• Title/Summary/Keyword: lifetime function

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Risk Assessment for Metalworking Fluids and Respiratory Outcomes

  • Park, Robert M.
    • Safety and Health at Work
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    • v.10 no.4
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    • pp.428-436
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    • 2019
  • Background: Metalworking fluids (MWFs) are mixtures with inhalation exposures as mists, dusts, and vapors, and dermal exposure in the dispersed and bulk liquid phase. A quantitative risk assessment was performed for exposure to MWF and respiratory disease. Methods: Risks associated with MWF were derived from published studies and NIOSH Health Hazard Evaluations, and lifetime risks were calculated. The outcomes analyzed included adult onset asthma, hypersensitivity pneumonitis, pulmonary function impairment, and reported symptoms. Incidence rates were compiled or estimated, and annual proportional loss of respiratory capacity was derived from cross-sectional assessments. Results: A strong healthy worker survivor effect was present. New-onset asthma and hypersensitivity pneumonitis, at 0.1 mg/㎥ MWF under continuous outbreak conditions, had a lifetime risk of 45%; if the associated microbiological conditions occur with only 5% prevalence, then the lifetime risk would be about 3%. At 0.1 mg/㎥, the estimate of excess lifetime risk of attributable pulmonary impairment was 0.25%, which may have been underestimated by a factor of 5 or more by a strong healthy worker survivor effect. The symptom prevalence associated with respiratory impairment at 0.1 mg/㎥ MWF was estimated to be 5% (published studies) and 21% (Health Hazard Evaluations). Conclusion: Significant risks of impairment and chronic disease occurred at 0.1 mg/㎥ for MWFs in use mostly before 2000. Evolving MWFs contain new ingredients with uncharacterized long-term hazards.

A study on the electromigration phenomena in Al-1%Si thin film interconnections with Ti underlayers (Ti underlayer를 갖는 AI-1%Si 박막배선에서의 일렉트로마이그레이션 현상에 관한 연구)

  • 유희영;김진영
    • Journal of the Korean Vacuum Society
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    • v.8 no.1
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    • pp.31-35
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    • 1999
  • In this paper, the lifetime dependence as a function of the line length of Al-1%Si thin film interconnections due to electromigration in semiconductor devices was studied. Al-1%Si thin film interconnections with a pattern of straight type were formed by using a standard photolithography process. The test patterns manufactured have line lengths in the range of 100 to 1600 $mu extrm{m}$. Al-1%Si thin film interconnections with Ti underlayers showed longer lifetime than those without Ti underlayers. Ti underlayers are believed to improve electromigration resistance resulting in a longer lifetime in Al-1%Si thin film interconnections. The dependence of lifetime on the line length in Al-1%Si/Ti thin film interconnections shows a saturation tendency near 800 $\mu\textrm{m}$ line length.

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Localized Path Selection Algorithm for Energy Efficiency and Prolonging Lifetime in Ad-Hoc Networks (에드 혹 네트워크에서 에너지 효율성과 네트워크 수명 연장을 위한 지역적 경로 선택 알고리즘)

  • Lee, Ju-Young
    • Journal of the Korea Society of Computer and Information
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    • v.15 no.6
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    • pp.65-72
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    • 2010
  • In ad-hoc network, the technique to efficiently consume the limited amounts of energy is an important issue since the wireless terminal node is operated on batteries as their energy resource. In order to extend the system lifetime, through a balanced energy consumption, we must delay the situation in which a particular terminal node's energy is depleted and results in system disconnection. Also, the link, which has low reliability due to the mobility of the node, should be avoided considering the key element when setting up the route. The proposed CMLR method in this paper enables to increase the efficiency of energy consumption with a new cost function considering the residue energy of node, error rate of link, and transmission energy consumption. This method is extending the network lifetime and increasing the energy efficiency by compromising the value between the minimization of the transmission energy consumption and maximization of the node's lifetime. Through the simulations the proposed CMLR algorithm was verified by showing better performance over the conventional methods in terms of network lifetime and path efficiency.

Estimation of Mean Residual Life Function for a Coherent System (코히어런트 시스템에서 평균잔여수명함수(平均殘餘壽命函數)의 추정(推定))

  • Park, Byung-Gu
    • Journal of the Korean Data and Information Science Society
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    • v.4
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    • pp.97-107
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    • 1993
  • In this paper we propose a nonparametric estimator of the men residual life function (MRLF) on a coherent system under the condition that the component lifetimes are censored by system lifetime. It is shown that the proposed estimator, considered as a function of age t, converges weakly to a Gaussian process on a fixed interval. A consistent estimator of asymptotic variance of the proposed estimator is also given.

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Edgeworth Expansion and Bootstrap Approximation for Survival Function Under Koziol-Green Model

  • Kil Ho;Seong Hwa
    • Communications for Statistical Applications and Methods
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    • v.7 no.1
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    • pp.233-244
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    • 2000
  • Confidence intervals for survival function give useful information about the lifetime distribution. In this paper we develop Edgeworkth expansions as approximation to the true and bootstrap distributions of normalized nonparametric maximum likelihood estimator of survival function in the Koziol-Green model and then use these results to show that the bootstrap approximations have second order accuracy.

