• Title/Summary/Keyword: micro-fabrication

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Development of Laser Processing Technology and Life Evaluation Method for Lifespan Improvement of Titanium Superhydrophobic Surface (티타늄 초소수성 표면의 수명 향상을 위한 레이저 처리 기법 개발 및 내수명성 평가법 개발)

  • Kyungeun Jeong;Kyeongryeol Park;Yong Seok Choi;Seongmin Kang;Unseong Kim;Song Yi Jung;Kyungjun Lee
    • Tribology and Lubricants
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    • v.40 no.3
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    • pp.91-96
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    • 2024
  • Recently, extensive studies have been carried out to enhance various performance aspects such as the durability, lifespan, and hardness by combining diverse materials or developing novel materials. The utilization of superhydrophobic surfaces, particularly in the automotive, textile, and medical device industries, has gained momentum to achieve improved performance and efficiency. Superhydrophobicity refers to a surface state where the contact angle when water droplets fall is above 150°, while the contact angle during sliding motion is smaller than 10°. Superhydrophobic surfaces offer the advantage of water droplets not easily sliding off, maintaining a cleaner state as the droplets leave the surface. Surface modification involves two fundamental steps to achieve superhydrophobicity: surface roughness increase and surface energy reduction. However, existing methods, such as time-consuming processes and toxic organic precursors, still face challenges. In this study, we propose a method for superhydrophobic surface modification using lasers, aiming to create roughness in micro/nanostructures, ensuring durability while improving the production time and ease of fabrication. The mechanical durability of superhydrophobic samples treated with lasers is comparatively evaluated against chemical etching samples. The experimental results demonstrate superior mechanical durability through the laser treatment. Therefore, this research provides an effective and practical approach to superhydrophobic surface modification, highlighting the utility of laser treatment.

Photo-crosslinked gelatin methacryloyl hydrogel strengthened with calcium phosphate-based nanoparticles for early healing of rabbit calvarial defects

  • Da-Na Lee;Jin-Young Park;Young-Wook Seo;Xiang Jin;Jongmin Hong;Amitava Bhattacharyya;Insup Noh;Seong-Ho Choi
    • Journal of Periodontal and Implant Science
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    • v.53 no.5
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    • pp.321-335
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    • 2023
  • Purpose: The aim of this study was to investigate the efficacy of photo-crosslinked gelatin methacryloyl (GelMa) hydrogel containing calcium phosphate nanoparticles (CNp) when applying different fabrication methods for bone regeneration. Methods: Four circular defects were created in the calvaria of 10 rabbits. Each defect was randomly allocated to the following study groups: 1) the sham control group, 2) the GelMa group (defect filled with crosslinked GelMa hydrogel), 3) the CNp-GelMa group (GelMa hydrogel crosslinked with nanoparticles), and 4) the CNp+GelMa group (crosslinked GelMa loaded with nanoparticles). At 2, 4, and 8 weeks, samples were harvested, and histological and micro-computed tomography analyses were performed. Results: Histomorphometric analysis showed that the CNp-GelMa and CNp+GelMa groups at 2 weeks had significantly greater total augmented areas than the control group (P<0.05). The greatest new bone area was observed in the CNp-GelMa group, but without statistical significance (P>0.05). Crosslinked GelMa hydrogel with nanoparticles exhibited good biocompatibility with a minimal inflammatory reaction. Conclusions: There was no difference in the efficacy of bone regeneration according to the synthesized method of photo-crosslinked GelMa hydrogel with nanoparticles. However, these materials could remain within a bone defect up to 2 weeks and showed good biocompatibility with little inflammatory response. Further improvement in mechanical properties and resistance to enzymatic degradation would be needed for the clinical application.

