• 제목/요약/키워드: low oxygen pressure

검색결과 434건 처리시간 0.021초

에어로젤 방한 재킷 착용시의 기류 유무에 따른 생리·심리학적 특성 분석 (An Analysis of the Physiological and Psychological Responses Elicited When Wearing an Aerogel Cold Protective Jacket in Airflow)

  • 김성숙;손수영;김희은
    • Human Ecology Research
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    • 제62권2호
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    • pp.317-326
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    • 2024
  • This study evaluated the thermal physiological and psychological responses elicited when wearing cold protective jackets with aerogel fillings in two cold environments, one without air velocities and one with air velocities (2.3 m·s-1), at an air temperature of 10℃. The participants were five healthy young males. Measures were taken of physiological parameters, blood pressure (BP), heart rate (HR), core temperature, oxygen uptake (Vo2), and microclimate (temperature and humidity). The psychological parameters evaluated were thermal and wetness sensation. No differences were observed in systolic blood pressure, heart rate, and oxygen intake between the conditions. At tympanic temperature, a significant difference was observed between the conditions during exercise (p<.05); . A significant difference was observed in the microclimate temperature of the clothing according to the airflow, and temperature changes in the chest and back revealed different patterns. Significant differences were observed in thermal sensation (whole body (p<.05), chest (p<.05), back (p<.01)) between airflow conditions. The results therefore indicate that cold protective jackets with an aerogel filling are suitable for people operating in low-temperature and airflow environments.

Oxygen Vacancy Effects of Two-Dimensional Electron Gas in SrTiO3/KNbO3 Hetero Structure

  • Choi, Woo-Sung;Kang, Min-Gyu;Do, Young-Ho;Jung, Woo-Suk;Ju, Byeong-Kwon;Yoon, Seok-Jin;Yoo, Kwang-Soo;Kang, Chong-Yun
    • 센서학회지
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    • 제22권4호
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    • pp.244-248
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    • 2013
  • The discovery of a two-dimensional electron gas (2DEG) in $LaAlO_3$ (LAO)/$SrTiO_3$ (STO) heterostructure has stimulated intense research activity. We suggest a new structure model based on $KNbO_3$ (KNO) material. The KNO thin films were grown on $TiO_2$-terminated STO substrates as a p-type structure ($NbO_2/KO/TiO_2$) to form a two-dimensional hole gas (2DHG). The STO thin films were grown on KNO/$TiO_2$-terminated STO substrates as an n-type structure to form a 2DEG. Oxygen pressure during the deposition of the KNO and STO thin films was changed so as to determine the effect of oxygen vacancies on 2DEGs. Our results showed conducting behavior in the n-type structure and insulating properties in the p-type structure. When both the KNO and STO thin films were deposited on a $TiO_2$-terminated STO substrate at a low oxygen pressure, the conductivity was found to be higher than that at higher oxygen pressures. Furthermore, the heterostructure formed at various oxygen pressures resulted in structures with different current values. An STO/KNO heterostructure was also grown on the STO substrate, without using the buffered oxide etchant (BOE) treatment, so as to confirm the effects of the polar catastrophe mechanism. An STO/KNO heterostructure grown on an STO substrate without BOE treatment did not exhibit conductivity. Therefore, we expect that the mechanics of 2DEGs in the STO/KNO heterostructures are governed by the oxygen vacancy mechanism and the polar catastrophe mechanism.

Effect of the oxygen flow ratio on the structural and electrical properties of indium zinc tin oxide (IZTO) films prepared by pulsed DC magnetron sputtering

  • Son, Dong-Jin;Nam, Eun-Kyoung;Jung, Dong-Geun;Ko, Yoon-Duk;Choi, Byung-Hyun;Kim, Young-Sung
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.168-168
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    • 2010
  • Transparent conduction oxides (TCOs) films is extensively reported for optoelectronic devices application such as touch panels, solar cells, liquid crystal displays (LCDs), and organic light emitting diodes(OLEDs). Among the many TCO film, indium tin oxide(ITO) is in great demand due to the growth of flat panel display industry. However, indium is not only high cost but also its deposits dwindling. Therefore, many studies are being done on the transparent conductive oxides(TCOs). We fabricated a target of IZTO(In2O3:ZnO:SnO2=70:15:15 wt.%) reduced indium. Then, IZTO thin films were deposited on glass substrates by pulsed DC magnetron sputtering with various oxygen flow ratio. The substrate temperature was fixed at the room temperature. We investigated the electrical, optical, structural properties of IZTO thin films. The electrical properties of IZTO thin films were dependent on the oxygen partial pressure. As a result, the most excellent properties of IZTO thin films were obtained at the 3% of oxygen flow rate with the low resistivity of $7.236{\times}10^{-4}{\Omega}cm$. And also the optical properties of IZTO thin films were shown the good transmittance over 80%. These IZTO thin films were used to fabricated organic light emitting diodes(OLEDs) as anode and the device performances studied. The OLED with an IZTO anode deposited at optimized deposition condition showed good brightness properties. Therefore, IZTO has utility value of TCO electrode although it reduced indium and we expect it is possible for the IZTO to apply to flexible display due to the low processing temperature.

