• 정보저장시스템학회:학술대회논문집
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• 2005.10a
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• pp.17-21
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• 2005

High-density image sensors have microlens array to improve photosensitivity. It is conventionally fabricated by reflow process. The reflow process has some weak points. UV imprinting process can be proposed as an alternative process to integrate microlens array on photodiodes. In this study, the UV imprionting process to integrate microlens array on image sensor was developed using W transparent flexible mold and simulated image sensor substrate. The UV transparent flexible mold was fabricated by replicating master pattern using siliconacrylate photopolymer. The releasing property and shape accuacy of siliconacrylate mold was analysed. After UV imprinting process, replication quality and align accuracy was analysed.

• Transactions of the Society of Information Storage Systems
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• v.2 no.2
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• pp.91-95
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• 2006

High-density image sensors rave microlens array to improve photosensitivity. It is conventionally fabricated by reflow process. The reflow process has some weak points. UV imprinting process can be proposed as an alternative process to integrate microlens array on photodiodes. In this study, the UV imprionting process to integrate microlens array on image sensor was developed using UV transparent flexible mold and simulated image sensor substrate. The UV transparent flexible mold was fabricated by replicating master pattern using siliconacrylate photopolymer. The releasing property and shape accuacy of siliconacrylate mold was analysed. After UV imprinting process, replication quality and align accuracy was analysed.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.7 s.184
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• pp.138-145
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• 2006

A nanopatterning technique was proposed and demonstrated for low cost and mass productive process using the scanning probe lithography (SPL) and soft lithography. The nanometer scale structure is fabricated by the localized generation of oxide patterning on the H-passivated (100) silicon wafer, and soft lithography was performed to replicate of nanometer scale structures. Both height and width of the silicon oxidation is linear with the applied voltagein SPL, but the growth of width is more sensitive than that of height. The structure below 100 nm was fabricated using HF treatment. To overcome the structure height limitation, aqueous KOH orientation-dependent etching was performed on the H-passivated (100) silicon wafer. Soft lithography is also performed for the master replication process. Elastomeric stamp is fabricated by the replica molding technique with ultrasonic vibration. We showed that the elastomeric stamp with the depth of 60 nm and the width of 428 nm was acquired using the original master by SPL process.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.316-319
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• 2007

In this paper, high precision molding process was developed using a soft mold to fabricate fine closed-types of the barrier ribs for PDP. A green sheet was employed to fabricate the barrier ribs in this process. The soft mold with good demolding characteristics was replicated from a master mold. An optimal forming load which would not fracture the soft mold was also determined. The barrier ribs of rectangular type with upper width of $30\;{\mu}m$ would be fabricated by this process.

• Proceedings of the Korea Information Processing Society Conference
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• 2014.04a
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• pp.704-707
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• 2014

데이터베이스 복제(Replication)는 데이터의 저장과 백업하는 방법과 관련이 있는 데이터를 호스트 컴퓨터에서 다른 컴퓨터로 복사하는 것이다. 데이터베이스 복제의 종류로는 마스터/슬레이브(Master/Slave), 멀티마스터(Multi-Master)형태가 존재한다. 멀티마스터 데이터베이스는 상당한 비용증가와 복잡도 때문에 어떤 상황에서는 실용적이지 않다. 그러한 이유로 마스터/슬레이브 데이터베이스를 많이 사용한다. 마스터/슬레이브 데이터베이스에서 마스터 데이터베이스는 데이터베이스의 변경을 담당하고 그 결과는 슬레이브로 복제된다. 슬레이브 데이터베이스에서는 읽기 전용 질의만 처리하는 것을 목적으로 한다. 데이터베이스 트랜잭션 처리는 대표적인 횡단 관심사이다. 연구는 마스터/슬레이브 데이터베이스의 트랜잭션을 AOP 를 사용하여 횡단 관심사로 분리하고, 마스터/슬레이브 데이터베이스를 라우팅하는 알고리즘을 제안한다.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.12 no.5
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• pp.16-22
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• 2013

A two-dimensional photonic crystal structure was investigated using a roll-to-roll nanoreplication and physical vapor deposition processes for the inexpensive enhanced fluorescence substrate which is not sensitive to the polarization directions of excitation light source. An 8 inch silicon master having nano dot array with a diameter of 200 nm, a height of 100 nm and a pitch of 400 nm was prepared by KrF laser scanning lithography and reactive ion etching processes. A flexible polymer mold was fabricated by flat type UV replication process and a deposition of 10 nm nickel layer as an anti-adhesion layer. A roll mold was prepared by warping the flexible polymer mold on an aluminum roll base and a roll-to-roll UV replication process was carried out using the roll mold. After the deposition of ~ 100 nm $TiO_2$ layer on the replicated nano dot array, a 2 dimensional photonic crystal structure was realized with a resonance wavelength of 635 nm for both p- and s-polarized light sources.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.22 no.5
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• pp.831-836
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• 2013

This study demonstrates the process of fabricating patterns using tribonanolithography (TNL),with laboratory-made micro polycrystalline diamond (PCD) tools that are attached to an atomic force microscope (AFM). The various patterns are easily fabricated using mechanical scratching, under various normal loads, using the PCD tool on single crystal silicon, which is the master mold for replication in this study. Then, polydimethylsiloxane (PDMS) replica molds are fabricated using precise pattern transfer processes. The transferred patterns show high dimensional accuracy as compared with those of TNL-processed silicon micro molds. TNL can reduce the need for high cost and complicated apparatuses required for conventional lithography methods. TNL shows great potential in that it allows for the rapid fabrication of duplicated patterns through simple mechanical micromachining on brittle sample surfaces.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.676-679
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• 2005

Nano imprint Lithography (NIL) is regarded as one of the next-generation lithography technologies with EUV lithography, immersion lithography, Laser interference lithography. Because a Si wafer stamp and a quartz stamp, used to imprinting usually are very expensive and easily broken, it is suggested that master stamp is duplicated by PDMS and the PDMS stamp uses to imprint .For using the PDMS stamp, a thermally curable monomer resin was used for the imprinting process to lower pressure and temperature. As a result, NIL patterns were successfully fabricated.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.12
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• pp.29-36
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• 2004

In this paper, a new replication technique for a real 3D microstructure was introduced, in which a master Pattern WES made of photo-curable epoxy using a microstereolithography technology, and then it was transferred onto an epoxy-copper particle composite. A helical gear was selected as one of the real 3D microstructure for this study, and it was replicated from a pure epoxy to an epoxy composite. In addition, the transferability of the microreplication process was evaluated, and the properties of :he epoxy composite were compared to that of the pure epoxy, including hardness, wear-resistance and thermal conductivity.

• Journal of the Korean Operations Research and Management Science Society
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• v.21 no.1
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• pp.31-50
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• 1996

In this paper we prescribe a replication server scheme with an algorithm DRF (Differential Refresh File) to refresh multiple materialized views and replicas in distributed environments. Before sending relevant tuples in server sites to client sites, an effective tuple reduction scheme is developed as a preprocessor to reduce the transmission cost. Because it utilizes differential files with out touching base relations, the DRF scheme can help to minimize the number of locks, which enhances the system's performance.