• Journal of the Semiconductor & Display Technology
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• v.8 no.4
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• pp.43-48
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• 2009

The aim of this paper is to describe the development of the electron-beam optic analysis algorithm for simulating the e-beam behavior concerned with electrostatic lenses and their focal properties in the micro-column of the multi-beam lithography system. The electrostatic lens consists of an array of electrodes held at different potentials. The electrostatic lens, the so-called einzel lens, which is composed of three electrodes, is used to focus the electron beam by adjusting the voltages of the electrodes. The optics of an electron beam penetrating a region of an electric field is similar to the situation in light optics. The electron is accelerated or decelerated, and the trajectory depends on the angle of incidence with respect to the equi-potential surfaces of the field. The performance parameters, such as the working distances and the beam diameters are obtained by the computational simulations as a function of the focusing voltages of the einzel lens electrodes. Based on the developed simulation algorithm, the high performance of the micro-column can be achieved through optimized control of the einzel lens.

• Design & Manufacturing
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• v.15 no.4
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• pp.57-64
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• 2021

In recent materials industry, researches on the technology to manufacture super hydrophobic surface by effectively controlling the wettability of solid surface are expanding. Research on the fabrication of super hydrophobic surface has been studied not only for basic research but also for self-cleaning, anti-icing, anti-friction, flow resistance reduction in construction, textile, communication, military and aviation fields. A super hydrophobic surface is defined as a surface having a water droplet contact angle of 150 ° or more. The contact angle is determined by the surface energy and is influenced not only by the chemical properties of the surface but also by the rough structure. In this paper, maskless lithography using DMD, electro etching, anodizing and hot embossing are used to make the polymer resin PMMA surface super hydrophobic. In the fabrication of microstructure, DMDs are limited by the spacing of microstructure due to the structural limitations of the mirrors. In order to overcome this, maskless lithography using a transfer mechanism was used in this paper. In this paper, a super hydrophobic surface with micro and nano composite structure was fabricated. And the wettability characteristics of the micro pattern surface were analyzed.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.656-659
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• 2003

Although Hereafter a mass production will claim for patterning nano sized thickness or line in micro-nano industry. existent lithography fabrication has many usable fields, it has complex fabrication steps, expensive values and row work rates. Development of Dip-pen type nano plotter using polymer actuator can construct row cost mass production system because it will change existent lithography fabrication more simple and easy.

• Journal of the Korean Society for Precision Engineering
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• v.26 no.6
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• pp.36-40
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• 2009

Development of maskless lithography techniques can provide a potential solution for the photomask cost issue. Furthermore, it could open a market for small scale manufacturing applications. Since femtosecond lasers have been found suitable for processing of a wide range of materials with sub-micrometer resolution, it is attractive to use this technique for maskless lithography. As a femtosecond laser has recently been developed, both of high power and high photon density are easily obtained. The high photon density results in photopolymerization of photoresist whose absorption spectrum is shorter than that of the femtosecond laser. The maskless lithography using the two-photon absorption (TPA) makes micro structures. In this paper, we present a femtosecond laser direct write lithography for submicron PR patterning, which show great potential for future application.

• Laser Solutions
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• v.10 no.2
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• pp.17-24
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• 2007

We have studied a laser direct writing lithography(LDWL). This is more important to apply to micro patterning using UV laser. We demonstrate the possibility of LDWL and construct the fabrication system. We use Galvano scanner to process quickly micro patterns from computer data. And laser beam is focused with $F-{\theta}$ lens. AZ5214 and SU-8 photoresist are chosen as experimental materials and a kind of well-known positive and negative photoresist respectively. Laser ablation mechanism depends on the optical properties of polymer. In this paper, therefore we investigate the phenomenon of laser ablation according to the laser fluence variation and measure the shape profile of micro patterned holes. From these experimental results, we show that LDWL is very useful to process various micro patterns directly.

• Transactions on Electrical and Electronic Materials
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• v.3 no.1
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• pp.30-37
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• 2002

A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control'writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm). To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and 0.5 $\times$ 0.5 mm$^2$area, respectively. This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.1224-1226
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• 2003

In this work, we developed a high resolution printing technique based on transferring a pattern from a PDMS stamp to a Pd and Au substrate by microcontact printing Also, we fabricated various 2D metallic and polymeric nano patterns with the feature resolution of sub-micrometer scale by using the method of microcontact printing (${\mu}$CP) based on soft lithography. Silicon masters for the micro molding were made by e-beam lithography. Composite poly(dimethylsiloxane) (PDMS) molds were composed of a thin, hard layer supported by soft PDMS layer. From this work, it is certificated that composite PDMS mold and undercutting technique play an important role in the generation of a clear SAM nanopattern on Pd and Au substrate.

• Proceedings of the International Microelectronics And Packaging Society Conference
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• 2004.11a
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• pp.65-65
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• 2004

• Proceedings of the KSME Conference
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• 2005.11a
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• pp.233.1-233.1
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• 2005

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2007.06a
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• pp.185-186
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• 2007