• 제목/요약/키워드: low leakage

검색결과 1,336건 처리시간 0.034초

$O_2$RTA 방법으로 제조된 $Ta_2O_{5-x}$ 박막의 전기적 특성 (A Study on Electrical Properties of $Ta_2O_{5-x}$ Thin-films Obtained by $O_2$ RTA)

  • 김인성;송재성;윤문수;박정후
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제51권8호
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    • pp.340-346
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    • 2002
  • Capacitor material utilized in the downsizing passive devices and integration of passive devices requires the physical and electrical properties at given area such as capacitor thickness reduction, relative dielectric constant increase, low leakage current and thermal stability. common capacitor materials, $Al_2O_3$, $SiO_2$, $Si_3N_4$, $SiO_2$/$Si_3N_4$, TaN and et al., used until recently have reached their physical limits in their application to integration of passive devices. $Ta_2O_{5}$ is known to be a good alternative to the existing materials for the capacitor application because of its high dielectric constant (25~35), low leakage current and high breakdown strength. Despite the numerous investigations of $Ta_2O_{5}$ material, there have little been established the clear understanding of the annealing effect on capacitance characteristic and conduction mechanism. This study presents the dielectric properties $Ta_2O_{5}$ MIM capacitor structure Processed by $O_2$ RTA oxidation. X-ray diffraction patterns showed the existence of amorphous phase in $600^{\circ}C$ annealing under the $O_2$ RTA and the formation of preferentially oriented-$Ta_2O_{5}$ in 650, $700^{\circ}C$ annealing and the AES depth profile showed $O_2$ RTA oxidation effect gives rise to the $O_2$ deficientd into the new layer. The leakage current density respectively, at 3~1l$\times$$10_{-2}$(kV/cm) were $10_{-3}$~$10_{-6}$(A/$\textrm{cm}^2$). In addition, behavior is stable irrespective of applied electric field. the frequency vs capacitance characteristic enhanced stability more then $Ta_2O_{5}$ thin films obtained by $O_2$ reactive sputtering. The capacitance vs voltage measurement that, Vfb(flat-band voltage) was increase dependance on the $O_2$ RTA oxidation temperature.

BaTiO$_3$ 분말의 입자 크기가 내장형 커패시턴용 에폭시/BaTiO$_3$복합체 필름의 유전상수와 누설전류에 미치는 영향에 관한 연구 (Study on the Effects of BaTiO$_3$ Particle Size on Dielectric Constant and Leakage Current of Epoxy/BaTiO$_3$ Composite Films for Embedded Capacitors)

  • 조성동;이주연;백경욱
    • 마이크로전자및패키징학회지
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    • 제9권2호
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    • pp.11-17
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    • 2002
  • 폴리머/세라믹 복합체는 내장형 커패시터(embedded capacitor)의 유전 재료로 많은 관심을 불러 일으키고 있다. 본 논문은 bisphenol-A타입의 에폭시와 직경 0.1~0.9$mu \textrm{m}$의 크기가 다른 6가지 종류의 $BaTiO_3$분말을 이용하여 스핀코팅 방법으로 도포된 epoxy/$BaTiO_3$composite film의 유전상수와 누설전류에 미치는 분말 크기의 영향에 관한 것이다. 전체적으로 $BaTiO_3$입자가 67 vo1% 함유된 Epoxy/$BaTiO_3$composite 필름의 유전상수는 사용한 $BaTiO_3$분말의 크기가 커짐에 따라 증가하였다. 이것은 입자의 크기가 증가함에 따른 입자의 유전상수의 증가 때문이며, XRD분석을 통해 입자의 크기가 증가함에 따라 tetragonality가 증가함을 확인하였다. 복합체 필름의 누설전류도 또한 사용한 입자의 크기가 커짐에 따라 증가하였다. 이와 같은 현상의 원인은 분말의 크기가 증가함에 따라 단위길이 당 입자의 수가 감소하여 전위 장벽의 수가 줄어들고 하나의 전위 장벽에 걸리는 바이어스의 증가로 인한 전위장벽 낮춤 효과의 증대에 따른 것으로 판단된다. 이상의 결과를 토대로 볼 때 큰 입자의 분말을 사용할 때 높은 유전상수를 얻을 수 있는 반면 필름의 누설전류가 커지는 단점을 가지고 있음을 알 수 있었으며, 작은 크기의 분말은 이와 반대이다. 따라서 높은 유전상수와 낮은 누설전류 두 특성간의 절충이 요청되며 필요에 따라 적절한 크기의 분말 선택이 중요함을 알 수 있었다.

