• Title/Summary/Keyword: layer 2C

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Type-2 Fuzzy Neural Networks for Pattern recognition (패턴인식을 위한 Type-2 Fuzzy Neural Networks)

  • Ji, Kwang-Hee;Kim, Hyun-Ki;Oh, Sung-Kwun
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1869_1870
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    • 2009
  • 본 논문에서는 다항식 기반 Type-2 Fuzzy Neural Networks(T2FNN)를 설계하고 이를 패턴분류 문제에 적용하여 그 성능을 분석한다. T2FNN은 Fuzzy C-Means(FCM)을 Type-2 Fuzzy C-Means로 확장시킨 것이라 할 수 있으며, Input layer, Fuzzyification layer, Inference layer, Deffuzification layer의 4층 네트워크로 구성된다. interval Type-1 퍼지 집합인 후반부의 연결가중치는 Gradient Descent Method를 이용하여 학습한다. 제안된 RBF 신경회로망은 모의데이터와 패턴인식 성능 평가에 많이 사용되는 machine learning 데이터에 적용하여 패턴 분류기로서의 성능을 평가받는다.

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Anisotropic Silicon Etching Using $RuO_2$ Thin Film as a Mask Layer by TMAH Solution ($RuO_2$를 마스크 층으로 TMAH에 의한 이방성 실리콘 식각)

  • 이재복;오세훈;홍경일;최덕균
    • Journal of the Korean Ceramic Society
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    • v.34 no.10
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    • pp.1021-1026
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    • 1997
  • RuO2 thin film has reasonably good conductivity and stiffness and it is thought to substitute for the cantilever beam made up of Pt and Si3N4 double layers in microactuators. Therefore, anisotopic Si etching was performed using RuO2 thin film as a mask layer in 25 wt. % TMAH water solution. In the etching temperature ranging from 6$0^{\circ}C$ to 75$^{\circ}C$, the etch rates of all the crystallographic directions increased linearly as the etching temperature increased. The etch rate ratio(selectivity) of [111]/[100] which varied from 0.08 to 0.14, was not sensitive to temperature. The activation energies for [110] direction, [100] direction and [111] direction were 0.50, 0.66 and 1.04eV, respectively. RuO2 cantilever beam with a clean surface was formed at the etching temperatures of 6$0^{\circ}C$ and $65^{\circ}C$. But the damages due to formation of pin holes on RuO2 surface were observed beyond 7$0^{\circ}C$. The tensile stress of RuO2 thin films caused the cantilever bending upward. As a result, it was demonstrated that the formation of conducting oxide RuO2 cantilever beam which can replace the role of an electrode and supporting layer could be possible by TMAH solution.

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High Exchange Coupling Field and Thermal Stability of Antiferromagnetic Alloy NiMn Spin Valve Films

  • Lee, N. I.;J. H. Yi;Lee, G. Y.;Kim, M. Y.;J. R. Rhee;Lee, S. S.;D. G. Hwang;Park, C. M.
    • Journal of Magnetics
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    • v.5 no.2
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    • pp.50-54
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    • 2000
  • NiMn-pinned spin valve films consisting of a layered glass/NiFe/Co/Cu/Co/NiFe/NiMn/Ta stack were made by do magnetron sputtering. After deposition, the structure was annealed in a series of cycles each including three hours at $220^\circ C, 2\times10^{-6}$ Torr, in a field of 350 Oe, to create an ordered antiferromagnetic structure in the NiMn layer and produce a strong unidirectional pinning field in the pinned magnetic layer, Optimum spin valve properties were obtained after seven annealing cycles, or 21 hours at $220^\circ C$, and were : MR ratio 1%, exchange coupling field 620 Oe, and coercivity of pinned layer 250 Oe. The exchange coupling field remained constant up to an operating temperature of $175^\circ C$, and the blocking temperature was about $380^\circ C$.

