Novel Low-Temperature Deposition of the $SiO_2$ Thin Film using the LPCVD Method and Evaluation of Its Reliability in the DRAM Capacitors
(LPCVD 방법에 의한 저온 $SiO_2$ 박막의 증착방법과 DRAM 커패시터에서의 그 신뢰성 연구)
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- Journal of the Korea Academia-Industrial cooperation Society
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- v.7 no.3
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- pp.344-349
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- 2006