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톨루엔 누출 시 대기확산 및 화재가능성에 관한 수치해석 연구 (Numerical Study on Atmospheric Dispersion and Fire Possibility in Toluene Leakage)

  • 고재선;김주석
    • 한국화재소방학회논문지
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    • 제31권3호
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    • pp.1-10
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    • 2017
  • 본 연구는 안전시설이 없는 위험물저장시설에서 위험물을 취급시 발생할 수 있는 사고에 대한 위험성을 알아보고자 했다. 불법위험물 운반용기는 화재가 발생할 경우 연소속도가 매우 빨라 폭발로 이어져 피해가 크며 진화하기도 어렵다. 또한 인화성 액체위험물에서 발생하는 사고는 누출로 인해 공간에서 발생하는 사고가 대부분을 차지하고 있다. 따라서 이러한 사고에 대한 영향을 주는 변수를 도출했고, 이 변수들이 미치는 영향을 알아보고자 했다. 수치해석 및 전산유체역학프로그램을 이용해서 해석해 본 결과 다음과 같은 최종결과를 얻을 수 있었다. 먼저 특정 공간에 인화성액체가 누출되었을 때 특정농도(연소하한계)가 될 때까지의 온도와 상대습도의 영향을 받고, 온도의 경우 인화점 이상에서는 인화점 이하에서보다 도달시간이 짧아지는 것을 알 수 있었다. 또한 누출로 인한 저장탱크의 Pool Fire사고에 미치는 변수의 영향의 정도는 다소 차이가 있으나 주로 가장 큰 영향을 미치는 변수는 풍속으로 나타났다. 따라서 향후 본 연구를 통해서 유사한 수치해석적인 연구의 기초자료로 활용될 수 있을 것이고. 다양한 연구조건에서 위험물질이 누출되는 사고에 대해서 유용한 수치해석적인 정보를 제공할 수 있을 것으로 기대한다.

작업 강도가 방진 마스크의 밀착도와 감성품질에 미치는 영향 (Effect of Work Intensity on Fit Factor and Affecive Quality of Dustproof Mask)

  • 이진실;조선희;윤정민;김민선;박재규;최재호
    • 품질경영학회지
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    • 제46권2호
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    • pp.301-310
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    • 2018
  • Purpose: The purpose of this study is to investigate the effect of work intensity on fit factor and affective quality of the dustproof Background: Among the victims who suffer pneumoconiosis due to the inhalation of toxic substances or the lack of oxygen during the work, the proportion of the victims is larger than the other causes. Wearing a respirator may prevent pneumoconiosis, but it can be hazardous to workers because of the leakage through filters, cartridges, exhaust valves, broken parts, and face-to-face contact. Despite leakage through the contact area between the mask and the face has various causes such as the wearer's activity, sweat accumulation, facial shape, etc., There is a lack of relevant research and regulation compared to developed countries that have already institutionalized the law 30 years ago and give the right to sell through a test Method: The work intensity was adjusted by walking or running at 6km/h and 11km/h on the treadmill, and tasks were defined with reference to the test procedure and the exercise sequence applied in the face leakage test of the dustproof mask. And fit factor was measured objectively using 'Respirator Fit Tester 8038' which measures fit factor calculated by dividing the number of dust present outside the mask by inside the mask. In addition, affective quality was classified by the ease of use, ease of breathing, and ease of wearing, and was measured using the 5-point likert scale questionnaire. Results: There was a significant difference in fit factor, ease of breathing, and wearing convenience according to work intensity and no significant difference in ease of use(${\alpha}=0.01$). And when the work intensity was high, fit factor, ease of breathing, and wearing convenience were all lower than when the work intensity was low. Conclusion: In Korea, it is necessary to consider consideration of the work intensity when testing the leakage rate of the face part for safety certification of the respiratory protective equipment, When developing a mask, it should be possible to maintain high adhesion even under intense, active situation and high temperature conditions by selecting materials, improving the wearing style, and expanding the adjustable range.