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Preparation of Boron Doped Fullerene Film by a Thermal Evaporation Technique using Argon Plasma Treatment and Its Electrochemical Application

  • Arie, Arenst Andreas;Jeon, Bup-Ju;Lee, Joong-Kee
    • Carbon letters
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    • v.11 no.2
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    • pp.127-130
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    • 2010
  • Boron doped fullerene $C_{60}$ ($B:C_{60}$) films were prepared by the thermal evaporation of $C_{60}$ powder using argon plasma treatment. The morphology and structural characteristics of the thin films were investigated by scanning electron microscope (SEM), Fourier transform infra-red spectroscopy (FTIR) and x-ray photo electron spectroscopy (XPS). The electrochemical application of the boron doped fullerene film as a coating layer for silicon anodes in lithium ion batteries was also investigated. Cyclic voltammetry (CV) measurements were applied to the $B:C_{60}$ coated silicon electrodes at a scan rate of $0.05\;mVs^{-1}$. The CV results show that the $B:C_{60}$ coating layer act as a passivation layer with respect to the insertion and extraction of lithium ions into the silicon film electrode.

A Study on Satellite Broadband Internet Services In High-Speed Vehicle (고속 이동체에서 위성 광대역 인터넷 서비스를 위한 Cross Layer 부호화 방식)

  • Park, Tae-Doo;Kim, Min-Hyuk;Kim, Nam-Soo;Kim, Chul-Sung;Jung, Ji-Won
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.34 no.5C
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    • pp.485-497
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    • 2009
  • In this paper, we described DVB-S2 system for mobility. cross layer coding technique are needed to maintain the performance in deep fading channel. Cross layer coding is divided into two kinds of level. First level is Physical layer coding and, second layer is link layer or upper layer coding. Fixed on DVB-S2 short frame coding method as a physical layer, we simulated the various coding method as an upper layer coding. Furthermore, we analyzed the performance of each coding method on according to mobile vehicle speed, data rate, interleaving memory size, and IP packet size.

Pyrolytic Carbon Coating on A Simulated Fuel by Fluidized Bed Type Chemical Vapour Deposition

  • Park, Y.;Kim, Bong G.;Lee, Young W.;Dong S. Sohn
    • Proceedings of the Korean Nuclear Society Conference
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    • 1997.05b
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    • pp.159-164
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    • 1997
  • Pyrolytic carbon layer was coated on A1203 balls by fluidized bed type chemical vapour deposition unit to develop the coating technology for the preparation of coated nuclear fuel. The deposition was carried out at the temperature ranges between 110$0^{\circ}C$ and 130$0^{\circ}C$ with various gas contents and flow rates. Source and carrier gas were propane and argon, respectively. X-ray analysis shows that the deposition layer was typical carbon spectra. The growth rate of carbon layer depended on the amount of source gas and the deposition temperature. For the alumina balls with 2mm in diameter, the deposition rate was 11${\mu}{\textrm}{m}$/hr in the flow gases containing 30% source gas at 130$0^{\circ}C$ with a total flow rate of 2.0$\ell$/min. Microstructural observation of the deposits with scanning electron microscope revealed that the deposits had relatively dense and isotropic structure. Chemical analysis by energy dispersive spectroscopy showed that the layer was pure carbon.

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An Experimental Study of Water Vapor Pressure that occurs at the Interface of a Fluid-Applied Membrane and Concrete (콘크리트와 도막 방수층 계면에 발생되는 수증기압에 관한 실험적 연구)

  • Ko, Jin-Soo;Kim, Mun-Hee;Lee, Sung-Bok;Shin, Yun-Ho
    • Proceedings of the Korean Institute of Building Construction Conference
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    • 2006.11a
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    • pp.147-150
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    • 2006
  • Of the total defects that have occurred recently in the Korean construction market, over 30% are caused by the construction of defective waterproofing, and the phenomenon of air pockets in the waterproofing layer, which is caused by the concrete vapor pressure, is known to be the primary cause of defective waterproofing. Accordingly, in this study the theory about the relationship between water pressure and temperature as well as the damp-proofing volume of concrete and, then, the change of vapor pressure volume was measured and analyzed by making a test sample after spraying a dampness remover and a waterproofing material to a prepared test body. As a result of measuring the water vapor pressure for the surface temperature of the waterproofing layer with the fluid-applied membrane temperature based on about $10^{\circ}C$, which is the average temperature of Seoul, it was found that first, the fluid-applied membrane elevated up to about $40^{\circ}C$, and the water vapor pressure generated from the fluid-applied membrane was about $0.3kgf/cm^2$ when the surface temperature of the waterproofing layer was raised up to about $80^{\circ}C$. Second, when the fluid-applied membrane temperature of the waterproofing layer was raised from $30^{\circ}C\;to\;35^{\circ}C,\;about\;0.1kgf/cm^2$ of water vapor pressure was generated, and when supplying a thermal source to raise the fluid-applied membrane temperature of the waterproofing layer from $35^{\circ}C\;to\;40^{\circ}C$, approximately $0.05kgf/cm^2$ of water vapor pressure was generated.

