• 제목/요약/키워드: large-area display

검색결과 292건 처리시간 0.03초

디스플레이 반도체 기술 적용을 위한 청정 나노잉크 제조 기술 (Recent Advances in Eco-friendly Nano-ink Technology for Display and Semiconductor Application)

  • 김종웅;홍성제;김영석;김용성;이정노;강남기
    • 마이크로전자및패키징학회지
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    • 제17권1호
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    • pp.33-39
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    • 2010
  • 나노잉크를 이용한 프린팅 기술은 기존의 리소그래피를 통한 절연체, 반도체 및 전도체의 패터닝 기술에 비해 비용절감, 대면적 기판 적용 가능성 및 회로의 유연성 등의 측면에서 장점을 가지므로 최근 크게 주목받고 있다. 이러한 프린팅 기술이 반도체 또는 디스플레이 제조 공정에 성공적으로 적용되기 위해서는 먼저 나노입자, 용매 및 첨가제로 구성된 나노잉크 또는 페이스트의 개발이 선행되어야 한다. 본 고에서는 이러한 반도체 및 디스플레이 적용을 위한 나노잉크의 청정 제조기술과 관련하여 최근의 연구 동향에 대하여 보고하고자 한다. 또한 나노잉크의 청정 제조기술과 관련한 구체적인 예를 설명하기 위하여 본 연구팀에서 개발한 청정 저온 $SiO_2$ 합성 기술을 소개하고자 하였다. 먼저 저온에서의 무폐수 청정공정을 통해 $SiO_2$ 나노입자를 제조하고, 이를 이용하여 프린팅 기술에 적용이 가능한 나노잉크를 제조하였다. 제조된 잉크를 유리 기판에 프린팅하여 다양한 특성 평가를 실시하였으며, 마지막으로 제조 공정상의 여러 시험변수가 프린팅된 필름의 전기적 특성에 미치는 영향에 대한 고찰을 통해 기술의 적용가능성을 평가하고자 하였다.

Optimization of the fabrication process using nanostructured carbon for low-cost FED application

  • Sun, Z.;Wang, L.L.;Chen, T.;Zhang, Z.J.;Cao, Z.Y.;Chen, Y.W.;Pan, L.K.;Feng, T.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.274-277
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    • 2006
  • Nanostructured carbon (nm-C), including carbon nanotubes and nanofibers (CNTs/CNFs) is promising for low-cost field emission display (FED) application. By modification of CNTs/CNFs, uniform CNTs/CNFs can be obtained and used for field emission cathode (FEC) on glass substrate. By screen-printing (SP) and electrophoretic deposition (EPD) process, large area FEC can be obtained. The FED properties are studied and compared. Both SP and EPD FEC show excellent field emission properties, such as low emission field and uniform emission, after optimization the fabrication process. While EPD FEC exhibits better luminescence image. By vacuum sealing, the low cost nm-C-FED prototypes based on EPD cathode have been demonstrated.

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Development of Process and Equipment for Roll-to-Roll convergence printing technology

  • 김동수;배성우;김충환
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2010년도 춘계학술발표대회
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    • pp.19.1-19.1
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    • 2010
  • The process of manufacturing printed electronics using printing technology is attracting attention because its process cost is lower than that of the conventional semiconductor process. This technology, which offers both a lower cost and higher productivity, can be applied in the production of organic TFT (thin film transistor), solar cell, RFID(radio frequency identification) tag, printed battery, E-paper, touch screen panel, black matrix for LCD(liquid crystal display), flexible display, and so forth. In general, in order to implement printed electronics, narrow width and gap printing, registration of multi-layer printing by several printing units, and printing accuracy of under $20\;{\mu}m$ are all required. These electronic products require high precision to the degree of tens of microns - in a large area with flexible material, and mass productivity at low cost. As such, the roll-to-roll printing process is attracting attention as a mass production system for these printed electronic devices. For the commercialization of this process, two basic electronic ink technologies, such as conductive ink and polymers, and printing equipment have to be developed. Therefore, this paper addressed basis design and test to develop fine patterning equipment employing the roll-to-roll printing equipment and electronic ink.