자발성 두개강내압 저하증 (Spontaneous Intracranial Hypotension)

  • 공두식;김종수;박관;남도현;어환;홍승철;신형진;김종현
    • Journal of Korean Neurosurgical Society
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    • 제29권2호
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    • pp.240-248
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    • 2000
  • Objective : Spontaneous intracranial hypotension is a rarely reported syndrome of spontaneous postural headache associated with low CSF pressure and has rarely been demonstrated radiographically or surgically. But recently, it is being recognized with increasing frequency. The purpose of this study was to characterize clinical and imaging features, etiologic factors, and outcome in the spontaneous intracranial hypotension. Patients and Methods : We reviewed our experience with documented cases of spontaneous intracranial hypotension in 5 consecutive patients with orthostatic headaches from April 1998 to April 1999. Results : The mean age was 41 years(from 35 to 49 years). All patients had postural headaches, which were completely alleviated by recumbency position. Nausea, neck pain, horizontal diplopia, photophobia, and blurred vision were noted in some of the patients. Brain MRI showed diffuse pachymeningeal gadolinium enhancement, subdural collections of fluid, and descent of the brain. The opening pressure from lumbar puncture was $4cmH_2O$ or less in three of five patients whereas the opening pressure was within normal range in two patients. All patients underwent radioisotope cisternography and computerized tomographic myelography. On radioisotope cisternography, CSF leakage was suspected at the level of cervical area(1 patient), upper thoracic area(2 patients), mid-thoracic area(1 patient). Computed tomography myelography revealed extraarachnoid accumulation of contrast media(compatible finding with CSF leakage) at the level of cervical or thoracic area. In all patients, the symptoms resolved in response to supportive measures or epidural blood patch(1 patient). Conclusion : Spontaneous spinal CSF leakage is increasingly recognized as a cause of spinal postural headache. Most CSF leaks are located at the cervicothoracic junction or in the thoracic spine and can be demonstrated by variable diagnostic method. The condition is usually self-limiting and its prognosis is typically good.

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Chemical Solution Deposition 방법을 이용한 BiFeO3/Pb(Zr0.52Ti0.48)O3 다층박막의 전기적 특성에 대한 연구 (Ferroelectric, Leakage Current Properties of BiFeO3/Pb(Zr0.52Ti0.48)O3 Multilayer Thin Films Prepared by Chemical Solution Deposition)

  • 차정옥;안정선;이광배
    • 한국진공학회지
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    • 제19권1호
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    • pp.52-57
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    • 2010
  • $BiFeO_3(BFO)/Pb(Zr_{0.52}Ti_{0.48})O_3$(PZT) bilayer와 multilayer의 다층구조를 만들어 전기적 특성을 측정하여 같은 두께의 BFO 단층박막과 비교해 보았다. BFO와 PZT 용액을 이용하였으며 chemical solution deposition 방법으로 Pt/Ti/$SiO_2$/Si(100) 기판위에 각 박막을 증착하였다. X-ray diffraction 분석을 통해 모든 박막이 다배향(multi-orientation) 페로브스카이트 (perovskite) 구조를 가졌음을 확인하였다. BFO/PZT Bilayer와 multilayer 박막들은 BFO 단층박막의 비해 누설전류 값이 500 kV/cm에서 약 4, 5차수 정도 감소했으며, 이로 인해 BFO/PZT 다층박막의 강유전체 특성이 크게 향상되었다. BFO/PZT multilayer 다층구조 박막의 경우 안정된 이력곡선(hysteresis loop)을 나타냈으며, 잔류 분극(remanent polarization)의 값은 $44.3{\mu}C/cm^2$이었으며, 항전계($2E_c$) 값은 681.4 kV/cm였다.

