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http://dx.doi.org/10.5714/CL.2010.11.2.127

Preparation of Boron Doped Fullerene Film by a Thermal Evaporation Technique using Argon Plasma Treatment and Its Electrochemical Application  

Arie, Arenst Andreas (Battery Research Center, Korea Institute of Science and Technology)
Jeon, Bup-Ju (Dept. of Energy Resources, Hanbuk University)
Lee, Joong-Kee (Battery Research Center, Korea Institute of Science and Technology)
Publication Information
Carbon letters / v.11, no.2, 2010 , pp. 127-130 More about this Journal
Abstract
Boron doped fullerene $C_{60}$ ($B:C_{60}$) films were prepared by the thermal evaporation of $C_{60}$ powder using argon plasma treatment. The morphology and structural characteristics of the thin films were investigated by scanning electron microscope (SEM), Fourier transform infra-red spectroscopy (FTIR) and x-ray photo electron spectroscopy (XPS). The electrochemical application of the boron doped fullerene film as a coating layer for silicon anodes in lithium ion batteries was also investigated. Cyclic voltammetry (CV) measurements were applied to the $B:C_{60}$ coated silicon electrodes at a scan rate of $0.05\;mVs^{-1}$. The CV results show that the $B:C_{60}$ coating layer act as a passivation layer with respect to the insertion and extraction of lithium ions into the silicon film electrode.
Keywords
Boron; Doping; Fullerenes; Plasma; Lithium ion battery;
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