• Proceedings of the Korean Ceranic Society Conference
• /
• 2003.10a
• /
• pp.155.1-155
• /
• 2003

• Transactions of the Korean Society of Mechanical Engineers A
• /
• v.27 no.10
• /
• pp.1754-1761
• /
• 2003

The atomic force microscopy (AFM) based lithographic technique has been used directly to machine material surface and fabricate nano components in MEMS (micro electro mechanical system). In this paper, three-dimensional molecular dynamics (MD) simulations have been conducted to evaluate the characteristic of deformation process at atomistic scale for nano-lithography process. Effects of specific combinations of crystal orientations and cutting directions on the nature of atomistic deformation were investigated. The interatomic force between diamond tool and workpiece of copper material was assumed to be derived from the Morse potential function. The variation of tool geometry and cutting depth was also evaluated and the effect on machinability was investigated. The result of the simulation shows that crystal plane and cutting direction significantly influenced the variation of the cutting forces and the nature of deformation ahead of the tool as well as the surface deformation of the machined surface.

• Journal of the Korean Society for Precision Engineering
• /
• v.31 no.3
• /
• pp.269-275
• /
• 2014

Conventional machining technologies such as a milling process have limitations in accuracy to fabricate microstructures. Deep X-ray lithography using the synchrotron radiation is a promising micromachining process with an excellent accuracy, whereas there are difficulties in the fabrication of multi-layered structures. Therefore, it is mainly used for fabricating simple mono-layered microstructures with a high aspect ratio. In this study, a novel technology for fabricating multi-layered microstructures is proposed by combining two processes. In advance, an X-ray resist material is cut and machined into various shapes and heights by the micro milling process. Subsequent X-ray irradiation process facilitates the fabrication of multi-layered microstructures. The proposed technology can overcome the limitation of the pattern accuracy in conventional milling process and the difficulty of the multi-layered machining in x-ray process. The usefulness of the proposed technology is demonstrated in this study by applying the technique in the realization of various multi-layered microstructures.

• Journal of the Microelectronics and Packaging Society
• /
• v.30 no.2
• /
• pp.65-70
• /
• 2023

Nanoimprint lithography (NIL) has attracted much attention due to its process simplicity, excellent patternability, process scalability, high productivity, and low processing cost for pattern formation. However, the pattern size that can be implemented on metal materials through conventional NIL technologies is generally limited to the micro level. Here, we introduce a novel hard imprint lithography method, extreme-pressure imprint lithography (EPIL), for the direct nano-to-microscale pattern formation on the surfaces of metal substrates with various thicknesses. The EPIL process allows reliable nanoscopic patterning on diverse surfaces, such as polymers, metals, and ceramics, without the use of ultraviolet (UV) light, laser, imprint resist, or electrical pulse. Micro/nano molds fabricated by laser micromachining and conventional photolithography are utilized for the nanopatterning of Al substrates through precise plastic deformation by applying high load or pressure at room temperature. We demonstrate micro/nanoscale pattern formation on the Al substrates with various thicknesses from 20 ㎛ to 100 mm. Moreover, we also show how to obtain controllable pattern structures on the surface of metallic materials via the versatile EPIL technique. We expect that this imprint lithography-based new approach will be applied to other emerging nanofabrication methods for various device applications with complex geometries on the surface of metallic materials.

• Journal of the Korean Vacuum Society
• /
• v.22 no.4
• /
• pp.198-203
• /
• 2013

Energy harvesting refers to converting ambient energy from our surroundings, which would be otherwise wasted, into useful electrical energy. A triboelectric energy harvester is a self-charged device for harnessing mechanical energy based on a coupled process of contact charging and electrostatic induction. In this research, we demonstrate simple fabrication of prototype triboelectric energy harvester using soft lithography and its electrical characterization. Triboelectric generation occurs between the two micro patterned layers of Au and PDMS. A micro pattern is simply replicated directly from the bottom layer to the top layer using soft-lithography without an extra transfer process. This generator can produce an output voltage of 2 V and output current of 20 nA.

• Journal of the Korean Society of Manufacturing Technology Engineers
• /
• v.20 no.4
• /
• pp.395-400
• /
• 2011

Scanning Probe Lithography is a method to localized oxidation on single crystal silicon wafer surface. This study demonstrates nanometer scale non contact lithography process on (100) silicon (p-type) wafer surface using AFM(Atomic force microscope) apparatuses and pulse controlling methods. AFM-based experimental apparatuses are connected the DC pulse generator that supplies ultra short pulses between conductive tip and single crystal silicon wafer surface maintaining constant humidity during processes. Then ultra short pulse durations are controlled according to various experimental conditions. Non contact lithography of using ultra short pulse induces electrochemical reaction between micro-scale tip and silicon wafer surface. Various growths of oxides can be created by ultra short pulse non contact lithography modification according to various pulse durations and applied constant humidity environment.

• Korean Journal of Optics and Photonics
• /
• v.20 no.1
• /
• pp.23-28
• /
• 2009

In this study, we propose an image stitching method for large-area holographic photo lithography. In this method, a hologram medium become a hologram mask for lithography. And the mask has information for stitched images. These images are recorded by signal images which are controlled with DMD (digital micro-mirror device), and serial hologram recording is achieved with a motorized linear stage. Using this method, fringe seams appear on the stitching area. To remove these fringe seams, double exposure holographic lithography is tried. Each stitched image is recorded and reconstructed with a different reference beam. The experiments confirm that fringe seams are removed.

• Design & Manufacturing
• /
• v.16 no.3
• /
• pp.58-65
• /
• 2022

Micro-fluidic chip has been fabricated by lithography process on silicon or glass wafer, casting using PDMS, injection molding of thermoplastics or 3D printing, etc. Among these processes, 3D printing can fabricate micro-fluidic chip directly from the design without master or template for fluidic channel fabricated previously. Due to this direct printing, 3D printing provides very fast and economical method for prototyping micro-fluidic chip comparing to conventional fabrication process such as lithography, PDMS casting or injection molding. Although 3D printing is now used more extensively due to this fast and cheap process done automatically by single printing machine, there are some issues on accuracy or surface characteristics, etc. The accuracy of the shape and size of the micro-channel is limited by the resolution of the printing and printing direction or layering direction in case of SLM type of 3D printing using UV curable resin. In this study, the printing direction and thickness of each printing layer are investigated to see the effect on the size, shape and surface of the micro-channel. A set of micro-channels with different size was designed and arrayed orthogonal. Micro-fluidic chips are 3D printed in different directions to the micro-channel, orthogonal, parallel, or skewed. The shape of the cross-section of the micro-channel and the surface of the micro-channel are photographed using optical microscopy. From a series of experiments, an optimal printing direction and process conditions are investigated for 3D printing of micro-fluidic chip.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2008.10a
• /
• pp.523-525
• /
• 2008

Inkjet printing is being considered as an alternative to the conventional lithography in the electronic industry. Surface energy control of substrate is a critical issue in controlling the dimension of microstructures by the inkjet printing. This study introduces the surface energy control of ITO substrate for in/q'et printing of PEDOT/PSS.

• 제어로봇시스템학회:학술대회논문집
• /
• 2000.10a
• /
• pp.429-429
• /
• 2000

Micro positioning mechanism is the key technology in many fields, such as scanning electron microscopy (SEM), x-ray lithography, mask alignment and micro-machining. In the paper, a 3DOF parallel-type micro-positioning mechanism is proposed. This mechanism uses piezo-actuators and Flexure hinge to control x, y and $\theta$ motion. It is shown both analytically and numerically that 2 DOF flexure hinge model was better precision than 1 DOF flexure hinge design.