제 2급 와동에서 구치부 복합레진의 미세변연누출에 관한 연구 (MICROLEAKAGE OF POSTERIOR PACKABLE COMPOSITE RESIN hi THE GINGIVAL MARGINS OF CLASS II CAVITIES)

  • 최수진;김미자;권혁춘
    • Restorative Dentistry and Endodontics
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    • 제27권3호
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    • pp.249-256
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    • 2002
  • The use of flowable composite resins as liners in class II packable composite restoration has been suggested by some manufacturers. However, the contributions of this technique are unproven. The purpose of this study was to compare the gingival microleakage in class II packable composite restorations with or without the use of flowable composite resins as liners. Slot cavities were prepared on both proximals of 80 extracted human molars and randomly assigned to 8 groups of 20 each. The gingival margins were located at 1mm above CEJ in 80 cavities (group1-4) and 1mm below CEJ in 80 cavities (group5-8). The prepared teeth were mounted in the customized tray with adjacent teeth to simulate clinical conditions and metallic matrix band (Sectional matrix) and wooden wedges were applied. After acid etching and application of Single Bond, each group was restored with the following materials using incremental placement technique: Group 1,5 (Filtek P60), group 2, 3, 4 and group 6, 7, 8 (AeliteFlo, TetricFlow, Revolution/ Filtek P60). All specimens were thermocycled 500 times between 5$^{\circ}C$ and 55$^{\circ}C$ with 1 mimute dwell time, immersed 2% methylene blue dye for 24 hours and then rinsed with tab water. The specimens were embedded in clear resin and sectioned longitudinally through the center of restoration with a low speed diamond saw. Dye penetration at gingival margin was viewed at 20 magnification and analyzed on a scale of 0 to 4. Kruscal-Wallis One way analysis and Mann-Whitney Rank sum test were used to analyze the results. The results of this study were as follows. 1. The leakage values seen at the enamel margin were significantly lower than those seen at the dentin margin(P<0.05). 2. On the enamel margin, packable composite resins with flowable liners showed lower leakage than those without flowable liners, but there were no significant differences among the four groups(P>0.05). 3. On the dentin margin, four groups demonstrated moderate to severe leakage, and there were no significant differences in leakage values(P>0.05).

저선량 감마선 조사가 벼 유묘의 염 스트레스 경감에 미치는 영향 (Effects of Low Dose Gamma-irradiation on Alleviation of Salt Stress in Rice (Oryza sativa L.) Seedling)

  • 백명화;김진홍;위승곤;이인중;이규성;김재성
    • 한국환경농학회지
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    • 제24권2호
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    • pp.153-158
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    • 2005
  • 염 스트레스 하에서 벼 생육에 대한 저선량 방사선의 경감효과를 확인하기 위해 일품벼와 간척벼 두 품종에 저선량 감마선을 0-32 Gy 수준으로 조사하였다. 염 처리에 따른 생장반응은 무 처리구에 비해 두 품종 모두 염 처리구에서 생육이 감소하였으며, 초장과 생체중보다 건물중에서 더 많은 감소를 보였다. 이외에도 초기건량에 대한 단위시간당 건물의 증가를 나타내는 상대생장율을 관찰한 결과, 전체 상대생장율이 염 처리구에서 50% 이상 억제되었다. 그러나 이러한 생육억제는 저선량 방사선에 의해 경감됨을 확인할 수 있었다. 특히, 줄기 상대생장율의 경우 염 처리시 4 Gy 조사구가 대조구보다 30% 이상의 경감효과를 보였다. 또한 염 스트레스에 대한 조직의 막투과성 정도는 염 처리에 의해 4배 정도 피해를 보였으나 4 Gy 조사구에서 10% 이상의 경감효과를 보였으며, 상대수분함량도 30% 정도의 감소를 보인 염 처리구에서 저선량 방사선의 효과를 확인 할 수 있었다. 이러한 결과를 통해, 저선량 방사선이 염 스트레스에 대한 저해 효과를 경감시키는 것으로 사료된다.

