• 세라미스트
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• 제21권1호
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• pp.44-54
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• 2018

Oxide semiconductor has been spotlighted as a channel material of TFTs in AMLCD as an alternative to Si, due to high mobility ( > $5cm^2/Vs$). It is also one of the strong candidates for TFTs in AMOLED because of high bias stability at amorphous phase. Beyond the advantages mentioned above, oxide semiconductor has many strengths such as transparency, low fabrication temperature and relatively low fabrication cost. For those reasons, the application of oxide semiconductor is not limited to display but can be extended to new types of electronics, for example, transient electronics for human implantable devices. From this context, oxide materials that have been used as semiconductor and insulator at transient electronics are investigated respectively, and conductor and substrate candidates are also explained, since transient electronics require systematic consideration beyond individual oxide films.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2004년도 추계학술대회
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• pp.1134-1139
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• 2004

Recently, development of flame control scheme has been hot issues in the combustion engineering. It has been held that flame shape can be controllable by pressure inside combustor. The influence of combustor atmospheric pressure on flame shape was investigated in the present study. The flame shape, flammable limit, flame temperature and nitric oxide emission were measured as functions of combustor atmospheric pressure and equivalence ratio. The reaction region became longer and wider with decreasing combustor atmospheric pressure by direct photography, hence reduction of blow off limit. This tendency was also observed in the mean flame temperature distribution. Nitric oxide emission decreased with decreasing combustor atmospheric pressure. Low NOx combustion is ascribed to wide-spread reaction region in the low atmospheric pressure condition. These results demonstrate that flame shape and nitric oxide emission can be controllable with combustor atmospheric pressure.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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• pp.144-147
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• 2003

Cu+ ions drift diffusion in formal oxide film and SiOCH film for interlayer dielectric is evaluated. The diffusion is investigated by measuring shift in the flatband voltage of capacitance/voltage measurements on Cu gate capacitors after bias temperature stressing. At a field of 0.2MV/cm and temperature $200^{\circ}C,\;300^{\circ}C,\;400^{\circ}C,\;500^{\circ}C$ for 10min, 30min, 60min. The Cu+ ions drift rate of $SiOCH(k=2.85{\pm}0.03)$ film is considerable lower than termal oxide. As a result of the experiment, SiOCH film is higher than Thermal oxide film for Cu+ drift diffusion resistance. The important conclusion is that SiOCH film will solve a causing reliability problems aganist Cu+ drift diffuion in dielectric materials.

• 반도체디스플레이기술학회지
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• 제20권4호
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• pp.1-5
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• 2021

Field-effect transistors based on solution-processed metal oxide semiconductors has attracted huge attention due to their intrinsic characteristics of optical and electrical characteristics with benefits of simple and low-cost process. Especially, spray-pyrolysis has shown excellent device performance which compatible to vacuum-processed Field-effect transistors. However, the high annealing temperature for crystallization of MOS and narrow range of precursors has impeded the progress of the technology. Here, we demonstrated the nc-ZnO/ZnO films performed by spray-pyrolysis with incorporating ZnO nanoparticles into typical ZnO precursor. The films exhibit preserving morphological properties of poly-crystalline ZnO and enhanced electrical characteristics with potential for low-temperature processability. The influence of nanoparticles within the film was also researched for realizing ZnO films providing good quality of performance.

• Transactions on Electrical and Electronic Materials
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• 제13권2호
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• pp.106-109
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• 2012

A low power methane gas sensor with microheater was fabricated by silicon bulk micromachining technology. In order to heat up the sensing layer to operating temperature, a platinum (Pt) micro heater was embedded in the gas sensor. The line width and gap of the microheater was 20 ${\mu}m$ and 4.5 ${\mu}m$, respectively. Zinc oxide (ZnO) nanowhisker arrays were grown on a sensor from a ZnO seed layer using a hydrothermal method. A 200 ml aqueous solution of 0.1 mol zinc nitrate hexahydrate, 0.1 mol hexamethylenetetramine, and 0.02 mol polyethylenimine was used for growing ZnO nanowhiskers. Temperature distribution of the sensor was analyzed by infrared thermal camera. The optimum temperature for highest sensitivity was found to be $250^{\circ}C$ although relatively high (64%) sensitivity was obtained even at as low a temperature as $150^{\circ}C$. The power consumption was 72 mW at $250^{\circ}C$, and only 25 mW at $150^{\circ}C$.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2006년도 추계학술대회
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• pp.368-371
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• 2006

[ $La_{0.8}Sr_{0.2}Co_{1-x}Mn_xO_3$ ] cathode as a high performance cathode on YSZ electrolyte was studied by analyzing impedance spectra. It was shown that cathode property of $La_{0.8}Sr_{0.2}Co_{1-x}Mn_xO_3$ is bet ter than that of$La_{0.8}Sr_{0.2}CoO_3$. At $700^{\circ}C$ in air environment, $La_{0.8}Sr_{0.2}Co_{0.4}Mn_{0.6}O_3$ cathode on CGO- layered YSZ electrolyte showed very low area specific resistance of $0.14{\Omega}cm^2$, which is low enough for intermediate-temperature sol id oxide fuel cells. This is because material properties of ionic conductivity and thermal expansion compatibility with electrolyte were optimized. Judging from activation energy and oxygen part i al pressure dependance of cathode property, it was noted that oxygen surface exchange kinetics is dominantly influential on cathode property in higher temperature region than $700^{\circ}C$ and oxygen self-diffusion in cathode material is more influential in lower temperature region.