The Surface Treatment Effect for Nanoimprint Lithography using Vapor Deposition of Silane Coupling Agent (나노임프린트 공정에서 실란커플링제 기상증착을 이용한 표면처리 효과)

  • Lee, Dong-Il;kim, Ki-Don;Jeong, Jun-Ho;Lee, Eung-Sug;Choi, Dae-Geun
    • Korean Chemical Engineering Research
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    • v.45 no.2
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    • pp.149-154
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    • 2007
  • Nanoimprint lithography (NIL) is useful technique because of its low cost and high throughput capability for the fabrication of sub-micrometer patterns which has potential applications in micro-optics, magnetic memory devices, bio sensors, and photonic crystals. Usually, a chemical surface treatment of the stamp is needed to ensure a clean release after imprinting and to protect the expensive original master against contamination. Meanwhile, adhesion promoter between resin and substrate is also important in the nanoscale pattern. In this work, we have investigated the effect of surface treatment using silane coupling agent as release layer and adhesion promoter for UV-Nanoimprint lithography. Uniform SAM (self-assembled monolayer) could be fabricated by vapor deposition method. Vapor phase process eliminates the use of organic solvents and greatly simplifies the handling of the sample. It was also proven that 3-acryloxypropyl methyl dichlorosilane (APMDS) could strongly improve the adhesion force between resin and substrate compared with common planarization layer such as DUV-30J or oxygen plasma treatment.

Design and Fabrication of 4-beam Silicon-Micro Piezoresistive Accelerometer for TPMS Application (TPMS용 4빔 실리콘 미세 압저항형 가속도센서의 설계 및 제작)

  • Park, Ki-Woong;Kim, Hyeon-Cheol
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.49 no.2
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    • pp.1-8
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    • 2012
  • This paper presents the accelerometer which is a key component of TPMS(Tire Pressure Monitoring System). Generally a piezoresistive accelerometer has characteristics of lower cost, better linearity and better immunity about the environmnet noise than a capacitive one. Three types of piezoresistive accelerometers are degined and simulated using ANSYS program. The best one is a piezoresistive sensor which is supported by four beams located at the center of the edge of the mass after comparing the characteristics of resonant frequency of the three types. Considering the sensor size and a simulated maximum stress and maximum displacement, the length of beams is set as $200{\mu}m$. The size of a piezoresistive accelerometer is $3.0mm{\times}3.0mm{\times}0.4mm$. The sensor output is characterized by measuring the output characteristic depending on angle. As a result the offset voltage of the accelerometer is 43.2 mV and its sensitivity is $42.5{\mu}V/V/g$. The temperature bias drift is measured. The shock durability of the sensor is 1500g and the measuring range is 0 ~ 60 g.

Fabrication of Vertically Oriented ZnO Micro-crystals array embedded in Polymeric matrix for Flexible Device (수열합성을 이용한 ZnO 마이크로 구조의 성장 및 전사)

  • Yang, Dong Won;Lee, Won Woo;Park, Won IL
    • Journal of the Microelectronics and Packaging Society
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    • v.24 no.4
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    • pp.31-37
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    • 2017
  • Recently, there has been substantial interest in flexible and wearable devices whose properties and performances are close to conventional devices on hard substrates. Despite the advancement on flexible devices with organic semiconductors or carbon nanotube films, their performances are limited by the carrier scattering at the molecular to molecular or nanotube-to-nanotube junctions. Here in this study, we demonstrate on the vertical semiconductor crystal array embedded in flexible polymer matrix. Such structures can relieve the strain effectively, thereby accommodating large flexural deformation. To achieve such structure, we first established a low-temperature solution-phase synthesis of single crystalline 3D architectures consisting of epitaxially grown ZnO constituent crystals by position and growth direction controlled growth strategy. The ZnO vertical crystal array was integrated into a piece of polydimethylsiloxane (PDMS) substrate, which was then mechanically detached from the hard substrate to achieve the freestanding ZnO-polymer composite. In addition, the characteristics of transferred ZnO were confirmed by additional structural and photoluminescent measurements. The ZnO vertical crystal array embedded in PDMS was further employed as pressure sensor that exhibited an active response to the external pressure, by piezoelectric effect of ZnO crystal.