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Xe형 평면광원의 방전 전극 구조 변화에 따른 전자계 특성 (The electro-magnetic properties of Xe type flat lamp by discharge electrode structure)

  • 양종경;백광현;이종찬;최용성;박대희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 춘계학술대회 논문집
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    • pp.15-18
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    • 2005
  • As a display becomes large recently, Acquisition of high luminance and Luminance uniformity is becoming difficult in the existing CCFL or EEFL backlight system. So, study for a performance enhancement has enforced. but lamp development of flat type is asked for high luminance and a luminance uniformity security in of LCD and area anger trend ultimately. In this paper, we changed a tip shape of an electrode for production by the most suitable LCD backlight surface light source, and confirmed discharge characteristic along discharge gas pressure and voltage, and confirmed electric field distribution and discharge energy characteristic through a Maxwell 2D simulation. Therefore the discharge firing voltage characteristic showed a low characteristic than a rectangular type and round type in case of electrode which used tip of a triangle type, and displayed a discharge electric current as a same voltage was low.

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Xe 플라즈마 평판형 광원의 전극 구조에 따른 전기.자기적 특성 (Electrical and Electromagnetic Characteristics of Xe Plasma Flat Lamp by Electrode Structure)

  • 최용성;문종대;이경섭;이상헌
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 영호남 합동 학술대회 및 춘계학술대회 논문집 센서 박막 기술교육
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    • pp.82-85
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    • 2006
  • As a display becomes large recently, Acquisition of high luminance and Luminance uniformity is becoming difficult in the existing CCFL or EEFL backlight system. So, study for a performance enhancement has enforced. but lamp development of flat type is asked for high luminance and a luminance uniformity security in of LCD and area anger trend ultimately. In this paper, we changed a tip shape of an electrode for production by the most suitable LCD backlight surface light source, and confirmed discharge characteristic along discharge gas pressure and voltage, and confirmed electric field distribution and discharge energy characteristic through a Maxwell 2D simulation. Therefore the discharge firing voltage characteristic showed a low characteristic than a rectangular type and round type in case of electrode which used tip of a triangle type, and displayed a discharge electric current as a same voltage was low.

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히트 파이프를 이용한 열경화성 나노임프린트 장비용 열판의 온도 균일도 향상 (Improvement of Temperature Uniformity in a Hot Plate for Thermal Nanoimprint Lithography by Installing Heat Pipes)

  • 박규진;양진오;이재종;곽호상
    • 반도체디스플레이기술학회지
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    • 제15권2호
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    • pp.74-80
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    • 2016
  • This study presents a thermal device specially designed for thermal nanoimprint lithography equipments, which requires the capability of rapid heating and cooling, high temperature uniformity and the material strength to endure high stamping pressure. The proposal to meet these requirements is a planar-type hot plate extensible to a large area, in which long circular cartridge heaters and heat pipes are installed inside in parallel. The heat pipes are connected to the outside water cooling chamber. A hot plate made of stainless steel is fabricated with a dimension $240mm{\times}240mm{\times}20mm$. Laboratory experiments are conducted to examine the thermal performance of the hot plate. The results illustrate that the employment of heat pipes leads to a notable enhancement of temperature uniformity in the device and provides an efficient heat delivery from the hot plate to outside. It is verified that the suggested hot plate could be a feasible thermal tool for thermal nanoimprint lithography, satisfying the major design requirements.

