Improvement of Temperature Uniformity in a Hot Plate for Thermal Nanoimprint Lithography by Installing Heat Pipes |
Park, Gyu Jin
(Dept. of Mechanical Engineering, Kumoh National Institute of Technology)
Yang, Jin Oh (LG Chemistry Ltd.) Lee, Jae Joong (Korea Institute of Machinery & Materials) Kwak, Ho Sang (Dept. of Mechanical System Engineering, Kumoh National Institute of Technology) |
1 | Lee S. Y., Cho H. H., and Lee Y. W., "A Study to Improve Temperature Uniformity in Hot plate Oven for Silicon Wafer Manufacturing", J. KSME(B), Vol. 25, pp.261-266, 2000. |
2 | Hirai, Y., Fujiwara, M., Okuno, T., Tanaka, Y., Endo, M., Irie, S., Nakagawa, K. and Sasago, M., "Study of the Resist Deformation in Nanoimprint Lithography," J. Vac. Sci. Technol., Vol.19, pp.2811-2815, 2001. DOI |
3 | Gary, S.M. and Simon, M.S., Fundamentals of Semiconductor Fabrication, John Wily & Sons, New York, 2003. |
4 | Ahn J. H., "Large Area Synthesis and Application of Graphene Films", Polymer Science and Technology, Vol.22, No.2, pp.126-129, 2011. DOI |
5 | Chou, S.Y., Krauss, P.R. and Renstrom, P.J., "Nanoimprint Lithography," J. Vac. Sci. Technol., Vol.14, No.6, pp.4129-4133, 1996. DOI |
6 | Becker, H. and Heim, U., "Hot Embossing as a Method for the Fabrication of Polymer High Aspect Ratio Structures," Sensors and Actuators A, Physical, Vol.84, pp.130-135, 2000. |
7 | Pang, S.W., Tamamura, T., Nakao, M., Ozawa, A. and Masuda, H., "Direct Nano-Printing on Al Substrate Using a SiC Mold," J. Vac. Sci. Technol., Vol.16, pp.1145-1149, 1998. |
8 | Beck, M., Graczyk, M., Maximov, I., Sarwe, E.L., Ling, T.G.I., Keil, M. and Motelius, L., "Improving Stamps for 10 nm Level Wafer Scale Nanoimprint Lithography," Microelectron. Eng., Vol.61-2, pp.441-448, 2002. DOI |
9 | Khang, D. Y., Kang, H., Kim, T. and Lee, H. H., "Low-Pressure Nanoimprint Lithography," Nano Lett., Vol.4, pp.633-637, 2004. DOI |
10 | Lim H. J., Lee J. J., Choi K. B., Kim G. H., and Lee S. H., "Technology for Roll-based Nanoimprint Lithography Systems", (in Korean), J. of the Korea Soc. Manufacturing Process Engineers, Vol.12, No.5, pp.1-8., 2013. DOI |
11 | Kwak H. S., Park G. J., Son B. C., Lee J. J., and Park H. C., "Design of a Hot plate with Rapid Cooling Capability for Thermal Nanoimprint Lithography", Proc. SICE-ICASE Int. Joint Conf., Busan, pp.4897-4901, 2006. |
12 | Park, G. J., Kwak, H. S., Shin, D. W. and Lee, J. J. "Numerical Simulation of Thermal Control of a Hot Plate for Thermal Nanoimprint Lithography Machines," Proc. 3rd Int. Conf. on Heating Cooling Technol., pp.321-327, 2007. |
13 | Park, G. J., Lee, J. J. and Kwak, H. S, "A Numerical Study on Thermal Design of a Large-Area Hot Plate for Thermal Nanoimprint Lithography," J. Comput. Fluids Eng., Vol. 21, pp. 90-98, 2016. |