• 한국재료학회지
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• 제27권2호
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• pp.63-68
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• 2017

A black nickel oxide powder, one of the commercial nickel oxide ores, was reduced by hydrogen gas in a batch-type fluidized-bed reactor in a temperature range of 350 to $500^{\circ}C$ and in a residence time range of 5 to 120 min. The hydrogen reduction behavior of the black nickel oxide was found to be somewhat different from that of green nickel oxide ore. For the black nickel oxide, the maximum temperature (below which nickel oxide particles can be reduced without any agglomeration) was significantly lower than that observed for the green nickel oxide. In addition, the best curve fittings of the Avrami model were obtained at higher values of the overall rate constant "k" and at lower values of the exponent "m", compared to those values for the green nickel oxide. It may be inferred from these results that the hydrogen reduction rate of the black nickel oxide is faster than that of the green nickel oxide in the early stages, but the situation reverses in the later stages. For the black nickel oxide ore, in spite of the low temperature sintering, it was possible to achieve a high degree fluidized-bed reduction at lower temperatures and at lower gas consumption rates than was possible for the green nickel oxide. In this regard, the use of black nickel oxide is expected to yield a benefit if its ore price is sufficiently lower than that of the green nickel oxide.

• 한국세라믹학회지
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• 제52권5호
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• pp.331-337
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• 2015

$LaBO_3$ (B = Cr, Mn, Fe, Co, and Ni) perovskites, the most common perovskite-type mixed ionic-electronic conductors (MIECs), are promising candidates for intermediate-temperature solid oxide fuel cell (IT-SOFC) cathodes. The catalytic activity on MIEC-based cathodes is closely related to the bulk ionic conductivity. Doping B-site cations with other metals may be one way to enhance the ionic conductivity, which would also be sensitively influenced by the chemical composition of the dopants. Here, using density functional theory (DFT) calculations, we quantitatively assess the activation energies of bulk oxide ion diffusion in $LaBO_3$ perovskites with a wide range of combinations of B-site cations by calculating the oxygen vacancy formation and migration energies. Our results show that bulk oxide ion diffusion dominantly depends on oxygen vacancy formation energy rather than on the migration energy. As a result, we suggest that the late transition metal-based perovskites have relatively low oxygen vacancy formation energies, and thereby exhibit low activation energy barriers. Our results will provide useful insight into the design of new cathode materials with better performance.

• 한국표면공학회지
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• 제37권3호
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• pp.146-151
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• 2004

Indium tin oxide (ITO) is widely used to make a transparent conducting film for various display devices and opto-electric devices. In this study, ITO films on glass substrate were fabricated by inductively coupled plasma (ICP) assisted dc magnetron sputtering. A two-turn rf coil was inserted in the process chamber between the substrate and magnetron for the generation of ICP. The substrates were not heated intentionally. Subsequent post-annealing treatment for as-deposited ITO films was not performed. Low-temperature deposition technique is required for ITO films to be used with heat sensitive plastic substrates, such as the polycarbonate and acrylic substrates used in LCD devices. The surface roughness of the ITO films is also an important feature in the application of OLEDs along with the use of a low temperature deposition technique. In order to obtain optimum ITO thin film properties at low temperature, the depositions were carried out at different condition in changing of Ar and $O_2$ gas mixtures, ICP power. The electrical, optical and structural properties of the deposited films were characterized by four-point probe, UV/VIS spectrophotometer, atomic force microscopy(AFM) and x-ray diffraction (XRD). The electrical resistivity of the films was -l0$^{-4}$ $\Omega$cm and the optical transmittance in the visible range was ＞85%. The surface roughness ( $R_{rms}$) was -20$\AA$.>.

• 한국전기전자재료학회논문지
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• 제20권2호
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• pp.106-112
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• 2007

Advanced back-end processing requires the integration of low-k dielectrics and Cu. However, in the presence of an electric field and a temperature, positive Cu ions may drift rapidly through dielectric and causing reliability problems. Therefore, in this paper, Cu+ drift diffusion in two low-k materials and silicon oxide is evaluated. The drift diffusion is investigated by measuring shifts in the flat band voltage of capacitance-voltage measurements on Cu gate capacitors after bias thermal stressing. The Cu+ drift late in $SiO_{x}C_{y}\;(2.85{\pm}0.03)$ and Polyimide(2.7${\leq}k{\leq}3.0$) is Considerably lower than in thermal oxide.