Liquid Silicon Infiltrated SiCf/SiC Composites with Various Types of SiC Fiber (다양한 SiC 섬유를 적용한 실리콘 용융 침투 공정 SiCf/SiC 복합재료의 제조 및 특성 변화 연구)

  • Song, Jong Seob;Kim, Seyoung;Baik, Kyeong Ho;Woo, Sangkuk;Kim, Soo-hyun
    • Composites Research
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    • v.30 no.2
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    • pp.77-83
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    • 2017
  • Liquid silicon infiltration, which is one of the methods of producing fiber reinforced ceramic composites, has several advantages such as low fabrication cost and good shape formability. In order to confirm LSI process feasibility of SiC fiber, $SiC_f/SiC$ composites were fabricated using three types of SiC fibers (Tyranno SA, LoxM, Tyranno S) which have different crystallinity and oxygen content. Composites that were fabricated with LSI process were well densified by less than 2% of porosity, but showed an obvious difference in 3-point bending strength according to crystallinity and oxygen content. When composites in LSI process was exposed to a high temperature, crystallization and micro structural changes were occurred in amorphous SiOC phase in SiC fiber. Fiber shrinkage also observed during LSI process that caused from reaction in fiber and between fiber and matrix. These were confirmed with changes of process temperature by SEM, XRD and TEM analysis.

Fabrication of Field Emitter Arrays by Transferring Filtered Carbon Nanotubes onto Conducting Substrates

  • Jang, Eun-Soo;Goak, Jung-Choon;Lee, Han-Sung;Lee, Seung-Ho;Lee, Nae-Sung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.311-311
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    • 2009
  • Carbon nanotubes (CNTs) belong to an ideal material for field emitters because of their superior electrical, mechanical, and chemical properties together with unique geometric features. Several applications of CNTs to field emitters have been demonstrated in electron emission devices such as field emission display (FED), backlight unit (BLU), X-ray source, etc. In this study, we fabricated a CNT cathode by using filtration processes. First, an aqueous CNT solution was prepared by ultrasonically dispersing purified single-walled CNTs (SWCNTs) in deionized water with sodium dodecyl sulfate (SDS). The aqueous CNT solution in a milliliter or even several tens of micro-litters was filtered by an alumina membrane through the vacuum filtration, and an ultra-thin CNT film was formed onto the alumina membrane. Thereafter, the alumina membrane was solvated by acetone, and the floating CNT film was easily transferred to indium-tin-oxide (ITO) glass substrate in an area defined as 1 cm with a film mask. The CNT film was subjected to an activation process with an adhesive roller, erecting the CNTs up to serve as electron emitters. In order to measure their luminance characteristics, an ITO-coated glass substrate having phosphor was employed as an anode plate. Our field emitter array (FEA) was fairly transparent unlike conventional FEAs, which enabled light to emit not only through the anode frontside but also through the cathode backside, where luminace on the cathode backside was higher than that on the anode frontside. Futhermore, we added a reflecting metal layer to cathode or anode side to enhance the luminance of light passing through the other side. In one case, the metal layer was formed onto the bottom face of the cathode substrate and reflected the light back so that light passed only through the anode substrate. In the other case, the reflecting layer coated on the anode substrate made all light go only through the cathode substrate. Among the two cases, the latter showed higher luminance than the former. This study will discuss the morphologies and field emission characteristics of CNT emitters according to the experimental parameters in fabricating the lamps emitting light on the both sides or only on the either side.