Manufactured Flexible Active Matrix Backplanes using Self-Alighed Imprint Lithography (SAIL)

  • Kwon, Oh-Seung;Marcia-Almanza-Workman, Marcia-Almanza-Workman;Braymen, Steve;Cobene, Robert;Elder, Richard;Garcia, Robert;Gomez-Pancorbo, Fernando;Hauschildt, Jason;Jackson, Warren;Jam, Mehrban;Jeans, Albert;Jeffrey, Frank;Junge, Kelly;Kim, Han-Jun;Larson, Don;Luo, Hao;Maltabes, John;Mei, Ping;Perlov, Craig;Smith, Mark;Stieler, Dan;Taussig, Carl
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.138-141
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    • 2009
  • Progress in the development of a fully roll-to-roll selfaligned imprint process for producing active matrix backplanes with submicron aligned features on flexible substrates is reported. High performance transistors, crossovers and addressable active matrix arrays have been designed and fabricated using imprint lithography. Such a process has the potential of significantly reducing the costs of large area displays. The progress, current status and remaining issues of this new fabrication technology are reported.

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형광체 두께와 방전공간의 변화에 따른 ac PDP의 어드레싱 속도와 전기광학적 특성에 관한 연구 (The Study of Addressing Time and Electrical and Optical Characteristics as Phosphor Thickness and Height of discharge Space in ac-PDP)

  • 허정은;김규섭;박정후;조정수
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2000년도 하계학술대회 논문집 C
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    • pp.1815-1817
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    • 2000
  • Plasma display Panels(PDPs) are one of the leading technologies currently under development for large-area high-brightness flat panel displays. However, the luminance and luminous efficiency of at PDPs should be improved. Especially, one of the main factors affecting on the luminance and luminous efficiency of ac PDP may be the phosphor thickness and size of discharge space. In this study, we examined into addressing time, electrical and optical properties as a parameter of the phosphor thickness and the size of discharge space during the display period of ac PDP. It is found out that the optimum phosphor thickness was $50{\mu}m$ and height of discharge space was about $100{\mu}m$.

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레지스트 잔류층 두께와 몰드 유입속도가 기포결함에 미치는 영향에 대한 수치해석 (Numerical Analysis of Effects of Velocity Inlet and Residual Layer Thickness of Resist on Bubble Defect Formation)

  • 이우영;김남웅;김동현;김국원
    • 반도체디스플레이기술학회지
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    • 제14권3호
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    • pp.61-66
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    • 2015
  • Recently, the major trends of NIL are high throughput and large area patterning. For UV NIL, if it can be proceeded in the non-vacuum environment, which greatly simplifies tool construction and greatly shorten process times. However, one key issue in non-vacuum environment is air bubble formation problem. In this paper, numerical analysis of bubble defect of UV NIL is performed. Fluent, flow analysis focused program was utilized and VOF (Volume of Fluid) skill was applied. For various resist-substrate and resist-mold angles, effects of velocity inlet and residual layer thickness of resist on bubble defect formation were investigated. The numerical analyses show that the increases of velocity inlet and residual layer thickness can cause the bubble defect formation, however the decreases of velocity inlet and residual layer thickness take no difference in the bubble defect formation.

대면적 플랙시블 기판용 회전자석형 마그네트론 소스 개발 (Development of rotary-magnet type magnetron source for large area sputtering on flexible substrate)

  • 조찬섭;윤성호;김봉환;김광태;정영철;이종현
    • 반도체디스플레이기술학회지
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    • 제11권2호
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    • pp.1-6
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    • 2012
  • In this study, a high performance rotary magnet type magnetron source for roll-to-roll sputter system has been developed. We analyzed the density of magnetic field as a function of size variation of the magnet which are in the center and edge of the target. The target efficiency showed the best result when the width of center magnet, the width of edge magnet, the angle of edge magnet, and the rotation angle of Yoke are 20mm, 10mm, $56^{\circ}$, and $16^{\circ}$, respectively. On the basis of the results of magnet array, Roll-to Roll magnetron source was fabricated and tested. The uniformity of the film thickness and that of the sheet resistance was ${\pm}1.62%$ and ${\pm}4.13%$, and the resistivity was $2.79{\times}10^{-3}W{\cdot}cm$.