C권4호
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• pp.149-154
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• 2004

This paper presents a silicon probe tip for vertical probe card application. The silicon probe tip was fabricated using MEMS technology such as porous silicon micromachining and deep- RIE (reactive ion etching). The thickness of the silicon epitaxial layers was 5 ${\mu}{\textrm}{m}$ and 7 ${\mu}{\textrm}{m}$, respectively. The width and length were 40 ${\mu}{\textrm}{m}$ and 600 ${\mu}{\textrm}{m}$, respectively. The probe structure was a multilayered structure and was composed of Au/Ni-Cr/Si$_3$N$_4$/n-epi layers. The height of the curled probe tip was measured as a function of the annealing temperature and time. Resistance characteristics of the probe tip were measured using a touchdown test.

• 전자공학회논문지D
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• 제35D권9호
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• pp.48-53
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• 1998

실리콘 벌크 마이크로머시닝과 표면 마이크로머시닝기술을 혼합하여 새로운 구조의 정전렌즈를 제작하였다. 표면 마이크로머시닝을 위한 구조층과 희생층으로는 폴리실리콘을 사용하였으며 구조층을 열산화막으로 보호하여 실리콘 습식 식각시 손상되지 않도록 하였다. 이전의 마이크로컬럼에 사용되던 정전렌즈에 비하여 이 구조가 갖는 장점은 1) 양극 접합의 수를 줄일 수 있어 구멍간 정렬, 렌즈의 생산성, 신뢰도, 손상 면에서 우수하고, 2) 마이크로컬럼의 집적화를 통한 arrayed lithography에도 유리하다는 것이다.

• 한국정밀공학회지
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• 제31권1호
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• pp.75-81
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• 2014

Laser beam machining has been known as efficient for glass micromachining. It is usually used the ultra-short pulsed laser which is time-consuming and uneconomic process. In order to use economic and powerful long pulsed laser, indirect processing called laser-induced backside wet etching (LIBWE) is good alternative method. In this paper, micromachining of glass using Nd:YAG laser with nanosecond pulsed beam has been attempted. In order to improve shape accuracy, combined processing with magnetic stirrer has been widely used. Magnetic stirrer acts to circulate the solution and remove the bubble but it is not suitable for deep hole machining. To get better effect, ultrasonic vibration was applied for improving shape accuracy.