광중합 복합레진 수복시 여러 광조사 방법에 따른 미세변연누출에 관한 연구 (MICROLEAKAGE OF CL V COMPOSITE RESTORATIONS USING VARIOUS LIGHT CURING METHODS)

  • 양철영;유현미;권혁춘
    • Restorative Dentistry and Endodontics
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    • 제25권2호
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    • pp.299-308
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    • 2000
  • The purpose of this in vitro study was to evaluate the microleakage of 5 curing methods in class V composite restorations which are composed of two-step light curing, pulse-delay cure, low curing-light intensity, moderate curing-light intensity and high curing-light intensity. In this study, class V cavities were prepared on buccal and lingual surfaces of 50 extracted human upper or lower molars on cementum margin. Single Bond adhesive and Z-100 shade A2 were applied for each group following the manufacture's instruction. The experimental teeth were randomly divided into 5 groups of 10 samples (20 surfaces) each. Group 1: two-step light curing; Group 2: pulse-delay cure; Group 3: low curing-light intensity; Group 4: moderate curing-light intensity; Group 5: high curing-light intensity. After 500 thermocycling between $5^{\circ}C$ and $55^{\circ}C$, the 60 teeth were placed in 2% methylene blue dye for 24 hours, then rinsed with tab water. The specimens were embedded in clear resin, then sectioned buccolingually through the center of restoration with a low speed diamond saw. The dye penetration on each of the specimen was then observed with a stereomicroscope at ${\times}20$. The composite resin/tooth interfaces were examined under Scanning Electron Microscopy. The results were statistically analyzed using the Kruskal-Wallis One Way ANOVA and Dunn's Method. The results of this study were as follows. 1. In all groups, the leakage values seen at the enamel margin were significantly lower than those seen at the dentin margin(P<0.05). 2. No group in this study showed significant differences in leakage values at both the enamel and the dentin margins(P<0.05). 3. In all groups, the gaps seen at the enamel margin were significantly lower than those seen at the dentin margin(P<0.05). 4. The gaps in this study showed significant differences and two-step light-curing and low curing-light intensity produced significant less gap than high curing-light intensity(P<0.05).

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NiCr 박막 저항계의 열적 안정성에 관한 연구 (The Study on Thermal Stability of NiCr Thin-films Resistor)

  • 김인성;정순종;김도한;송재성
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2001년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.168-170
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    • 2001
  • The NiCr is an important material for present thin-film resistor application owing to its low TCR and thermal stability. In this work, the NiCr thin films were deposited on corning glass substrate by reactive magnetron sputtering and the annealing at temperatures range from 300 to $500^{\circ}C$ for 20 min in vacuum. X-ray, AFM, $R_s$(surface leakage current) have been used to study the structural and electrical properties of the NiCr thin films. The high precision NiCr thin films resistor with TCR(temperature coefficient of resistance) of less then 10 ppm/$^{\circ}C$ was obtained under in in-situ annealing at $300^{\circ}C$ on Cr buffer layer substrate. It is clear that the NiCr thin-films resistor electrical properties are low TCR related with it's annealing and buffer layer condition. NiCr thin film resistor having a good thermal stability and low TCR properties are expected for the application to the dielectric material of passive component.

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