The Surface Treatment Effect for Nanoimprint Lithography using Vapor Deposition of Silane Coupling Agent |
Lee, Dong-Il
(Nano-Mechanical Systems Research Center, Korea Institute of Machinery & Materials)
kim, Ki-Don (Nano-Mechanical Systems Research Center, Korea Institute of Machinery & Materials) Jeong, Jun-Ho (Nano-Mechanical Systems Research Center, Korea Institute of Machinery & Materials) Lee, Eung-Sug (Nano-Mechanical Systems Research Center, Korea Institute of Machinery & Materials) Choi, Dae-Geun (Nano-Mechanical Systems Research Center, Korea Institute of Machinery & Materials) |
1 | Resnick, D. J., Sreenivasan, S. V. and Willson, C. G., 'Step & Flash Imprint Lithography,' Materialstoday, 8(2), 34-42(2005) |
2 | Austin, M. D., Ge, H., Wu, W., Li, M., Yu, Z., Wasserman, D., Lyon, S. A. and Chou, S. Y., 'Fabrication of 5 nm Line Width and 14nm Pitch Features by Nanoimprint Lithography,' Appl. Phys. Lett., 84(26), 5299-5301(2006) DOI ScienceOn |
3 | Choi, D. G., Jeong, J. H., Sim. Y. S., Lee, E. S., Kim, W, S. and Bea, B. S., 'Fluorinated Organic-inorganic Hybrid Mold as a New Stamp for Nanoimprint and Soft Lithography,' Langmuir, 21(21), 9390-9392(2005) DOI ScienceOn |
4 | Colburn, M., Johnson, S., Stewart, M., Damle, S., Bailey, T., Choi, B., Wedlake, M., Michealsom, T., Sreenivasan, S. V., Ekerdt, J. and Willson, C. G., 'Step and Flash Imprint Lithography: A New Approach to High-resolution Patterning,' Proc. SPIE., 3676(1), 379-389(1999) |
5 | Chou, S. Y., Krauss, P. R. and Renstrom, P. J., 'Nanoimprint Lithography,' J. Vac. Sci. Tech. B., 14(6), 4129-4133(1996) DOI ScienceOn |
6 | Kawai, A., 'Adhesion and Cohesion Properties of dot Resist Patterns Ranging from 84 to 364 nm Diameter Analyzed by Direct Peeling Method with Atomic Force Microscope Tip,' J. Photopolym. Sci. Technol., 15(1), 121-126(2002) DOI ScienceOn |
7 | Bailey, T., Choi, B. J., Colburn, M., Meissl, M., Shaya, S,. Ekerdt, J. G., Sreenivasan, S. V. and Willson, C. G., 'Step and Flash Imprint Lithography: Template Surface Treatment and Defect Analysis,' J. Vac. Sci. Tech. B., 18(6), 3572-3577(2000) DOI ScienceOn |
8 | Haisma, J., Verheijen, M. and Heuvel, K., 'Mold-Assisted Nanolithography: A Process for Reliable Pattern Replication,' J. Vac. Sci. Tech. B., 14(6), 4124-4128(1996) DOI ScienceOn |
9 | Ruchhoeft, P., Colburn, M., Choi, B., Nounu, H., Johnson, S., Bailey, T., Damle, S. and Willson, C. G., 'Patterning Curved Surfaces : Template Generation by Ion Beam Proximity Lithography and Relief Transfer by Step and Flash Imprint Lithography,' J. Vac. Sci. Tech. B., 17(6), 2965-2969(1999) DOI ScienceOn |
10 | Jeong, J. H., Sim, Y. S., Sohn, H. K. and Lee, E. S., 'UV-nanoimprint Lithography Using an Elementwise Patterned Stamp,' Microelectron. Eng., 75(2), 165-171(2004) DOI ScienceOn |
11 | Bunker, B. C., Carpick, R. W., Assink, R. A., Thomas, M. L., Hankins, M. G., Voigt, J. A., Sipola, D., De bore, M. P. and Gulley, G. L., 'The Impact of Solution Agglomeration on the Deposition of Self-Assembled Monolayer,' Langmuir, 16(20), 7742-7751(2000) DOI ScienceOn |
12 | Chou, S. Y., Krauss, P. R. and Renstrom, P. J., 'Imprint Lithography with 25-nanometer Resolution,' Science, 272(5258), 85-87 (1996) DOI ScienceOn |
13 | Jung, G. Y., Li, Z., Wu, W., Ganapathiappan, S., Li, X., Olynick, L. D., Wang, S. Y., Tong, W. M. and Williams, R. S., 'Improved Pattern Transfer in Nanoimprint Lithography at 30 nm Half- Pitch by Substrate-Surface Functionalization,' Langmuir, 21(14), 6127-6130(2005) DOI ScienceOn |