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Development of rotary-magnet type magnetron source for large area sputtering on flexible substrate  

Cho, Chan Seob (School of EE, Kyungpook Nat'l Univ.)
Yun, Sung Ho (Ultech Co., Ltd.)
Kim, Bong Hwan (Dept. Electronics Engineering, Catholic University of Daegu)
Kim, Kwang Tae (School of EE, Kyungpook Nat'l Univ.)
Jung, Young Chul (Dept. Computer and Information Engineering, Gyeongju Univ.)
Lee, Jong Hyun (School of EECS, Kyungpook Nat'l Univ.)
Publication Information
Journal of the Semiconductor & Display Technology / v.11, no.2, 2012 , pp. 1-6 More about this Journal
In this study, a high performance rotary magnet type magnetron source for roll-to-roll sputter system has been developed. We analyzed the density of magnetic field as a function of size variation of the magnet which are in the center and edge of the target. The target efficiency showed the best result when the width of center magnet, the width of edge magnet, the angle of edge magnet, and the rotation angle of Yoke are 20mm, 10mm, $56^{\circ}$, and $16^{\circ}$, respectively. On the basis of the results of magnet array, Roll-to Roll magnetron source was fabricated and tested. The uniformity of the film thickness and that of the sheet resistance was ${\pm}1.62%$ and ${\pm}4.13%$, and the resistivity was $2.79{\times}10^{-3}W{\cdot}cm$.
Sputter source; Magnetron Source; Sputtering;
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