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Likelihood Function of Order Statistic with a Weibull Distribution (와이벌분포를 갖는 순위설계량의 우도함수)

  • Seo Nam-Su
    • Journal of the military operations research society of Korea
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    • v.9 no.2
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    • pp.39-43
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    • 1983
  • In this paper, we derive the likelihood function for the independent random order statistic whose underlying lifetime distribution is a two parameter Weibull form. For this purpose we first discuss the order statistic which represent a characteristic feature of most life and fatigue tests that they give rise to ordered observations. And, we describe the properties of the underlying Weibull model. The derived likelihood function is essential for establishing the statistical life test plans in the case of Weibull distribution using a likelihood ratio method.

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A Probability-based Clustering Protocol for Data Dissemination in Wireless Sensor Networks (무선 센서 네트워크에서 확률 기반의 클러스터링을 이용한 계층적 데이터 전송 프로토콜)

  • Kim, Moon-Seong;Cho, Sang-Hun;Lim, Hyung-Jin;Choo, Hyun-Seung
    • Journal of Internet Computing and Services
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    • v.10 no.2
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    • pp.153-160
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    • 2009
  • One of the major challenges of designing a dissemination protocol for Wireless Sensor Networks(WSNs) is energy efficiency. Recently, this issue has received much attention from the research community, and SPMS, which outperforms the well-known protocol SPIN, specially is a representative protocol. In addition, one of many characters of SPMS is the use of the shortest path to minimize the energy consumption. However, since it repeatedly uses the same path as the shortest path, the maximizing of the network lifetime is impossible, though it reduces the energy consumption. In this paper, we propose a dissemination protocol using probability-based clustering which guarantees energy-efficient data transmission and maximizes network lifetime. The proposed protocol solves the network lifetime problem by a novel probability function, which is related to the residual energy and the transmission radius between nodes. The simulation results show that it guarantees energy-efficient transmission and moreover increases the network lifetime by approximately 78% than that of SPMS.

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A Study of the reduction of Microscratch using Filter in oxide chemical Mechanical Polishing(CMP) Process (Oxide CMP 공정에서 Slurry Filter을 사용한 Microscratch 감소에 관한 연구)

  • Kim, Sang-Yong;Seo, Yong-Jin;Kim, Tae-Hyung;Lee, Woo-Sun;Chung, Hun-Sang;Kim, Chang-Il;Chang, Eui-Goo
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1888-1890
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    • 1999
  • In this work, we have systematically studied the effects of filtration and the defect trend as a function of polished wafer count using various filters in Inter-Metal Dielectric(IMD) CMP. The filter Installation in CMP polisher makes defect reduced after IMD CMP. As a result of formation micro-scratches, it shows that slurry filter plays an important role in determining consumable pad lifetime. The filter lifetime is dominated by the defects. We have acknowledged slurry filter lifetime is fixed by the degree of generating defects.

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Optimum Life-Cycle Cost-Effective Seismic Design for Continuous PSC Bridges Considering Lifetime Expected Seismic Risks (구조 수명간 지진위험도를 고려한 연속 PSC교의 LCC 최적 내진설계)

  • Cho Hyo Nam;Lee Kwang Min;Park Kyung Hoon;Kim Pyung Seok
    • Proceedings of the Korea Concrete Institute Conference
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    • 2004.05a
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    • pp.720-723
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    • 2004
  • This study is intended to propose a systematic approach for determining optimum Life-Cycle Cost (LCC)-effective seismic design for continuous PSC bridges considering lifetime expected seismic risks. In the paper, a set of cost function for LCC analysis of bridges is proposed. The total LCC functions consist of initial cost and direct/indirect damage costs considering repair/replacement costs, human losses and property damage costs, road user costs, and indirect socio-economic losses. The damage costs are expressed in terms of Park-Ang median global damage indices (Park and Ang, 1985) and lifetime damage probabilities. The proposed approach is applied to model bridges of both moderate seismicity regions like Korea and high seismicity regions like Japan. Since, in case of bridges, a number of parameters may have an influence on optimal target reliability, various sensitivity analyses are performed in this study. It may be expected that the proposed approach can be effectively utilized for the development of cost-effective performance criteria for design and upgrading of various types of bridges as well as continuous PC bridges.

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Characteristics of Slurry Filter for Reduction of CMP Slurry-induced Micro-scratch (CMP 공정에서 마이크로 스크래치 감소를 위한 슬러리 필터의 특성)

  • 김철복;김상용;서용진
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.7
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    • pp.557-561
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    • 2001
  • Chemical mechanical polishing (CMP) process has been widely used to planarize dielectric layers, which can be applied to the integraded circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of in the defect-free inter-level dielectrics (ILD). Especially, defects such as micro-scratch lead to severe circuit failure which affect yield. CMP slurries can contain particles exceeding 1㎛ in size, which could cause micro-scratch on the wafer surface. The large particles in these slurries may be caused by particles agglomeration in slurry supply line. To reduce these defects, slurry filtration method has been recommended in oxide CMP. In this work, we have studied the effects of filtration and the defect trend as a function of polished wafer count using various filters in inter-metal dielectrics(IMD)-CMP process. The filter installation in CMP polisher could reduce defects after IMD-CMP process. As a result of micro-scratch formation, it is shown that slurry filter plays an important role in determining consumable pad lifetime. The filter lifetime is dominated by the defects. We have concluded that slurry filter lifetime is fixed by the degree of generating defects.

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