Browse > Article
http://dx.doi.org/10.3807/HKH.2009.20.1.023

Image Stitching and Seamless Holographic Photo-Lithography for Large-Area Patterning  

Lee, Joon-Sub (Department of Physics, Hanyang University)
Park, Woo-Jae (Department of Physics, Hanyang University)
Lee, Ji-Whan (Department of Physics, Hanyang University)
Song, Soek-Ho (Department of Physics, Hanyang University)
Lee, Sung-Jin (Mechatronics & Manufacturing Tech Center, CTO, Samsung Electronics)
Kim, Oui-Serg (Mechatronics & Manufacturing Tech Center, CTO, Samsung Electronics)
Publication Information
Korean Journal of Optics and Photonics / v.20, no.1, 2009 , pp. 23-28 More about this Journal
Abstract
In this study, we propose an image stitching method for large-area holographic photo lithography. In this method, a hologram medium become a hologram mask for lithography. And the mask has information for stitched images. These images are recorded by signal images which are controlled with DMD (digital micro-mirror device), and serial hologram recording is achieved with a motorized linear stage. Using this method, fringe seams appear on the stitching area. To remove these fringe seams, double exposure holographic lithography is tried. Each stitched image is recorded and reconstructed with a different reference beam. The experiments confirm that fringe seams are removed.
Keywords
Holographic photo lithography; Image stitching; Large area lithography; DMD imaging; Angular multiplexing;
Citations & Related Records
연도 인용수 순위
  • Reference
1 Ross I. N., David G. M., and Klemitz D., “High-resolution holographic image projection at visible and ultraviolet wavelengths,” Appl. Opt., vol. 27, no. 5, pp. 967-972, 1988   DOI
2 K. Jain, M. Zemel, and M. Klosner, “Large-Area High-Resolution Lithography and Photoablation Systems for Microelectronics and Optoelectronics Fabrication,” PROCEEDINGS OF THE IEEE, vol. 90, no. 10, pp. 1681-1688, 2002   DOI   ScienceOn
3 Lebib A., Chen Y., Bourneix J, Carcenac F., Cambril E., Couraud L., and Launois H., “Nanoimprint lithography for a large area pattern replication,” Microelectronic Engineering, vol. 46, issue1-4, pp. 319-322, 1999   DOI   ScienceOn
4 Cambell M., Sharp DN., Harrison MT., et al., “Fabrication of photonic crystals for the visible spectrum by holographic lithography,” Nature, vol. 404, issue 6773, pp. 53-56, Mar. 2000   DOI   ScienceOn
5 Marc J. Madou, Fundamentals of microfabrication the science of miniaturization 2nd ed. (CRC press, Florida, USA, 2002), pp. 22-28
6 Clube F., Gray S., Struchen D., Tisserand J. C., Malfoy S., and Darbellay Y., “Holographic microlithography,” Opt. Eng., vol. 34, no. 9, pp. 2724-2730, Sept. 1995   DOI   ScienceOn
7 H. J. Coufal, et al., Holographic data storage (Springer series in optical sciences, New York, USA, 2000), pp. 7-9
8 J. H. Hong, I. McMichael, and T. Y. Chang, “Volume holographic memory systems: techniques and architectures,” Opt. Eng., vol. 34, no. 8, pp. 2193-2203, 1995   DOI   ScienceOn
9 Fai H. Mok, “Angle-multiplexed storage of 5000 holograms in lithium niobate,” Opt. Lett., vol. 18, no. 11, pp. 915-917, 1993   DOI   ScienceOn
10 Ehbets P., Herzig H. P., and Clube F., “High-carrierfrequency fan-out gratings fabricated by total internal reflection holographic lithography,” Opt. Eng., vol. 34, no. 8, pp. 2377-2383, 1995   DOI   ScienceOn
11 Dandliker R. and Brook J., “Holographic photolithography for submicron VLSI structure,” Holographic Systems, Components and Applications, 1989., Second International Conference on 1989, pp. 127-132, 1989
12 Kahp Y. Suh and Hong H. Lee, “Capillary force Lithography: Large-area patterning, self-organization, and anisotropic dewetting,” Advanced Functional Materials, vol. 12, issue 6+7, pp. 405-413, June 2002   DOI   ScienceOn
13 Y. Chen, Y. Shroff, and W. G. Oldham, “Modeling and control of nanomirrors for EUV maskless lithography,” Technical Proc. Int. Conf. Modeling and Simulation of Microsystems, pp. 602-604, San Diego, CA, Mar. 2000