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High-Temperature Oxidation Kinetics and Scales Formed on P122 Steel Welds in Air (P122강 용접부의 대기중 고온산화 부식속도와 스케일 분석)

  • Bak, Sang-Hwan;Lee, Dong-Bok
    • Korean Journal of Metals and Materials
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    • v.49 no.9
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    • pp.699-707
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    • 2011
  • P122 steel, with a composition of Fe-10.57%Cr-1.79%W-0.96Cu-0.59Mn was arc-welded and oxidized between $600^{\circ}C$ and $800^{\circ}C$ in air for up to 6 months. The oxidation rates increased in the order of the base metal, weld metal, and heat-affected zone (HAZ), depending on the microstructure. The scale morphologies of the base metal, weld metal, and HAZ were similar because it was determined mainly by the alloy chemistry. The scale consisted primarily of a thin $Fe_2O_3$ layer at $600^{\circ}C$ and $700^{\circ}C$ and an outer $Fe_2O_3$ layer and an inner ($Fe_2O_3$, $FeCr_2O_4$)-mixed layer at $800^{\circ}C$. The microstructural changes resulting from heating between $600^{\circ}C$ and $800^{\circ}C$ coarsened the carbide precipitates, secondary Laves phases, and subgrain boundaries in the matrix, resulting in softening of the base metal, weld metal, and HAZ.

Comparative Ultrastructural Study on four Candida species and Cryptococcus neoformans (Candide species와 Cryptococcus neoformans의 전자현미경적 미세구조에 관한 비교 연구)

  • Yoon, Chul-Jong;Kim, Sung-Gwon;Kim, Soo-Sung;Chi, Je-Geun
    • Applied Microscopy
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    • v.23 no.2
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    • pp.97-106
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    • 1993
  • This study was done to elucidate the electron microscopic characteristics of certain pathogenic fungi. Four Candida species, (C. albicans, C. tropicalis, C. parapsilosis and C. glabrate) and Cryptococcus neoformans were cultured for 3 days at $30^{\circ}C$ in the Sabouraud dextrose medium. After incubation, they were stored at $4^{\circ}C$ for 24hours. Fine structures were analyzed by morphometry, and Tukey's HSD test was used for statistics. On scanning electron microscopy C. albicans and C. neoformans were similar in size but different in shape, showing sphero-shape or ovalo-shape in C. neoformans. Surface of C. neoformans was coarse and spiny, but Candida species examined were uniformly smooth. In size, C. glabrata was the smallest among them. Budding scar as seen on the surface of Candida species by the number ranging from 1 to 7. Cryptococcus neoformans showed one or two budding scar. On transmission electron microscopy the cytoplasm of most yeast cells showed plentiful glycogen particles, mitochondria, peroxisomes and vacuoles. However, cell walls were different among four Candida species and Cryptococcus neoformans. The cell wall of Candida species consisted of fibrous layer, that was electron dense layer and transparent layer, in contrast to Cryptococcus neoformans consisted of electron dense layer with lamellar structure. This layer was two times thicker than that of Candida species. The outer layer of cell wall was of radiating pattern.

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Thermal Oxidation of Porous Silicon (다공질 실리콘 (Porous Silicon) 의 열산화)

  • Yang, Cheon-Soon;Park, Jeong-Yong;Lee, Jong-Hyun
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.27 no.10
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    • pp.106-112
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    • 1990
  • The progress of oxidation of a porous silicon layer(PSL) was studied by examining the temperature dependence of the oxidation and the infrared absorption spectra. Thick OPSL(oxidized porous silicon layer). which has the same properties as thermal $SiO_{2}$ of bulk silicon, is formed in a short time by two steps wet oxidation of PSL at $700^{\circ}C$, 1 hr and $1100^{\circ}C$, 1 hr. Etching rate, breakdown strength of the OPSL are strongly dependent on the oxidation temperature, oxidation atmosphere. And its breakdown field was ${1\MV/cm^-2}$ MV/cm The oxide film stress was determined through curvature measurement using a dial gauge. During oxidation at temperature above $1000^{\circ}C$ in dry $O_{2}$, stress on the order of ${10^9}\dyne/{cm^2}{-10^10}\dyne/{cm^2}$ are generated in the OPSL.

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