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Mechanisms of $Cl_2$ Molecules Dissociation in a Gas Discharge Plasma in Mixtures with Ar, $O_2.N_2$

  • Efremov, A.M.;Kwon, Kwang-Ho
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제1권4호
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    • pp.197-201
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    • 2001
  • The influence of argon, oxygen, and nitrogen admixtures on the dissociation of $Cl_2$ molecules in a glow discharge low-temperature plasma under the constant pressure conditions was investigated. For $Cl_2/Ar$ and $Cl_2/O_2$mixtures, the concentration of chlorine atoms was observed to be a practically constant at argon or oxygen concentrations up to 50%. This invariability is a most pro bably explained by relative increase in rate of $Cl_2$ direct electron impact dissociation due to the changes in electrophysical parameters of plasma such as EEDF, electron drift rate and mean energy. For all the considered mixtures, the contribution of stepwise dissociation involving active species from gas additives (metastable atoms and molecules, vibrationally excited molecules) was found to be negligible.

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摩찰加工 에 있어서의 분위기 영향 에 관한 硏究 제3보 (A Study On The Influence of Atmospheres in Frictional Machining)

  • 손명환
    • 대한기계학회논문집
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    • 제6권3호
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    • pp.261-270
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    • 1982
  • In the previously reported Part I and Part II, the experimental results in the frictional machining under liquid atmospheres to obtain the best surface roughness were showed. In the present study the frictional machining was carried out in gas atmospheres such as air, oxygen, dioxide carbon and argon, and in solid lubricant atmosphere of graphite powder. The results were compared with those of Part I and Part II. The material to be tested and machining conditions were made identical with Part I and Part II. The best surface roughness obtained in the above gas and solid lubricant atmospheres was worse than the liquid atmospheres but the contact pressure to minimize the surface roughness was considerably low. The best surface roughness in the present study was obtained in the atmospheres of dioxide carbon and graphite powder and the worst one was in oxygen and argon gas.

Resistivity Variation of Nickel Oxide by Substrate Heating in RF Sputter for Microbolometer

  • Lee, Yong Soo
    • 센서학회지
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    • 제24권5호
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    • pp.348-352
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    • 2015
  • Thin nickel oxide films formed on uncooled and cooled $SiO_2/Si$ substrates using a radio frequency (RF) magnetron sputter powered by 200 W in a mixed atmosphere of argon and oxygen. Grazing-incidence X-ray diffraction and field emission scanning electron microscopy are used for the structural analysis of nickel oxide films. The electrical conductivity required for better bolometric performance is estimated by means of a four-point probe system. Columnar and (200) preferred orientations are discovered in both films regardless of substrate cooling. Electric resistivity, however, is greatly influenced by the substrate cooling. Oxygen partial pressure increase during the nickel oxide deposition leads to a rapid decrease in resistivity, and the resistivity is higher in the cooled nickel oxide samples. Even when small microstructure variations are applied, lower resistivity in favor of low noise performance is acquired in the uncooled samples.

Ionic Conductivity of Solid Solution Ceramics in The System of Stabilized ZrO2 Prepared by Self-Propagating High-Temperature Synthesis

  • Soh, Deawha;Korobova, N.
    • 한국전기전자재료학회논문지
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    • 제15권4호
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    • pp.349-355
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    • 2002
  • The ionic conductivity of cubic solid solutions in the systems of CaO-$ZrO_2$, $Y_2O_3-ZrO_2$ prepared by SHS was examined. The higher conductivity appears to be related to a lower activation energy rather than to the number of oxygen vacancies dictated by composition. Conductivity-temperature data was obtained at 1000 $^{\circ}C$ in atmosphere of low oxygen partial pressure (~$10^{-40}$ atm) for $Y_2O_3-ZrO_2$ cubic solid solutions. The data indicated that these materials could be reduced, and the decree of reduction would be related with the measuring electric field.

Electrical Breakdown in Flames

  • Han, S.Uhm
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.187-187
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    • 2000
  • Properties of electrical discharge in flames are investigated by making use of the ionization cross section of air. Fames have three distictive features. They are hot, emit light and are weakly ionized. We investigate influence of these three characteristics of flames on the electrical breakdown. It is found that the breakdown electric field in flames is inversely proportional to the flame temperature, thereby easily generating plasmas in flames. A swarm of low-energy electrons in flames would allow significant population of electronically excited states of flame molecules to be formed. Therefore, the analysis shows that the electronic excitation of flame molecules may also considerably reduce the breakdown field. Plasma electrons generate atomic oxygens by the electron attachment of oxygen molecules in high-pressure flames. These oxygen atoms are the most reactive radicals in flames for material oxidation. How are you and your family in this new year\ulcorner Professor Choi! I plan to go back Korea on February 6. All my family members are fine and have good time because I am here. Once I am in Korea, I will call you. I am always grateful for your helpful hand. Thank you so much.

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