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Formation of GaN microstructures using metal catalysts on the vertex of GaN pyramids (금속촉매를 이용한 GaN 피라미드 꼭지점 위의 마이크로 GaN 구조 형성)

  • Yun, W.I.;Jo, D.W.;Ok, J.E.;Jeon, H.S.;Lee, G.S.;Jung, S.K.;Bae, S.M.;Ahn, H.S.;Yang, M.
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.21 no.3
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    • pp.110-113
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    • 2011
  • In this paper, we propose a new method for the fabrication of GaN microstructures formed only on the vertex of GaN pyramid by using of metal catalysts. GaN pyramidal structures were selectively grown on 3 ${\mu}m$ $SiO_2$ dot patterns followed by thin film deposition of Au and Cr only on the vertex area of the GaN pyramids with precisely controlled photolithography. After the metal deposition, the samples were loaded in the MOVPE reactor for the growth of GaN microstructures for 10 minutes. Temperature for the growth of the GaN microstructures was changed from $650^{\circ}C$ to $750^{\circ}C$. Rod type GaN microstructures were grown in the direction of vertical to the six {1-101} facets and the shape of the GaN microstructures was changed depend on the type of metal.

Fabrication and mdchanical properties of $AC4A/SiC_p$ composites by mechanical alloying (기계적합금화에 의한 $AC4A/SiC_p$복합재료의 제조 및 기계적 특성)

  • Lee, Byung-Hun;Cho, Hyung-Jun;Lim, Young-Ho;Lee, Jun-Hee
    • Korean Journal of Materials Research
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    • v.4 no.6
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    • pp.651-661
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    • 1994
  • Utilizing Mechanical Alloy Process, that were obt,ained the results from investigated formation process of AC4A/$SiC_p$. composite material powders and mechanical properties of their extrusion materials. The obtained results are as follow conclusions. AC4A-lOwt.% $SiC_p$ powders which were mechanically alloyed at 150rpm for 420min have been obtained finely and uniformly rounded powder particals that were reached the steady state which was saturated micro hardness about tlv 230 in the range size of 1 0 ~ 2 0$\mu \textrm{m}$. EDAX analysis tests have been resulted in a little amount of I'e conrents increasing with MA times, the artifical aging of AC4A/S$SiC_p$ composite materials was obtained the hardness with solution treated at $525^{\circ}C$ for lOhrs the maximum value of Hv 230 with aging at. $170^{\circ}C$ for 1000min. The Intensity and width of X-ray diffraction pattern were decreasing and widening because of grain boundary refinement and heterogeneous strain during mechanical alloying. Tensile tests at room temperature were carried out the maximum value of 37 Kgf/$\mu \textrm{mm}^2$ with ext,rused materials, 27 Kgf/$\mu \textrm{mm}^2$ with heat treated them at $500^{\circ}C$.

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TIR Holographic lithography using Surface Relief Hologram Mask (표면 부조 홀로그램 마스크를 이용한 내부전반사 홀로그래픽 노광기술)

  • Park, Woo-Jae;Lee, Joon-Sub;Song, Seok-Ho;Lee, Sung-Jin;Kim, Tae-Hyun
    • Korean Journal of Optics and Photonics
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    • v.20 no.3
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    • pp.175-181
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    • 2009
  • Holographic lithography is one of the potential technologies for next generation lithography which can print large areas (6") as well as very fine patterns ($0.35{\mu}m$). Usually, photolithography has been developed with two target purposes. One was for LCD applications which require large areas (over 6") and micro pattern (over $1.5{\mu}m$) exposure. The other was for semiconductor applications which require small areas (1.5") and nano pattern (under $0.2{\mu}m$) exposure. However, holographic lithography can print fine patterns from $0.35{\mu}m$ to $1.5{\mu}m$ keeping the exposure area inside 6". This is one of the great advantages in order to realize high speed fine pattern photolithography. How? It is because holographic lithography is taking holographic optics instead of projection optics. A hologram mask is the key component of holographic optics, which can perform the same function as projection optics. In this paper, Surface-Relief TIR Hologram Mask technology is introduced, and enables more robust hologram masks than those previously reported that were formed in photopolymer recording materials. We describe the important parameters in the fabrication process and their optimization, and we evaluate the patterns printed from the surface-relief TIR hologram masks.